Works matching DE "LITHOGRAPHY"
Results: 1924
Signs of the Times: Outdoor Theatrical Advertising in the Nineteenth Century.
- Published in:
- Nineteenth Century Theatre & Film, 2018, v. 45, n. 2, p. 173, doi. 10.1177/1748372718818192
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- Article
Lithographs.
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- Technology Teacher, 1994, v. 53, n. 6, p. 3
- Publication type:
- Article
The status of 193nm technology.
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- Solid State Technology, 2001, v. 44, n. 11, p. 54
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- Article
New technology tackles maskmaking challenges.
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- Solid State Technology, 2001, v. 44, n. 8, p. 26
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- Article
Mask gate CD variations reduced with double-step maskmaking*.
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- Solid State Technology, 2001, v. 44, n. 7, p. 203
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- Article
Analyzing issues for 300mm "backend" lithography.
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- Solid State Technology, 2001, v. 44, n. 7, p. 138
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- Article
Development and advantages of step-and-flash lithography.
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- Solid State Technology, 2001, v. 44, n. 7, p. 67
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- Article
Industry's problems, solutions exposed at lithography's annual showcase.
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- Solid State Technology, 2001, v. 44, n. 5, p. 33
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- Article
Top surface imaging improves copper process resolution.
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- Solid State Technology, 2001, v. 44, n. 3, p. 71
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- Article
Plastic LEDs deliver more light, applications about to boom.
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- Solid State Technology, 2001, v. 44, n. 3, p. 32
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- Article
Next-generation litho progress, innovative technologies at MRS.
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- Solid State Technology, 2001, v. 44, n. 2, p. 32
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- Article
Advanced lithography needs rigorously tested fused silica glass.
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- Solid State Technology, 2001, v. 44, n. 1, p. 111
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- Article
Strong phase shift mask designs with lower cost.
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- Solid State Technology, 2001, v. 44, n. 1, p. 104
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- Article
Nodal predictions.
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- Solid State Technology, 2001, v. 44, n. 1, p. 62
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- Article
The lithography equipment marketplace.
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- Solid State Technology, 2001, v. 44, n. 1, p. 58
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- Article
Interface conference shows optical lithography's milestones.
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- Solid State Technology, 2001, v. 44, n. 1, p. 42
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- Article
Improve yields, enhance CDs with integrated DUV resist track.
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- Solid State Technology, 2000, v. 43, n. 10, p. 135
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- Article
Direct temperature metrology helps minimize CA-resist CD variation.
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- Solid State Technology, 2000, v. 43, n. 9, p. 139
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- Article
The technical considerations of extending optical lithography.
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- Solid State Technology, 2000, v. 43, n. 9, p. 97
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- Article
Moore's Law switching to a subwavelength track.
- Published in:
- Solid State Technology, 2000, v. 43, n. 8, p. 184
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- Publication type:
- Article
Lithography.
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- Solid State Technology, 2000, v. 43, n. 8, p. 152
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- Article
Substrates with topography.
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- Solid State Technology, 2000, v. 43, n. 8, p. 127
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- Article
Beneath the MEEF.
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- Solid State Technology, 2000, v. 43, n. 8, p. 107
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- Article
Excimer lasers for future lithography light sources.
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- Solid State Technology, 2000, v. 43, n. 7, p. 255
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- Article
Accurate metrology of epi pattern shift.
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- Solid State Technology, 2000, v. 43, n. 6, p. 187
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- Article
Expanding capabilities in existing fabs with lithography tool-matching.
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- Solid State Technology, 2000, v. 43, n. 6, p. 97
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- Article
French EUV development program under way.
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- Solid State Technology, 2000, v. 43, n. 6, p. 56
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- Article
SC300 finds DUV problems.
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- Solid State Technology, 2000, v. 43, n. 6, p. 46
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- Article
Industry Roadmap likely to be overtaken.
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- Solid State Technology, 2000, v. 43, n. 6, p. 36
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- Publication type:
- Article
So many options, so little time: Why optics is forever in lithography.
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- Solid State Technology, 2000, v. 43, n. 5, p. 192
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- Article
Is there light at the end of the NGL tunnel?
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- Solid State Technology, 2000, v. 43, n. 5, p. 51
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- Article
NIST's Potzick plans neolithography consortium.
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- Solid State Technology, 2000, v. 43, n. 5, p. 34
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- Article
Lithography's nemesis exposed.
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- Solid State Technology, 2000, v. 43, n. 3, p. 18
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- Article
Interface `99: Focus on future litho costs.
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- Solid State Technology, 2000, v. 43, n. 2, p. 25
- Publication type:
- Article
EUV & EPL: Int'l SEMATECH says two NGL options may co-exist.
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- Solid State Technology, 2000, v. 43, n. 2, p. 23
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- Article
A `breakthrough' in x-ray lithography.
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- Solid State Technology, 2000, v. 43, n. 2, p. 18
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- Publication type:
- Article
SVGL puts up fight for 130nm node.
- Published in:
- Solid State Technology, 1999, v. 42, n. 12, p. 22
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- Article
Significant progress with pilot-line 300mm lithography.
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- Solid State Technology, 1999, v. 42, n. 12, p. 18
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- Article
Lithography's need for partnerships.
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- Solid State Technology, 1999, v. 42, n. 9, p. 122
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- Article
Thin-film head lithography overtaking silicon.
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- Solid State Technology, 1999, v. 42, n. 9, p. 89
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- Article
Litho meeting: 4x reduction ratio to stay, for now.
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- Solid State Technology, 1999, v. 42, n. 8, p. 26
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- Article
157nm optical lithography: The accomplishments and the challenges.
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- Solid State Technology, 1999, v. 42, n. 6, p. 57
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- Article
Single-layer resist design for 193nm lithography.
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- Solid State Technology, 1999, v. 42, n. 5, p. 29
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- Article
Full speed ahead on 157-nm lithography.
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- Solid State Technology, 1999, v. 42, n. 4, p. 26
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- Article
1999's `big bang' of NGL activity.
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- Solid State Technology, 1999, v. 42, n. 4, p. 22
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- Article
100-nm contact holes with KrF lithography.
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- Solid State Technology, 1999, v. 42, n. 3, p. 22
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- Article
Worldwide highlights.
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- Solid State Technology, 1999, v. 42, n. 3, p. 16
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- Article
Lithography: The road ahead.
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- Solid State Technology, 1999, v. 42, n. 2, p. 84
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- Article
Optical lithography to 2000 and beyond.
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- Solid State Technology, 1999, v. 42, n. 2, p. 31
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- Article
Is the roadmap losing its effectiveness?
- Published in:
- 1999
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- Publication type:
- Editorial