热屏结构对300 mm 半导体级单晶硅生长过程温度 分布影响的数值模拟.
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- Journal of Synthetic Crystals, 2024, v. 53, n. 7, p. 1196
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Works matching AU 王黎光
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横向磁场下坩埚转速对半导体级直拉单晶硅熔体中 流场与氧浓度的影响机制
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- Journal of Synthetic Crystals, 2023, v. 52, n. 9, p. 1641
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