Works matching DE "CHEMICAL vapor deposition"
Results: 5000
Silicon‐Nitride‐Integrated Hybrid Optical Fibers: A New Platform for Functional Photonics.
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- Laser & Photonics Reviews, 2025, v. 19, n. 5, p. 1, doi. 10.1002/lpor.202400689
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Prediction of Temperature‐Dependent Stress in 4H‐SiC Using In Situ Nondestructive Raman Spectroscopy Characterization.
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- Laser & Photonics Reviews, 2025, v. 19, n. 3, p. 1, doi. 10.1002/lpor.202401033
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Conformal Growth of Nano‐Patterned Monolayer MoS<sub>2</sub> with Periodic Strain via Patterned Substrate Engineering for High‐performance Photodetectors.
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- Laser & Photonics Reviews, 2025, v. 19, n. 1, p. 1, doi. 10.1002/lpor.202401012
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Angle‐Resolved Polarized Raman Study of Layered Cr<sub>2</sub>Se<sub>3</sub>.
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- Journal of Raman Spectroscopy, 2025, v. 56, n. 1, p. 84, doi. 10.1002/jrs.6741
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Unraveling Stacking Transitions in Twisted Bilayer Graphene: Insights From Intralayer and Interlayer Processes.
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- Journal of Raman Spectroscopy, 2025, v. 56, n. 1, p. 5, doi. 10.1002/jrs.6735
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Property Research on Nano-Micro Crystalline Diamond Coated Tools Lapping Sapphire Wafer.
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- Integrated Ferroelectrics, 2024, v. 240, n. 8/9, p. 1280, doi. 10.1080/10584587.2024.2327929
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Microwave Absorption Properties of Graphite Nanosheet/Carbon Nanofiber Hybrids Prepared by Intercalation Chemical Vapor Deposition.
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- Nanomaterials (2079-4991), 2025, v. 15, n. 5, p. 406, doi. 10.3390/nano15050406
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Temperature-Dependent Morphology Modulation of MoO 2 from 1D Nanoribbons to 2D Nanoflakes for Enhanced Two-Dimensional Electrode Applications.
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- Nanomaterials (2079-4991), 2025, v. 15, n. 5, p. 392, doi. 10.3390/nano15050392
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In Situ Thermal Decomposition of Potassium Borohydride for Borophene Synthesis and Its Application in a High-Performance Non-Volatile Memory Device.
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- Nanomaterials (2079-4991), 2025, v. 15, n. 5, p. 362, doi. 10.3390/nano15050362
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Optimization strategies for graphene-based protection coatings: a review.
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- Corrosion Reviews, 2025, v. 43, n. 1, p. 23, doi. 10.1515/corrrev-2023-0156
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Evaluation and Characterization of High-Uniformity SiN x Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments.
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- Molecules, 2025, v. 30, n. 5, p. 1091, doi. 10.3390/molecules30051091
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Effect of SiN<sub>x</sub>/SiO<sub>2</sub> Passivation Layers on Diffused Front Surface Field in n-type Silicon Wafers.
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- Journal of Nano- & Electronic Physics, 2025, v. 17, n. 1, p. 01002-1, doi. 10.21272/jnep.17(1).01002
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Deposition of ReS<sub>2</sub> Thin Films Using Aerosol-Assisted Chemical Vapor Deposition.
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- Journals Kufa for Chamical, 2024, v. 3, p. 1
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Characterization of C/C Composites Produced Using 3D-preforms by CVD/CVI Method for Biomedical Applications.
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- Sakarya University Journal of Science (SAUJS) / Sakarya Üniversitesi Fen Bilimleri Enstitüsü Dergisi, 2025, v. 29, n. 1, p. 39, doi. 10.16984/saufenbilder.1492476
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Creating ultrathin gold films with the largest continuous area.
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- Chemical Engineering, 2025, v. 122, n. 2, p. 9
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Study of the Multilayer Growth of Polysilicon Layers for Controlling the Deformation of Silicon Structures in the Chemical Vapor Transport Technology.
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- Semiconductors, 2024, v. 58, p. S7, doi. 10.1134/S1063782625700022
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多级结构生物质碳布的制备及其燃料电池 气体扩散层性能.
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- Journal of China University of Petroleum, 2025, v. 49, n. 1, p. 227, doi. 10.3969/j.issn.1673-5005.2025.01.025
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Mist CVD Grown High-Phase-Purity α-Ga<sub>2</sub>O<sub>3</sub> and Its Photoresponse Performance.
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- Journal of Synthetic Crystals, 2025, v. 54, n. 2, p. 233, doi. 10.16553/j.cnki.issn1000-985x.2024.0260
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Substrate Engineering of Single Atom Catalysts Enabled Next-Generation Electrocatalysis to Power a More Sustainable Future.
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- Catalysts (2073-4344), 2025, v. 15, n. 2, p. 137, doi. 10.3390/catal15020137
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In Situ Preparation of Thin-Film Q-Switches Based on Vanadium Dioxide for Pulsed Fiber Lasers.
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- Photonics, 2025, v. 12, n. 2, p. 133, doi. 10.3390/photonics12020133
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Optimization of Erbium-Doped Fiber to Improve Temperature Stability and Efficiency of ASE Sources.
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- Photonics, 2025, v. 12, n. 2, p. 115, doi. 10.3390/photonics12020115
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Environmental Impact of Physical Vapour Deposition and Plasma-Enhanced Chemical Vapour Deposition Technologies for Deposition of Diamond-like Carbon Coatings for Green Tribology.
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- Coatings (2079-6412), 2025, v. 15, n. 2, p. 218, doi. 10.3390/coatings15020218
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Nanomaterials for Energy Storage Systems—A Review.
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- Molecules, 2025, v. 30, n. 4, p. 883, doi. 10.3390/molecules30040883
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Modern innovations in the provision and efficient application of 2D inorganic nanoscale materials.
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- Reviews in Inorganic Chemistry, 2025, v. 45, n. 1, p. 175, doi. 10.1515/revic-2023-0036
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Preparation and Performance Optimization of Fe 2+ :ZnSe Solid Solution by High-Pressure–High-Temperature Method.
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- Materials (1996-1944), 2025, v. 18, n. 4, p. 896, doi. 10.3390/ma18040896
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Optimizing hematite photoanodes: a critical review of hydrothermal, sol–gel, ALD, and electrodeposition techniques.
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- Clean Technologies & Environmental Policy, 2025, v. 27, n. 2, p. 887, doi. 10.1007/s10098-024-03092-7
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Fine control of low-temperature CVD epitaxial growth.
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- Solid State Technology, 2001, v. 44, n. 7, p. 91
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Trends in void-free pre-metal CVD dielectrics.
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- Solid State Technology, 2001, v. 44, n. 3, p. 129
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Sekisui and Chemitronics show nonvacuum plasma CVD equipment.
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- Solid State Technology, 2001, v. 44, n. 3, p. 48
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Equipment and process considerations for ALD.
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- Solid State Technology, 2001, v. 44, n. 1, p. 70
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CVD chamber cleaning.
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- Solid State Technology, 2000, v. 43, n. 12, p. 103
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Etch and CVD process improvements via heated vacuum throttle valves.
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- Solid State Technology, 2000, v. 43, n. 12, p. 80
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New option for PFC reduction during chamber cleaning.
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- Solid State Technology, 2000, v. 43, n. 12, p. 32
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Munich hosts upbeat SEMI Europa show.
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- Solid State Technology, 2000, v. 43, n. 6, p. 56
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TI votes for AMAT's Black Diamond CVD low-k; IBM uses SILK.
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- Solid State Technology, 2000, v. 43, n. 6, p. 46
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Requirements for next-generation gas-flow components.
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- Solid State Technology, 2000, v. 43, n. 3, p. 27
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Practical in situ FTIR for CVD yields revised TEOS-O...model.
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- Solid State Technology, 2000, v. 43, n. 3, p. 20
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Management of TEOS LPCVD process effluents.
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- Solid State Technology, 1999, v. 42, n. 7, p. 151
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Novellus drops parylene, bets on SiOC low-k.
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- Solid State Technology, 1999, v. 42, n. 5, p. 22
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Air gaps lower k of interconnect dielectrics.
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- Solid State Technology, 1999, v. 42, n. 2, p. 51
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Safety and environmental concerns of CVD copper precursors.
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- Solid State Technology, 1998, v. 41, n. 9, p. 101
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Effectiveness of water-based fluorine scrubbing proven.
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- Solid State Technology, 1998, v. 41, n. 9, p. 36
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Barrier and seed layers for damascene copper metallization.
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- Solid State Technology, 1998, v. 41, n. 7, p. 141
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Israel's Nova expands metrology line.
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- Solid State Technology, 1998, v. 41, n. 7, p. 62
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High-throughput W/Ti barrier sequential deposition.
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- Solid State Technology, 1998, v. 41, n. 6, p. 127
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Single-wafer processing of in situ-doped polycrystalline Si and Si1-xGex.
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- Solid State Technology, 1998, v. 41, n. 3, p. S5
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Prediction of radio frequency power effect on silicon nitride deposition using a genetic algorithm based neural network.
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- Surface Engineering, 2006, v. 22, n. 1, p. 63, doi. 10.1179/174329406X84985
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Surface coating of particles by nanospray process and CCVD in circulating fluidised bed.
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- Surface Engineering, 2005, v. 21, n. 1, p. 47, doi. 10.1179/174329405X30075
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Workshop on standardisation of test methods for ceramic coatings.
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- Surface Engineering, 2004, v. 20, n. 5, p. 317, doi. 10.1179/026708404225015004
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Fundamental Aspects and Applications of Low Field Electron Emission from Nanocarbons.
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- Surface Engineering, 2003, v. 19, n. 6, p. 429, doi. 10.1179/026708403225010172
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