Atomic layer deposition of hafnium oxide dielectrics on silicon and germanium substrates.
- Published in:
- Journal of Materials Science: Materials in Electronics, 2008, v. 19, n. 2, p. 119, doi. 10.1007/s10854-007-9337-y
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- Publication type:
- Article
Works matching AU Armstrong, B. M.
Results: 3
1
2
Investigation of stress and structural damage in H and He implanted Ge using micro-Raman mapping technique on bevelled samples.
- Published in:
- Journal of Raman Spectroscopy, 2012, v. 43, n. 3, p. 448, doi. 10.1002/jrs.3052
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- Publication type:
- Article
3
Somatostatin selectively couples to G(o) alpha in HIT-T15 cells.
- Published in:
- 1995
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- Publication type:
- journal article