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Erratum to: Several Articles in JETP Letters.
- Published in:
- 2022
- By:
- Publication type:
- Correction Notice
Resonant Hybrid Metal–Dielectric Nanostructures for Local Color Generation.
- Published in:
- JETP Letters, 2022, v. 115, n. 4, p. 186, doi. 10.1134/S0021364022040014
- By:
- Publication type:
- Article
Characterization of the Manufacturing Processes to Grow Triple-Junction Solar Cells.
- Published in:
- International Journal of Photoenergy, 2014, p. 1, doi. 10.1155/2014/836284
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- Publication type:
- Article
Study of the Possibility to Increase Annual Electricity Production Using Silicon Solar Cells with a Nanostructured Surface.
- Published in:
- Semiconductors, 2024, v. 58, n. 4, p. 364, doi. 10.1134/S106378262404016X
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- Publication type:
- Article
Plasma Enhanced Atomic Layer Deposition of InP Layers and Multilayer InP/GaP Structures on Si Substrate.
- Published in:
- Semiconductors, 2024, v. 58, n. 2, p. 134, doi. 10.1134/S1063782624020076
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- Publication type:
- Article
Study of Active Regions Based on Multiperiod GaAsN/InAs Superlattice.
- Published in:
- Semiconductors, 2023, v. 57, n. 11, p. 474, doi. 10.1134/S106378262308002X
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- Publication type:
- Article
Impact of Silicon Wafer Surface Treatment on the Morphology of GaP Layers Produced by Plasma Enhanced Atomic Layer Deposition.
- Published in:
- Semiconductors, 2023, v. 57, n. 9, p. 415, doi. 10.1134/S1063782623040176
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- Publication type:
- Article
Effect of Thermal Annealing on the Photovoltaic Properties of GaP/Si Heterostructures Fabricated by Plasma-Enhanced Atomic Layer Deposition.
- Published in:
- Semiconductors, 2019, v. 53, n. 8, p. 1075, doi. 10.1134/S1063782619080207
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- Publication type:
- Article
Precision Chemical Etching of GaP(NAs) Epitaxial Layers for the Formation of Monolithic Optoelectronic Devices.
- Published in:
- Semiconductors, 2018, v. 52, n. 13, p. 1775, doi. 10.1134/S1063782618130092
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- Publication type:
- Article
Formation of Cu<sub>2</sub>O and ZnO Crystal Layers by Magnetron Assisted Sputtering and Their Optical Characterization.
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- Semiconductors, 2018, v. 52, n. 3, p. 383, doi. 10.1134/S1063782618030028
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- Publication type:
- Article
Analysis of light-induced degradation mechanisms in α-Si:H/μ<i>c</i>-Si:H solar photovoltaics.
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- Semiconductors, 2013, v. 47, n. 9, p. 1252, doi. 10.1134/S1063782613090066
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- Publication type:
- Article
Properties of interfaces in GaInP solar cells.
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- Semiconductors, 2009, v. 43, n. 10, p. 1363, doi. 10.1134/S1063782609100194
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- Publication type:
- Article
Visualization of Isofrequency Contours of Strongly Localized Waveguide Modes in Planar Dielectric Structures.
- Published in:
- JETP Letters, 2018, v. 107, n. 1, p. 10, doi. 10.1134/S0021364018010083
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- Publication type:
- Article
Characterization of an a-Si:H/c-Si Interface by Admittance Spectroscopy.
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- Semiconductors, 2005, v. 39, n. 8, p. 904, doi. 10.1134/1.2010683
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- Publication type:
- Article
TEM Study of the Formation and Modification of Nanocrystalline Si Inclusions in a-Si:H Films.
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- Semiconductors, 2004, v. 38, n. 2, p. 221, doi. 10.1134/1.1648381
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- Publication type:
- Article
Effect of Thermal Treatment on Structure and Properties of a-Si:H Films Obtained by Cyclic Deposition.
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- Semiconductors, 2002, v. 36, n. 2, p. 230
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- Publication type:
- Article
Electrical and Photoelectric Properties of a-Si:H Layered Films: The Influence of Thermal Annealing.
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- Semiconductors, 2001, v. 35, n. 3, p. 353, doi. 10.1134/1.1356161
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- Publication type:
- Article
Structure and Properties of a-Si:H Films Grown by Cyclic Deposition.
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- Semiconductors, 2000, v. 34, n. 4, p. 477
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- Publication type:
- Article
Scaling analysis of field-enhanced bandtail hopping transport in amorphous carbon nitride.
- Published in:
- Physica Status Solidi (B), 2007, v. 244, n. 6, p. 2081, doi. 10.1002/pssb.200642043
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- Publication type:
- Article
Effect of Cryogenic Dry Etching on Minority Charge Carrier Lifetime in Silicon.
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- Physica Status Solidi. A: Applications & Materials Science, 2020, v. 217, n. 4, p. 1, doi. 10.1002/pssa.201900534
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- Publication type:
- Article
Study of GaP Nucleation Layers Grown on Si by Plasma‐Enhanced Atomic Layer Deposition.
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- Physica Status Solidi. A: Applications & Materials Science, 2020, v. 217, n. 4, p. 1, doi. 10.1002/pssa.201900532
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- Publication type:
- Article
Effect of Cryogenic Dry Etching on Minority Charge Carrier Lifetime in Silicon.
- Published in:
- Physica Status Solidi. A: Applications & Materials Science, 2020, v. 217, n. 3, p. 1, doi. 10.1002/pssa.201900534
- By:
- Publication type:
- Article
Study of GaP Nucleation Layers Grown on Si by Plasma‐Enhanced Atomic Layer Deposition.
- Published in:
- Physica Status Solidi. A: Applications & Materials Science, 2020, v. 217, n. 3, p. 1, doi. 10.1002/pssa.201900532
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- Publication type:
- Article
Interface Properties of GaP/Si Heterojunction Fabricated by PE‐ALD.
- Published in:
- Physica Status Solidi. A: Applications & Materials Science, 2019, v. 216, n. 10, p. N.PAG, doi. 10.1002/pssa.201800617
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- Publication type:
- Article
Influence of PE-ALD of GaP on the Silicon Wafers Quality.
- Published in:
- Physica Status Solidi. A: Applications & Materials Science, 2017, v. 214, n. 12, p. n/a, doi. 10.1002/pssa.201700685
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- Publication type:
- Article
Study of InP/GaP Quantum Wells Grown by Vapor Phase Epitaxy.
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- Technical Physics Letters, 2023, v. 49, p. S163, doi. 10.1134/S1063785023900649
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- Publication type:
- Article
Study of Schottky Diodes Based on an Array of Silicon Wires Obtained by Cryogenic Dry Etching.
- Published in:
- Technical Physics Letters, 2022, v. 48, n. 2, p. 23, doi. 10.1134/S106378502202002X
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- Publication type:
- Article
Admittance Spectroscopy of Solar Cells Based on Selective Contact MoO<sub>x</sub>/Si Junction.
- Published in:
- Technical Physics Letters, 2021, v. 47, n. 11, p. 785, doi. 10.1134/S1063785021080162
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- Publication type:
- Article
Formation of Heterostructures of GaP/Si Photoconverters by the Combined Method of MOVPE and PEALD.
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- Technical Physics Letters, 2021, v. 47, n. 10, p. 730, doi. 10.1134/S1063785021070270
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- Publication type:
- Article
A Selective BP/Si Contact Formed by Low-Temperature Plasma-Enhanced Atomic Layer Deposition.
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- Technical Physics Letters, 2021, v. 47, n. 1, p. 96, doi. 10.1134/S1063785021010211
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- Publication type:
- Article
Using MoOx/p-Si Selective Contact for Evaluation of the Degradation of a Near-Surface Region of Silicon.
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- Technical Physics Letters, 2020, v. 46, n. 12, p. 1245, doi. 10.1134/S1063785020120202
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- Publication type:
- Article
Electrical and optical properties of nanosized films of doped zinc and indium oxides deposited by RF magnetron sputtering at room temperature.
- Published in:
- Technical Physics Letters, 2015, v. 41, n. 8, p. 804, doi. 10.1134/S1063785015080325
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- Publication type:
- Article
Full Silicon Tandem Solar Cells Based on Vertically Aligned Nanostructures.
- Published in:
- International Journal of Photoenergy, 2022, p. 1, doi. 10.1155/2022/8799060
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- Publication type:
- Article