Vibrationsbasierende White-Etching-Cracks-Detektion an Wälzlagern.
- Published in:
- Technisches Messen, 2018, v. 85, n. 6, p. 443, doi. 10.1515/teme-2017-0141
- By:
- Publication type:
- Article
Works matching Etching
Results: 5000
1
2
Investigation into SiO 2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled.
- Published in:
- Nanomaterials (2079-4991), 2022, v. 12, n. 24, p. 4457, doi. 10.3390/nano12244457
- By:
- Publication type:
- Article
3
Curved Structure of Si by Improving Etching Direction Controllability in Magnetically Guided Metal-Assisted Chemical Etching.
- Published in:
- Micromachines, 2020, v. 11, n. 8, p. 744, doi. 10.3390/mi11080744
- By:
- Publication type:
- Article
4
Influence of erbium, chromium-doped: Yttrium scandium-gallium-garnet laser etching and traditional etching systems on depth of resin penetration in enamel: A confocal laser scanning electron microscope study.
- Published in:
- Journal of Pharmacy & Bioallied Sciences, 2015, v. 7, p. S616, doi. 10.4103/0975-7406.163571
- By:
- Publication type:
- Article
5
Morphological Evaluation of the Adhesive/Enamel Interfaces of Two-step Self-etching Adhesives and Multimode One-bottle Self-etching Adhesives.
- Published in:
- Journal of Adhesive Dentistry, 2016, v. 18, n. 3, p. 223, doi. 10.3290/j.jad.a36135
- By:
- Publication type:
- Article
6
Reconsidering the Double Etching of Enamel: Do Self-etching Primers Contaminate Phosphoric Acid-etched Enamel?
- Published in:
- Journal of Adhesive Dentistry, 2013, v. 15, n. 2, p. 107, doi. 10.3290/j.jad.a28671
- By:
- Publication type:
- Article
7
Effect of Phosphoric Acid Etching and Self-etching Primer Application Methods on Dentinal Shear Bond Strength.
- Published in:
- Journal of Adhesive Dentistry, 2008, v. 10, n. 5, p. 345
- By:
- Publication type:
- Article
8
Effect of Acid Etching Time and a Self-etching Adhesive on the Shear Bond Strength of Composite Resin to Porcelain.
- Published in:
- Journal of Adhesive Dentistry, 2006, v. 8, n. 1, p. 21
- By:
- Publication type:
- Article
9
Combination of Reactive-Ion Etching and Chemical Etching as a Method for Optimizing the Surface Relief on AlGaInN Heterostructures.
- Published in:
- Semiconductors, 2020, v. 54, n. 10, p. 1310, doi. 10.1134/S1063782620100218
- By:
- Publication type:
- Article
10
Study on the Influence of Etchant Composition and Etching Process on the Precision of Stainless-Steel Microchannel and Etching Mechanism.
- Published in:
- Advanced Engineering Materials, 2024, v. 26, n. 10, p. 1, doi. 10.1002/adem.202301731
- By:
- Publication type:
- Article
11
Demineralization adjacent to orthodontic brackets after application of conventional and self-etching primer systems.
- Published in:
- Journal of Orofacial Orthopedics/Fortschritte der Kieferorthopadie, 2014, v. 75, n. 5, p. 358, doi. 10.1007/s00056-014-0233-9
- By:
- Publication type:
- Article
12
Shear Bond Strength of Orthodontic Brackets Bonded with Self-etching Primer to Intact and Pre-conditioned Human Enamel.
- Published in:
- Journal of Orofacial Orthopedics/Fortschritte der Kieferorthopadie, 2008, v. 69, n. 5, p. 383, doi. 10.1007/s00056-008-0812-8
- By:
- Publication type:
- Article
13
Reactive Ion Etching and Ion Beam Etching for Ferroelectric Memories.
- Published in:
- Integrated Ferroelectrics, 2004, v. 61, n. 1, p. 213, doi. 10.1080/10584580490459288
- By:
- Publication type:
- Article
14
Enamel tensile bond strength and morphology of resin–enamel interface created by acid etching system with or without moisture and self-etching priming system.
- Published in:
- Journal of Oral Rehabilitation, 2002, v. 29, n. 6, p. 528, doi. 10.1046/j.1365-2842.2002.00855.x
- By:
- Publication type:
- Article
15
The Effect of Metal Primer on the Shear Bond Strength of Denture Base Resin to Base Metal Alloy after Electrolytic Etching and Laser Etching: An In Vitro Study.
- Published in:
- Journal of International Oral Health, 2015, v. 7, n. 12, p. 110
- By:
- Publication type:
- Article
16
Micro-shear bond strengths and etching efficacy of a two-step self-etching adhesive system to fluorosed and non-fluorosed enamel.
- Published in:
- European Journal of Oral Sciences, 2009, v. 117, n. 2, p. 182, doi. 10.1111/j.1600-0722.2009.00609.x
- By:
- Publication type:
- Article
17
Investigation of a Macromolecular Additive on the Decrease of the Aluminum Horizontal Etching Rate in the Wet Etching Process.
- Published in:
- Metals (2075-4701), 2022, v. 12, n. 5, p. 813, doi. 10.3390/met12050813
- By:
- Publication type:
- Article
18
Enamel bonding of self-etching and phosphoric acid-etching orthodontic adhesives in simulated clinical conditions: Debonding force and enamel surface.
- Published in:
- Dental Materials Journal, 2009, v. 28, n. 4, p. 419
- By:
- Publication type:
- Article
19
Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching.
- Published in:
- Plasma Chemistry & Plasma Processing, 2020, v. 40, n. 1, p. 423, doi. 10.1007/s11090-019-10025-6
- By:
- Publication type:
- Article
20
An In Vitro Study to Compare the Shear Bond Strength of Orthodontic Brackets Bonded to Permanent Teeth by Using Conventional Acid-Etching and Self-Etching Primers.
- Published in:
- Dental Hypotheses, 2021, v. 12, n. 3, p. 155, doi. 10.4103/denthyp.denthyp_41_21
- By:
- Publication type:
- Article
21
Low global warming C<sub>5</sub>F<sub>10</sub>O isomers for plasma atomic layer etching and reactive ion etching of SiO<sub>2</sub> and Si<sub>3</sub>N<sub>4</sub>.
- Published in:
- Plasma Processes & Polymers, 2024, v. 21, n. 5, p. 1, doi. 10.1002/ppap.202300216
- By:
- Publication type:
- Article
22
Atomic layer etching of SiO<sub>2</sub> with Ar and CHF <sub>3</sub> plasmas: A self‐limiting process for aspect ratio independent etching.
- Published in:
- Plasma Processes & Polymers, 2019, v. 16, n. 9, p. N.PAG, doi. 10.1002/ppap.201900051
- By:
- Publication type:
- Article
23
The effect of pre-etching with 37% orthophosphoric acid on the shear bond strength of orthodontic brackets bonded using self-etching primer-adhesive system.
- Published in:
- 2016
- By:
- Publication type:
- journal article
24
Correlation between the Grain Orientation Dependence of Color Etching and Chemical Etching.
- Published in:
- Microscopy & Microanalysis, 2012, v. 18, n. 6, p. 1389, doi. 10.1017/S1431927612013554
- By:
- Publication type:
- Article
25
Reactive ion etching of 4H-SiC with BCl<sub>3</sub> plasma.
- Published in:
- Przegląd Elektrotechniczny, 2021, v. 97, n. 2, p. 57, doi. 10.15199/48.2021.02.14
- By:
- Publication type:
- Article
26
Formation Mechanisms and Crack Propagation Behaviors of White Etching Layers and Brown Etching Layers on Raceways of Failure Bearings.
- Published in:
- Lubricants (2075-4442), 2024, v. 12, n. 2, p. 59, doi. 10.3390/lubricants12020059
- By:
- Publication type:
- Article
27
Etching Patterns of Self-Etching Primers in Relation to Shear Bond Strength on Unground Enamel Samples.
- Published in:
- Dentistry Journal, 2021, v. 9, n. 11, p. 138, doi. 10.3390/dj9110138
- By:
- Publication type:
- Article
28
Dry Etching Characteristics of InGaZnO Thin Films Under Inductively Coupled Plasma–Reactive-Ion Etching with Hydrochloride and Argon Gas Mixture.
- Published in:
- Materials (1996-1944), 2024, v. 17, n. 24, p. 6241, doi. 10.3390/ma17246241
- By:
- Publication type:
- Article
29
Anisotropic Etching of InGaN Thin Films with Photoelectrochemical Etching to Form Quantum Dots.
- Published in:
- Materials (1996-1944), 2023, v. 16, n. 5, p. 1890, doi. 10.3390/ma16051890
- By:
- Publication type:
- Article
30
Complementary etching behavior of alkali, metal‐catalyzed chemical, and post‐etching of multicrystalline silicon wafers.
- Published in:
- Progress in Photovoltaics, 2019, v. 27, n. 6, p. 511, doi. 10.1002/pip.3125
- By:
- Publication type:
- Article
31
Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment.
- Published in:
- Applied Sciences (2076-3417), 2022, v. 12, n. 11, p. 5684, doi. 10.3390/app12115684
- By:
- Publication type:
- Article
32
Comparison of shear bond strength of composite resin to enamel surface with laser etching versus acid etching: An in vitro evaluation.
- Published in:
- Journal of Conservative Dentistry, 2014, v. 17, n. 4, p. 320, doi. 10.4103/0972-0707.136438
- By:
- Publication type:
- Article
33
Low-Damage and Self-Limiting (Al)GaN Etching Process through Atomic Layer Etching Using O 2 and BCl 3 Plasma.
- Published in:
- Coatings (2079-6412), 2021, v. 11, n. 3, p. 268, doi. 10.3390/coatings11030268
- By:
- Publication type:
- Article
34
Study on the preparation of porous polyethylene glycol terephthalate film and the influencing factors of etching rate.
- Published in:
- Polymer Engineering & Science, 2024, v. 64, n. 5, p. 2064, doi. 10.1002/pen.26672
- By:
- Publication type:
- Article
35
Cavity Etching Behavior on the M‐Plane of Sapphire Crystal.
- Published in:
- Crystal Research & Technology, 2022, v. 57, n. 11, p. 1, doi. 10.1002/crat.202200090
- By:
- Publication type:
- Article
36
Accurate dry etching technique for germanium waveguide by using CHF<sub>3</sub> based inductively coupled plasma.
- Published in:
- Electronics Letters (Wiley-Blackwell), 2016, v. 52, n. 21, p. 1868, doi. 10.1049/el.2016.2846
- By:
- Publication type:
- Article
37
Locally non‐uniform oxidation in self‐terminating thermal oxidation assisted wet etching technique for AlGaN/GaN heterostructure.
- Published in:
- Electronics Letters (Wiley-Blackwell), 2015, v. 51, n. 24, p. 1932, doi. 10.1049/el.2015.1755
- By:
- Publication type:
- Article
38
Investigation of oxidation process in self‐terminating gate recess wet etching technique for AlGaN/GaN normally‐off MOSFETs.
- Published in:
- Electronics Letters (Wiley-Blackwell), 2014, v. 50, n. 25, p. 1980, doi. 10.1049/el.2014.2790
- By:
- Publication type:
- Article
39
Electrochemical macroporous silicon etching with current compensation.
- Published in:
- Electronics Letters (Wiley-Blackwell), 2014, v. 50, n. 19, p. 1373, doi. 10.1049/el.2014.1662
- By:
- Publication type:
- Article
40
ОКРЕМІ АСПЕКТИ ВИКЛАДАННЯ ТЕХНІКИ ОФОРТА В КИЇВСЬКІЙ АКАДЕМІЇ МИСТЕЦТВ
- Published in:
- Arts & Education / Mistectvo ta Osvita, 2019, n. 3, p. 26, doi. 10.32405/2308-8885-2019-3-26-31
- By:
- Publication type:
- Article
41
基于金刚石钝化散热的栅区微纳尺度刻蚀研究.
- Published in:
- Electronic Components & Materials, 2022, v. 41, n. 3, p. 309, doi. 10.14106/j.cnki.1001-2028.2022.1792
- By:
- Publication type:
- Article
42
铝箔交流腐蚀过程中添加剂的筛选研究.
- Published in:
- Electronic Components & Materials, 2021, v. 40, n. 5, p. 436, doi. 10.14106/j.cnki.1001-2028.2021.1776
- By:
- Publication type:
- Article
43
硫酸对铝箔交流腐蚀影响机理的研究.
- Published in:
- Electronic Components & Materials, 2021, v. 40, n. 4, p. 344, doi. 10.14106/j.cnki.1001-2028.2021.1728
- By:
- Publication type:
- Article
44
刻蚀方法对Ti<sub>3</sub> C<sub>2</sub> 二维材料层状结构的影响.
- Published in:
- Electronic Components & Materials, 2020, v. 39, n. 7, p. 72
- By:
- Publication type:
- Article
45
基于片内热管理应用的碳化硅深孔刻蚀研究.
- Published in:
- Electronic Components & Materials, 2019, v. 38, n. 9, p. 99, doi. 10.14106/j.cnki.1001-2028.2019.09.016
- By:
- Publication type:
- Article
46
电化学湿法腐蚀法制备硅微柱阵列.
- Published in:
- Electronic Components & Materials, 2018, v. 37, n. 11, p. 26, doi. 10.14106/j.cnki.1001-2028.2018.11.004
- By:
- Publication type:
- Article
47
SOME INVESTIGATIONS ON THE ANISOTROPY OF THE CHEMICAL ETCHING OF (h k 0) AND (h h l) SILICON PLATES IN A NaOH 35% SOLUTION. PART III: DETERMINATION OF A DATABASE FOR THE SIMULATOR TENSOSIM AND PREDICTION OF 2D ETCHING SHAPES.
- Published in:
- Active & Passive Electronic Components, 2003, v. 26, n. 2, p. 95
- By:
- Publication type:
- Article
48
Разработка методов выделения бинаризованных фрагментов ямок травления пластины полупроводника
- Published in:
- Technology Audit & Production Reserves, 2016, v. 3, n. 1(29), p. 60, doi. 10.15587/2312-8372.2016.71988
- By:
- Publication type:
- Article
49
Influence of cutting parameters on the formation of white etching layers in BTA deep hole drilling.
- Published in:
- Technisches Messen, 2020, v. 87, n. 11, p. 674, doi. 10.1515/teme-2020-0046
- By:
- Publication type:
- Article
50
Valence fragmentation dynamics of a promising low global warming etching gas CF<sub>3</sub>CHCF<sub>2</sub>.
- Published in:
- Scientific Reports, 2025, v. 15, n. 1, p. 1, doi. 10.1038/s41598-025-94119-6
- By:
- Publication type:
- Article