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71.1: High Throughput and Scalable Spatial Atomic Layer Deposition of Al<sub>2</sub>O<sub>3</sub> as a Moisture Barrier for Flexible OLED Display.
- Published in:
- SID Symposium Digest of Technical Papers, 2015, v. 46, n. 1, p. 1043, doi. 10.1002/sdtp.10378
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- Publication type:
- Article
Study of Metal–Dielectric Interface for Improving Electrical Properties and Reliability of DRAM Capacitor (Adv. Mater. Technol. 20/2023).
- Published in:
- Advanced Materials Technologies, 2023, v. 8, n. 20, p. 1, doi. 10.1002/admt.202370106
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- Publication type:
- Article
Study of Metal–Dielectric Interface for Improving Electrical Properties and Reliability of DRAM Capacitor.
- Published in:
- Advanced Materials Technologies, 2023, v. 8, n. 20, p. 1, doi. 10.1002/admt.202200412
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- Publication type:
- Article
Preparation and characterization of phosphorescence organic light-emitting diodes using poly-vinylcarbazole: tris(2-phenylpyridine) iridium(III) emission layer.
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- Optical Engineering, 2009, v. 48, n. 10, p. 104001, doi. 10.1117/1.3251325
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- Article
Tunnelling current-voltage characteristics of Angstrom gaps measured with terahertz time-domain spectroscopy.
- Published in:
- Scientific Reports, 2016, p. 29103, doi. 10.1038/srep29103
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- Publication type:
- Article
Terahertz rectification in ring-shaped quantum barriers.
- Published in:
- Nature Communications, 2018, v. 9, n. 1, p. 1, doi. 10.1038/s41467-018-07365-w
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- Article
Abnormal Grain Growth of Niobium-Doped Strontium Titanate Ceramics.
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- Journal of the American Ceramic Society, 1998, v. 81, n. 11, p. 3005, doi. 10.1111/j.1151-2916.1998.tb02727.x
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- Publication type:
- Article
The effects of a HfO<sub>2</sub> buffer layer on Al<sub>2</sub>O<sub>3</sub>-passivated indium-gallium-zinc-oxide thin film transistors.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2011, v. 5, n. 10/11, p. 403, doi. 10.1002/pssr.201105340
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- Article
Development of a SnS Film Process for Energy Device Applications.
- Published in:
- Applied Sciences (2076-3417), 2019, v. 9, n. 21, p. 4606, doi. 10.3390/app9214606
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- Publication type:
- Article
Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma.
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- Applied Sciences (2076-3417), 2019, v. 9, n. 17, p. 3531, doi. 10.3390/app9173531
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- Publication type:
- Article
Highly Efficient Bifacial Color‐Tunable Perovskite Solar Cells.
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- Advanced Optical Materials, 2022, v. 10, n. 2, p. 1, doi. 10.1002/adom.202101696
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- Publication type:
- Article
Microstructural characterization at the interface of Al.
- Published in:
- Physica Status Solidi (B), 2011, v. 248, n. 7, p. 1634, doi. 10.1002/pssb.201046551
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- Publication type:
- Article
Characteristics of High‐Crystallinity ZrO<sub>2</sub> Thin Films Deposited Using Remote Plasma Atomic Layer Deposition.
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- Physica Status Solidi. A: Applications & Materials Science, 2023, v. 220, n. 1, p. 1, doi. 10.1002/pssa.202200278
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- Publication type:
- Article
Effect of N Concentration Upon Resistive Switching Behavior of Au/Ni/TaON/NiSi ECM Devices.
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- Physica Status Solidi. A: Applications & Materials Science, 2018, v. 215, n. 23, p. N.PAG, doi. 10.1002/pssa.201800181
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- Publication type:
- Article
The annealing effect on work function variation of WN <sub>x</sub>C <sub>y</sub> films deposited by remote plasma atomic layer deposition.
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- Physica Status Solidi. A: Applications & Materials Science, 2017, v. 214, n. 7, p. n/a, doi. 10.1002/pssa.201700010
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- Publication type:
- Article
The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer.
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- Physica Status Solidi. A: Applications & Materials Science, 2015, v. 212, n. 12, p. 2785, doi. 10.1002/pssa.201532274
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- Article
Growth behavior and structural characteristics of TiO<sub>2</sub> thin films using (CpN)Ti(NMe<sub>2</sub>)<sub>2</sub> and oxygen remote plasma.
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- Physica Status Solidi. A: Applications & Materials Science, 2015, v. 212, n. 3, p. 674, doi. 10.1002/pssa.201431630
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- Article
Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition.
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- Physica Status Solidi. A: Applications & Materials Science, 2014, v. 211, n. 9, p. 2166, doi. 10.1002/pssa.201431162
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- Publication type:
- Article
Stabilized resistive switching behaviors of a Pt/TaO<sub> x</sub>/TiN RRAM under different oxygen contents.
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- Physica Status Solidi. A: Applications & Materials Science, 2014, v. 211, n. 9, p. 2189, doi. 10.1002/pssa.201431260
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- Article
Stabilized resistive switching behaviors of a Pt/TaO<sub> x</sub>/TiN RRAM under different oxygen contents (Phys. Status Solidi A 9∕2014).
- Published in:
- 2014
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- Publication type:
- Other
Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition.
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- Physica Status Solidi. A: Applications & Materials Science, 2013, v. 210, n. 2, p. 276, doi. 10.1002/pssa.201228671
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- Publication type:
- Article
AZO/Au/AZO multilayer as a transparent conductive electrode.
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- Physica Status Solidi. A: Applications & Materials Science, 2012, v. 209, n. 4, p. 698, doi. 10.1002/pssa.201127049
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- Publication type:
- Article
The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO<sub>2</sub>.
- Published in:
- Physica Status Solidi. A: Applications & Materials Science, 2012, v. 209, n. 2, p. 302, doi. 10.1002/pssa.201127280
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- Publication type:
- Article