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Single‐Atom Control of Arsenic Incorporation in Silicon for High‐Yield Artificial Lattice Fabrication.
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- Advanced Materials, 2024, v. 36, n. 24, p. 1, doi. 10.1002/adma.202312282
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Non‐Destructive X‐Ray Imaging of Patterned Delta‐Layer Devices in Silicon.
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- Advanced Electronic Materials, 2023, v. 9, n. 5, p. 1, doi. 10.1002/aelm.202201212
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- Article