A Study on the Improvement of Etch Uniformity in an Ion Beam Etcher with a Magnetized Inductively Coupled Plasma Source.
- Published in:
- Plasma Physics Reports, 2021, v. 47, n. 3, p. 289, doi. 10.1134/S1063780X21030053
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- Publication type:
- Article
Works by Cheong, H.-W.
Results: 2
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2
A receding interface model for the drying of slurry droplets.
- Published in:
- AIChE Journal, 1986, v. 32, n. 8, p. 1334, doi. 10.1002/aic.690320811
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- Publication type:
- Article