Mask gate CD variations reduced with double-step maskmaking*.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 203
- By:
- Publication type:
- Article
Works matching IS 0038111X AND DT 2001 AND VI 44 AND IP 7
Results: 24
1
2
Partner for profit using the gainshare IP fee model.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 271
- By:
- Publication type:
- Article
3
New metrology challenges met by elastic probe technology.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 177
- By:
- Publication type:
- Article
4
Characterizing resists and films with VUV spectroscopic ellipsometry.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 165
- By:
- Publication type:
- Article
5
Safety solutions for high-pressure gas cylinders.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 153
- By:
- Publication type:
- Article
6
Cluster tool sputtering for compound semiconductors.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 145
- By:
- Publication type:
- Article
7
PRODUCT PANORAMA.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 209
- Publication type:
- Article
8
Catalytic technology for PFC emissions control.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 189
- By:
- Publication type:
- Article
9
Analyzing issues for 300mm "backend" lithography.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 138
- By:
- Publication type:
- Article
10
Fine control of low-temperature CVD epitaxial growth.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 91
- By:
- Publication type:
- Article
11
The "soft" art of improving fab production schedules.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 127
- By:
- Publication type:
- Article
12
Process and environmental benefits of HF-ozone cleaning chemistry.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 115
- By:
- Publication type:
- Article
13
Spin-on stacked films for low-k[sub eff] dielectrics.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 105
- By:
- Publication type:
- Article
14
Preference Calculus.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 132
- Publication type:
- Article
15
Thin film PVD and strategies for optimized UHV-XHV pumping.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 81
- By:
- Publication type:
- Article
16
Development and advantages of step-and-flash lithography.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 67
- By:
- Publication type:
- Article
17
Better EDA tool integration needed for growing SoC market.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 58
- By:
- Publication type:
- Article
18
Despite slowdown, European equipment suppliers buoyant.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 54
- Publication type:
- Article
19
Lambda Physik and Jenoptik form joint venture.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 54
- Publication type:
- Article
20
Chipmakers to compete with assembly houses for SiP.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 51
- Publication type:
- Article
21
System-on-a-chip challenged by stacked system-in-a-package technology*.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 48
- By:
- Publication type:
- Article
22
TECHNOLOGY NEWS.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 34
- Publication type:
- Article
23
WORLD NEWS.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 24
- Publication type:
- Article
24
What's new? Everything! How can we ever get all of it to work together?
- Published in:
- 2001
- By:
- Publication type:
- Editorial