Effects of gate stack structural and process defectivity on high-k dielectric dependence of NBTI reliability in 32 nm technology node PMOSFETs.
- Published in:
- 2014
- By:
- Publication type:
- journal article
Works by Bukhori, M. F.
Results: 4
1
2
Effects of Gate Stack Structural and Process Defectivity on High-κ Dielectric Dependence of NBTI Reliability in 32 nm Technology Node PMOSFETs.
- Published in:
- Scientific World Journal, 2014, p. 1, doi. 10.1155/2014/490829
- By:
- Publication type:
- Article
3
Correlation Study of Student Achievement at Pre-University Level and Their Corresponding Achievement in the Year-One Undergraduate Course of Circuit Theory at UKM.
- Published in:
- Pertanika Journal of Social Sciences & Humanities, 2016, v. 24, p. 87
- By:
- Publication type:
- Article
4
DIRECT AND INDIRECT PLANT REGENERATIONS OF PINEAPPLE VAR. MD2.
- Published in:
- Malaysian Applied Biology, 2013, v. 42, n. 1, p. 61
- By:
- Publication type:
- Article