横向磁场下坩埚转速对半导体级直拉单晶硅熔体中 流场与氧浓度的影响机制
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- Journal of Synthetic Crystals, 2023, v. 52, n. 9, p. 1641
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Works by 罗学涛
Results: 2
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热屏结构对 200 mm 半导体级提拉单晶硅中 氧含量分布的影响.
- Published in:
- Journal of Synthetic Crystals, 2023, v. 52, n. 6, p. 1110
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- Article