Plasma-Enhanced Chemical Vapor Deposition of Silicon Films at Low Pressure in GEC Reference Cell.Published in:Plasma Physics Reports, 2020, v. 46, n. 6, p. 667, doi. 10.1134/S1063780X20060094By:Siari, K.;Rebiai, S.;Bahouh, H.;Bouanaka, F.Publication type:Article