Works by Geun-Young Yeom

Results: 32

Enhanced etch characteristics of EUV PR masked SiON through the ion beam grid pulsing technique.

Published in:

Scientific Reports, 2025, v. 15, n. 1, p. 1, doi. 10.1038/s41598-025-04632-x

By:

Kwon, Hae In;
Jang, Yun Jong;
Kim, Kyoung Chan;
Gil, Hong Seong;
Kim, Ju Young;
Ryu, Seong Hyun;
Pyun, Do Seong;
Kim, Dae Whan;
Park, Woo Chang;
Lee, Ji Yeon;
Park, Jin Woo;
Park, Sang Wuk;
Yeom, Geun Young

Publication type:

Article

Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module.

Published in:

Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 3, p. 507, doi. 10.1007/s11090-011-9292-5

By:

Jong Hyeuk Lim;
Kyong Nam Kim;
Min Hwan Jeon;
Jong Tae Lim;
Geun Young Yeom

Publication type:

Article

Plasma Characteristics of a Ni–Zn Ferrite Enhanced Internal-Type Inductively Coupled Plasma Source Operated at 2 and 13.56 MHz.

Published in:

Plasma Chemistry & Plasma Processing, 2010, v. 30, n. 1, p. 183, doi. 10.1007/s11090-009-9203-1

By:

Kyong Nam Kim;
Jong Hyeuk Lim;
Geun Young Yeom

Publication type:

Article

Study of Internal Linear Inductively Coupled Plasma Source for Ultra Large-Scale Flat Panel Display Processing.

Published in:

Plasma Chemistry & Plasma Processing, 2009, v. 29, n. 4, p. 251, doi. 10.1007/s11090-009-9176-0

By:

Jong Hyeuk Lim;
Kyong Nam Kim;
Gwang Ho Gweon;
Jae Beom Park;
Geun Young Yeom

Publication type:

Article

Plasma Characteristics and Antenna Electrical Characteristics of an Internal Linear Inductively Coupled Plasma Source with a Multi-Polar Magnetic Field.

Published in:

Plasma Chemistry & Plasma Processing, 2008, v. 28, n. 1, p. 147, doi. 10.1007/s11090-007-9112-0

By:

Kyong Nam Kim;
Jong Hyeuk Lim;
Jung Kyun Park;
Geun Young Yeom;
Sung Hee Lee;
Jae Koo Lee

Publication type:

Article

Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C4H2F6-based gas.

Published in:

Scientific Reports, 2024, v. 14, n. 1, p. 1, doi. 10.1038/s41598-024-74107-y

By:

Cho, Nam Il;
Hong, Jong Woo;
Yoo, Hee Jin;
Eoh, Hyeong Joon;
Kim, Chan Ho;
Jeong, Jun Won;
Kim, Kyung Lim;
Kwak, Jung Hun;
Cho, Yong Jun;
Kim, Dong Woo;
Yeom, Geun Young

Publication type:

Article

Anisotropic atomic layer etching of W using fluorine radicals/oxygen ion beam.

Published in:

Plasma Processes & Polymers, 2019, v. 16, n. 9, p. N.PAG, doi. 10.1002/ppap.201900081

By:

Kim, Doo San;
Kim, Ju Eun;
Lee, Won Oh;
Park, Jin Woo;
Gill, You Jung;
Jeong, Byeong Hwa;
Yeom, Geun Young

Publication type:

Article

Linewidth Control and the Improved Adhesion of Inkjet-Printed Ag on Polyimide Substrate, Textured Using Near-Atmospheric Pressure Plasmas.

Published in:

Plasma Processes & Polymers, 2016, v. 13, n. 7, p. 722, doi. 10.1002/ppap.201500222

By:

Mun, Mu Kyeom;
Park, Jin Woo;
Yeom, Geun Young

Publication type:

Article

Plasma Dielectric Etching with C 4 H 2 F 6 Isomers of Low Global-Warming Potential.

Published in:

Journal of Manufacturing & Materials Processing, 2025, v. 9, n. 2, p. 42, doi. 10.3390/jmmp9020042

By:

Choi, Minsu;
Lee, Youngseok;
Cho, Chulhee;
Jeong, Wonnyoung;
Seong, Inho;
Haque, Jami Md Ehsanul;
Choi, Byeongyeop;
Seo, Seonghyun;
Kim, Sijun;
You, Shinjae;
Yeom, Geun Young

Publication type:

Article

A Van Der Waals Reconfigurable Multi‐Valued Logic Device and Circuit Based on Tunable Negative‐Differential‐Resistance Phenomenon (Adv. Mater. 36/2022).

Published in:

Advanced Materials, 2022, v. 34, n. 36, p. 1, doi. 10.1002/adma.202270255

By:

Seo, Seunghwan;
Cho, Jeong‐Ick;
Jung, Kil‐Su;
Andreev, Maksim;
Lee, Ju‐Hee;
Ahn, Hogeun;
Jung, Sooyoung;
Lee, Taeran;
Kim, Byeongchan;
Lee, Seojoo;
Kang, Juncheol;
Lee, Kyeong‐Bae;
Lee, Ho‐Jun;
Kim, Ki Seok;
Yeom, Geun Young;
Heo, Keun;
Park, Jin‐Hong

Publication type:

Article

A Van Der Waals Reconfigurable Multi‐Valued Logic Device and Circuit Based on Tunable Negative‐Differential‐Resistance Phenomenon.

Published in:

Advanced Materials, 2022, v. 34, n. 36, p. 1, doi. 10.1002/adma.202202799

By:

Seo, Seunghwan;
Cho, Jeong‐Ick;
Jung, Kil‐Su;
Andreev, Maksim;
Lee, Ju‐Hee;
Ahn, Hogeun;
Jung, Sooyoung;
Lee, Taeran;
Kim, Byeongchan;
Lee, Seojoo;
Kang, Juncheol;
Lee, Kyeong‐Bae;
Lee, Ho‐Jun;
Kim, Ki Seok;
Yeom, Geun Young;
Heo, Keun;
Park, Jin‐Hong

Publication type:

Article

An Optogenetics‐Inspired Flexible van der Waals Optoelectronic Synapse and its Application to a Convolutional Neural Network (Adv. Mater. 40/2021).

Published in:

Advanced Materials, 2021, v. 33, n. 40, p. 1, doi. 10.1002/adma.202170316

By:

Seo, Seunghwan;
Lee, Je‐Jun;
Lee, Ryong‐Gyu;
Kim, Tae Hyung;
Park, Sangyong;
Jung, Sooyoung;
Lee, Hyun‐Kyu;
Andreev, Maksim;
Lee, Kyeong‐Bae;
Jung, Kil‐Su;
Oh, Seyong;
Lee, Ho‐Jun;
Kim, Ki Seok;
Yeom, Geun Young;
Kim, Yong‐Hoon;
Park, Jin‐Hong

Publication type:

Article

An Optogenetics‐Inspired Flexible van der Waals Optoelectronic Synapse and its Application to a Convolutional Neural Network.

Published in:

Advanced Materials, 2021, v. 33, n. 40, p. 1, doi. 10.1002/adma.202102980

By:

Seo, Seunghwan;
Lee, Je‐Jun;
Lee, Ryong‐Gyu;
Kim, Tae Hyung;
Park, Sangyong;
Jung, Sooyoung;
Lee, Hyun‐Kyu;
Andreev, Maksim;
Lee, Kyeong‐Bae;
Jung, Kil‐Su;
Oh, Seyong;
Lee, Ho‐Jun;
Kim, Ki Seok;
Yeom, Geun Young;
Kim, Yong‐Hoon;
Park, Jin‐Hong

Publication type:

Article

Direct nanoparticle coating using atmospheric plasma jet.

Published in:

Journal of Nanoparticle Research, 2020, v. 22, n. 6, p. 1, doi. 10.1007/s11051-020-04865-z

By:

Mun, Mu Kyeom;
Jang, Yun Jong;
Kim, Dong Woo;
Yeom, Geun Young

Publication type:

Article

Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methanol vapor.

Published in:

Scientific Reports, 2023, v. 13, n. 1, p. 1, doi. 10.1038/s41598-023-38359-4

By:

Gil, Hong Seong;
Kim, Doo San;
Jang, Yun Jong;
Kim, Dea Whan;
Kwon, Hea In;
Kim, Gyoung Chan;
Kim, Dong Woo;
Yeom, Geun Young

Publication type:

Article

Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow.

Published in:

Plasma Processes & Polymers, 2021, v. 18, n. 11, p. 1, doi. 10.1002/ppap.202100063

By:

Gill, You Jung;
Kim, Doo San;
Gil, Hong Seong;
Kim, Ki Hyun;
Jang, Yun Jong;
Kim, Ye Eun;
Yeom, Geun Young

Publication type:

Article

Monolithic DNApatite: An Elastic Apatite with Sub‐Nanometer Scale Organo–Inorganic Structures (Adv. Mater. 41/2024).

Published in:

Advanced Materials, 2024, v. 36, n. 41, p. 1, doi. 10.1002/adma.202470329

By:

Lee, Jin Woong;
Lee, Byoungsang;
Park, Cheol Hyun;
Heo, Jun Hyuk;
Lee, Tae Yoon;
Lee, Dongtak;
Bae, Jina;
Sundharbaabu, Priyannth Ramasami;
Yeom, Won Kyun;
Chae, Sudong;
Lim, Jae‐Hyuk;
Lee, Seok‐Won;
Choi, Jin‐Seok;
Bae, Hyung‐Bin;
Choi, Jae‐Young;
Lee, Eun‐Ho;
Yoon, Dae Sung;
Yeom, Geun Young;
Shin, Hyunjung;
Lee, Jung Heon

Publication type:

Article

Monolithic DNApatite: An Elastic Apatite with Sub‐Nanometer Scale Organo–Inorganic Structures.

Published in:

Advanced Materials, 2024, v. 36, n. 41, p. 1, doi. 10.1002/adma.202406179

By:

Lee, Jin Woong;
Lee, Byoungsang;
Park, Cheol Hyun;
Heo, Jun Hyuk;
Lee, Tae Yoon;
Lee, Dongtak;
Bae, Jina;
Sundharbaabu, Priyannth Ramasami;
Yeom, Won Kyun;
Chae, Sudong;
Lim, Jae‐Hyuk;
Lee, Seok‐Won;
Choi, Jin‐Seok;
Bae, Hyung‐Bin;
Choi, Jae‐Young;
Lee, Eun‐Ho;
Yoon, Dae Sung;
Yeom, Geun Young;
Shin, Hyunjung;
Lee, Jung Heon

Publication type:

Article

Low-voltage characteristics of MgO-CaO films as a protective layer for AC plasma display panels by e-beam evaporation.

Published in:

Journal of Materials Science, 1999, v. 34, n. 20, p. 5055, doi. 10.1023/A:1004748714098

By:

Jinhui Cho;
Rakhwan Kim;
Kyoung-Woo Lee;
Choongyong Son;
Geun-Young Yeom;
Hee Jae Kim;
Jung-Yeul Kim;
Jong-Wan Park

Publication type:

Article

Cyclic Atomic Layer Etching of PdSe2.

Published in:

Advanced Functional Materials, 2024, v. 34, n. 51, p. 1, doi. 10.1002/adfm.202408154

By:

Kang, Ji Eun;
Choi, Seung Yup;
Han, Hye Won;
Kim, Ji Min;
Kim, Ye Eun;
Seok, Hyunho;
Kim, Taesung;
Kim, Doo San;
Yeom, Geun Young

Publication type:

Article

Nanostructures Fabrication on Ta Thin Film Using Atomic Force Microscope Lithography.

Published in:

Molecular Crystals & Liquid Crystals, 2006, v. 445, n. 1, p. 115, doi. 10.1080/15421400500369484

By:

Lee, Sunwoo;
Lee, Haiwon;
Lee, Do Haing;
Park, Byung-Jae;
Yeom, Geun Young

Publication type:

Article

Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasma.

Published in:

Scientific Reports, 2022, v. 12, n. 1, p. 1, doi. 10.1038/s41598-022-09252-3

By:

Lee, Won Oh;
Kim, Ki Hyun;
Kim, Doo San;
Ji, You Jin;
Kang, Ji Eun;
Tak, Hyun Woo;
Park, Jin Woo;
Song, Han Dock;
Kim, Ki Seok;
Cho, Byeong Ok;
Kim, Young Lae;
Yeom, Geun Young

Publication type:

Article

Invisible Silver Nanomesh Skin Electrode via Mechanical Press Welding.

Published in:

Nanomaterials (2079-4991), 2020, v. 10, n. 4, p. 633, doi. 10.3390/nano10040633

By:

Oh, Ji Soo;
Oh, Jong Sik;
Yeom, Geun Young

Publication type:

Article

Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH 4 Plasma.

Published in:

Micromachines, 2022, v. 13, n. 2, p. N.PAG, doi. 10.3390/mi13020173

By:

Kim, Ki Seok;
Ji, You-Jin;
Kim, Ki-Hyun;
Kang, Ji-Eun;
Ellingboe, Albert Rogers;
Yeom, Geun Young

Publication type:

Article

Characterization of SiO 2 Plasma Etching with Perfluorocarbon (C 4 F 8 and C 6 F 6) and Hydrofluorocarbon (CHF 3 and C 4 H 2 F 6) Precursors for the Greenhouse Gas Emissions Reduction.

Published in:

Materials (1996-1944), 2023, v. 16, n. 16, p. 5624, doi. 10.3390/ma16165624

By:

Choi, Minsu;
Lee, Youngseok;
You, Yebin;
Cho, Chulhee;
Jeong, Wonnyoung;
Seong, Inho;
Choi, Byeongyeop;
Kim, Sijun;
Seol, Youbin;
You, Shinjae;
Yeom, Geun Young

Publication type:

Article

High open-circuit voltage of graphene-based photovoltaic cells modulated by layer-by-layer transfer.

Published in:

Surface & Interface Analysis: SIA, 2012, v. 44, n. 6, p. 744, doi. 10.1002/sia.3860

By:

Ihm, Kyuwook;
Lee, Kyung-Jae;
Lim, Jong Tae;
Kang, Tai-Hee;
Chung, Sukmin;
Hong, Byung Hee;
Yeom, Geun Young

Publication type:

Article

Recent Advances in Doping of Molybdenum Disulfide: Industrial Applications and Future Prospects.

Published in:

Advanced Materials, 2016, v. 28, n. 41, p. 9024, doi. 10.1002/adma.201506402

By:

Pham, Viet Phuong;
Yeom, Geun Young

Publication type:

Article

High-Performance 2D Rhenium Disulfide (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment.

Published in:

Advanced Materials, 2016, v. 28, n. 32, p. 6985, doi. 10.1002/adma.201601002

By:

Shim, Jaewoo;
Oh, Aely;
Kang, Dong‐Ho;
Oh, Seyong;
Jang, Sung Kyu;
Jeon, Jaeho;
Jeon, Min Hwan;
Kim, Minwoo;
Choi, Changhwan;
Lee, Jaehyeong;
Lee, Sungjoo;
Yeom, Geun Young;
Song, Young Jae;
Park, Jin‐Hong

Publication type:

Article

Thin-Film Transistors: High-Performance 2D Rhenium Disulfide (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment (Adv. Mater. 32/2016).

Published in:

Advanced Materials, 2016, v. 28, n. 32, p. 6984, doi. 10.1002/adma.201670223

By:

Shim, Jaewoo;
Oh, Aely;
Kang, Dong‐Ho;
Oh, Seyong;
Jang, Sung Kyu;
Jeon, Jaeho;
Jeon, Min Hwan;
Kim, Minwoo;
Choi, Changhwan;
Lee, Jaehyeong;
Lee, Sungjoo;
Yeom, Geun Young;
Song, Young Jae;
Park, Jin‐Hong

Publication type:

Article

A High-Performance WSe2/ h-BN Photodetector using a Triphenylphosphine (PPh3)-Based n-Doping Technique.

Published in:

Advanced Materials, 2016, v. 28, n. 24, p. 4824, doi. 10.1002/adma.201600032

By:

Jo, Seo-Hyeon;
Kang, Dong-Ho;
Shim, Jaewoo;
Jeon, Jaeho;
Jeon, Min Hwan;
Yoo, Gwangwe;
Kim, Jinok;
Lee, Jaehyeong;
Yeom, Geun Young;
Lee, Sungjoo;
Yu, Hyun-Yong;
Choi, Changhwan;
Park, Jin-Hong

Publication type:

Article

Low-Temperature Synthesis of Large-Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma-Enhanced Chemical Vapor Deposition.

Published in:

Advanced Materials, 2015, v. 27, n. 35, p. 5223, doi. 10.1002/adma.201501678

By:

Ahn, Chisung;
Lee, Jinhwan;
Kim, Hyeong-U;
Bark, Hunyoung;
Jeon, Minhwan;
Ryu, Gyeong Hee;
Lee, Zonghoon;
Yeom, Geun Young;
Kim, Kwangsu;
Jung, Jaehyuck;
Kim, Youngseok;
Lee, Changgu;
Kim, Taesung

Publication type:

Article

Ultrasensitive MoS2 photodetector by serial nano-bridge multi-heterojunction.

Published in:

Nature Communications, 2019, v. 10, n. 1, p. N.PAG, doi. 10.1038/s41467-019-12592-w

By:

Kim, Ki Seok;
Ji, You Jin;
Kim, Ki Hyun;
Choi, Seunghyuk;
Kang, Dong-Ho;
Heo, Keun;
Cho, Seongjae;
Yim, Soonmin;
Lee, Sungjoo;
Park, Jin-Hong;
Jung, Yeon Sik;
Yeom, Geun Young

Publication type:

Article

Works by Geun-Young Yeom

Enhanced etch characteristics of EUV PR masked SiON through the ion beam grid pulsing technique.

Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module.

Plasma Characteristics of a Ni–Zn Ferrite Enhanced Internal-Type Inductively Coupled Plasma Source Operated at 2 and 13.56 MHz.

Study of Internal Linear Inductively Coupled Plasma Source for Ultra Large-Scale Flat Panel Display Processing.

Plasma Characteristics and Antenna Electrical Characteristics of an Internal Linear Inductively Coupled Plasma Source with a Multi-Polar Magnetic Field.

Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C<sub>4</sub>H<sub>2</sub>F<sub>6</sub>-based gas.

Anisotropic atomic layer etching of W using fluorine radicals/oxygen ion beam.

Linewidth Control and the Improved Adhesion of Inkjet-Printed Ag on Polyimide Substrate, Textured Using Near-Atmospheric Pressure Plasmas.

Plasma Dielectric Etching with C 4 H 2 F 6 Isomers of Low Global-Warming Potential.

A Van Der Waals Reconfigurable Multi‐Valued Logic Device and Circuit Based on Tunable Negative‐Differential‐Resistance Phenomenon (Adv. Mater. 36/2022).

A Van Der Waals Reconfigurable Multi‐Valued Logic Device and Circuit Based on Tunable Negative‐Differential‐Resistance Phenomenon.

An Optogenetics‐Inspired Flexible van der Waals Optoelectronic Synapse and its Application to a Convolutional Neural Network (Adv. Mater. 40/2021).

An Optogenetics‐Inspired Flexible van der Waals Optoelectronic Synapse and its Application to a Convolutional Neural Network.

Direct nanoparticle coating using atmospheric plasma jet.

Selective isotropic etching of SiO<sub>2</sub> over Si<sub>3</sub>N<sub>4</sub> using NF<sub>3</sub>/H<sub>2</sub> remote plasma and methanol vapor.

Cyclic etching of silicon oxide using NF<sub>3</sub>/H<sub>2</sub> remote plasma and NH<sub>3</sub> gas flow.

Monolithic DNApatite: An Elastic Apatite with Sub‐Nanometer Scale Organo–Inorganic Structures (Adv. Mater. 41/2024).

Monolithic DNApatite: An Elastic Apatite with Sub‐Nanometer Scale Organo–Inorganic Structures.

Low-voltage characteristics of MgO-CaO films as a protective layer for AC plasma display panels by e-beam evaporation.

Cyclic Atomic Layer Etching of PdSe<sub>2</sub>.

Nanostructures Fabrication on Ta Thin Film Using Atomic Force Microscope Lithography.

Selective etching of silicon nitride over silicon oxide using ClF<sub>3</sub>/H<sub>2</sub> remote plasma.

Invisible Silver Nanomesh Skin Electrode via Mechanical Press Welding.

Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH 4 Plasma.

Characterization of SiO 2 Plasma Etching with Perfluorocarbon (C 4 F 8 and C 6 F 6) and Hydrofluorocarbon (CHF 3 and C 4 H 2 F 6) Precursors for the Greenhouse Gas Emissions Reduction.

High open-circuit voltage of graphene-based photovoltaic cells modulated by layer-by-layer transfer.

Recent Advances in Doping of Molybdenum Disulfide: Industrial Applications and Future Prospects.

High-Performance 2D Rhenium Disulfide (ReS<sub>2</sub>) Transistors and Photodetectors by Oxygen Plasma Treatment.

Thin-Film Transistors: High-Performance 2D Rhenium Disulfide (ReS<sub>2</sub>) Transistors and Photodetectors by Oxygen Plasma Treatment (Adv. Mater. 32/2016).

A High-Performance WSe<sub>2</sub>/ h-BN Photodetector using a Triphenylphosphine (PPh<sub>3</sub>)-Based n-Doping Technique.

Low-Temperature Synthesis of Large-Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma-Enhanced Chemical Vapor Deposition.

Ultrasensitive MoS<sub>2</sub> photodetector by serial nano-bridge multi-heterojunction.