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Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography.
- Published in:
- Advanced Materials, 2001, v. 13, n. 15, p. 1174, doi. 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q
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Nanostructured Thin Films of Organic-Organometallic Block Copolymers: One-Step Lithography with Poly(ferrocenylsilanes) by Reactive Ion Etching.
- Published in:
- Advanced Materials, 2000, v. 12, n. 2, p. 98, doi. 10.1002/(SICI)1521-4095(200001)12:2<98::AID-ADMA98>3.0.CO;2-5
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- Article