Works by Kon’kov, O. I.
Results: 27
High-Voltage 4H-SiC Schottky Diodes with Field-Plate Edge Termination.
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- Semiconductors, 2021, v. 55, n. 2, p. 243, doi. 10.1134/S1063782621020147
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- Article
Micro-profiling of 4H-SiC by Dry Etching to Form a Schottky Barrier Diode.
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- Semiconductors, 2020, v. 54, n. 1, p. 144, doi. 10.1134/S1063782620010108
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- Article
Characteristics of microwave radiation from copper-containing fullerene resonators at liquid-nitrogen temperatures.
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- Technical Physics Letters, 1999, v. 25, n. 10, p. 820, doi. 10.1134/1.1262647
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- Article
Gas-sensitive properties of copper-containing fullerene membranes.
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- Technical Physics Letters, 1999, v. 25, n. 4, p. 326, doi. 10.1134/1.1262468
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- Article
Intense luminescence with a tunable wavelength from films of tetrahedral amorphous hydrogenated carbon on a fused quartz substrate.
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- Technical Physics Letters, 1997, v. 23, n. 2, p. 160, doi. 10.1134/1.1261571
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- Article
Measurement of the amount of free and bound hydrogen in amorphous carbon.
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- Technical Physics Letters, 1997, v. 23, n. 1, p. 9, doi. 10.1134/1.1261626
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- Article
The Effect of Texturing of Silicon Wafer Surfaces for Solar Photoelectric Transducers on Their Strength Properties.
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- Technical Physics, 2020, v. 65, n. 7, p. 1123, doi. 10.1134/S1063784220070191
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- Article
Excess leakage currents in high-voltage 4 H-SiC Schottky diodes.
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- Semiconductors, 2010, v. 44, n. 5, p. 653, doi. 10.1134/S1063782610050180
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- Article
Experimental 4 H-SiC junction-barrier Schottky (JBS) diodes.
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- Semiconductors, 2009, v. 43, n. 9, p. 1209, doi. 10.1134/S106378260909019X
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- Article
Photosensitive Structures Based on Single-Crystal Silicon and Phthalocyanine CuPc: Fabrication and Properties.
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- Semiconductors, 2004, v. 38, n. 9, p. 1018, doi. 10.1134/1.1797478
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- Article
The Formation of β-FeSi[sub 2] Precipitates in Microcrystalline Si.
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- Semiconductors, 2002, v. 36, n. 11, p. 1235, doi. 10.1134/1.1521222
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- Article
Erbium Electroluminescence in p–i–n Amorphous Hydrogenated Silicon Structures.
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- Semiconductors, 2002, v. 36, n. 11, p. 1240, doi. 10.1134/1.1521223
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- Article
Conductivity and Structure of Er-Doped Amorphous Hydrogenated Silicon Films.
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- Semiconductors, 2002, v. 36, n. 11, p. 1248, doi. 10.1134/1.1521225
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- Article
Effect of Doping with Nitrogen on Electrical Properties and Erbium Electroluminescence of a-Si:H(Er) Films.
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- Semiconductors, 2001, v. 35, n. 10, p. 1197, doi. 10.1134/1.1410664
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- Article
Effect of Erbium on Electronic Traps in PECVD-grown a-Si:H(Er)/c-Si Structures.
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- Semiconductors, 2001, v. 35, n. 6, p. 621, doi. 10.1134/1.1379390
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- Article
The Meissner Effect in Copper-Containing Fullerides.
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- Semiconductors, 2001, v. 35, n. 6, p. 659
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- Article
The Influence of Erbium on Electrical and Photoelectric Properties of Amorphous Silicon Produced by Radio-Frequency Silane Decomposition.
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- Semiconductors, 2000, v. 34, n. 7, p. 829, doi. 10.1134/1.1188083
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- Article
Current–Voltage Characteristics of Electroluminescent Me/(a-Si:H):Er/c-Si Structures Prepared by Magnetron Sputtering.
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- Semiconductors, 2000, v. 34, n. 5, p. 598, doi. 10.1134/1.1188035
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- Article
Structure and Properties of a-Si:H Films Grown by Cyclic Deposition.
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- Semiconductors, 2000, v. 34, n. 4, p. 477
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- Article
The Influence of Local Surroundings of Er Atoms on the Kinetics of Decay of Er Photoluminescence in Amorphous Hydrogenated Silicon.
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- Semiconductors, 2000, v. 34, n. 1, p. 92, doi. 10.1134/1.1187952
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- Article
Influence of the substrate temperature and annealing on the 1.54-μm erbium photoluminescence of a-Si:H films obtained using a glow discharge.
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- Semiconductors, 1999, v. 33, n. 2, p. 177, doi. 10.1134/1.1187888
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- Article
Luminescence of erbium in amorphous hydrogenated silicon obtained by the glow-discharge method.
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- Semiconductors, 1998, v. 32, n. 8, p. 884, doi. 10.1134/1.1187477
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- Article
Influence of plasma treatment of the surface of silicon carbide on the characteristics of buried-gate junction field-effect transistors.
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- Semiconductors, 1997, v. 31, n. 11, p. 1212, doi. 10.1134/1.1187295
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- Article
4<italic>H</italic>-SiC Based Subnanosecond (150 ps) High-Voltage (1600 V) Current Breakers.
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- Technical Physics Letters, 2018, v. 44, n. 2, p. 87, doi. 10.1134/S1063785018020086
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- Article
Erbium Electroluminescence in an Al/a-Si:H(Er)/p-c-Si/Al Heterostructure.
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- Technical Physics Letters, 2001, v. 27, n. 7, p. 542, doi. 10.1134/1.1388936
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- Article
The Ablation Threshold in Amorphous Diamondlike Carbon Films Exposed to an ArF Excimer Laser Radiation.
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- Technical Physics Letters, 2000, v. 26, n. 12, p. 1032, doi. 10.1134/1.1337244
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- Article
Microwave Experiment on a Costas-Array Ref lecting Screen.
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- Technical Physics Letters, 2000, v. 26, n. 3, p. 236, doi. 10.1134/1.1262803
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- Article