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Effect of self‐bias voltage on the nanoscale morphological properties of corn starch‐based films modified by hexamethyldisiloxane plasma.
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- Plasma Processes & Polymers, 2024, v. 21, n. 2, p. 1, doi. 10.1002/ppap.202300101
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- Article
Surface Modification of Starch Films by Plasma.
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- Macromolecular Symposia, 2014, v. 343, n. 1, p. 96, doi. 10.1002/masy.201300199
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- Article
Vapor Barrier Properties of Cold Plasma Treated Corn Starch Films.
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- Coatings (2079-6412), 2022, v. 12, n. 7, p. N.PAG, doi. 10.3390/coatings12071006
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- Article