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Impact of post deposition annealing in N ambient on structural properties of nanocrystalline hafnium oxide thin film.
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- Journal of Materials Science: Materials in Electronics, 2017, v. 28, n. 1, p. 760, doi. 10.1007/s10854-016-5587-x
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Impact of post deposition annealing in O ambient on structural properties of nanocrystalline hafnium oxide thin film.
- Published in:
- Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 7, p. 7055, doi. 10.1007/s10854-016-4663-6
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- Publication type:
- Article