Effects of gate stack structural and process defectivity on high-k dielectric dependence of NBTI reliability in 32 nm technology node PMOSFETs.
- Published in:
- 2014
- By:
- Publication type:
- journal article
Works by Hatta, S. Wan Muhamad
Results: 3
1
2
Effects of Gate Stack Structural and Process Defectivity on High-κ Dielectric Dependence of NBTI Reliability in 32 nm Technology Node PMOSFETs.
- Published in:
- Scientific World Journal, 2014, p. 1, doi. 10.1155/2014/490829
- By:
- Publication type:
- Article
3
Optimization of Etching Time, Temperature of Metal Salts in Surface‐texturized Silicon Fabricated Through One‐Step Metal‐Assisted Chemical Etching.
- Published in:
- ChemNanoMat, 2025, v. 11, n. 3, p. 1, doi. 10.1002/cnma.202400461
- By:
- Publication type:
- Article