Works matching DE "EXTREME ultraviolet lithography"
Results: 157
A giant bid to etch tiny circuits.
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- Nature, 2012, v. 487, n. 7408, p. 419, doi. 10.1038/487419a
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- Article
Numerical optimization of the electrical characteristics of an EUV laser on 3 p-3 s transition in neonlike argon ions in low-inductance capillary-type discharge.
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- Technical Physics Letters, 2017, v. 43, n. 1, p. 31, doi. 10.1134/S1063785016120166
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- Article
Comparative Study of the Thermal Stability of Be-Based Extreme Ultraviolet Pellicles.
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- Technical Physics, 2023, v. 68, p. S630, doi. 10.1134/S106378422390098X
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- Article
New polyphenols of the fluorene family and positive-tone photoresists based on them for 22-nm nanolithography.
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- Doklady Chemistry, 2012, v. 442, n. 1, p. 7, doi. 10.1134/S0012500812010041
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- Article
Extreme ultraviolet tomography of multi-jet gas puff target for high-order harmonic generation.
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- Applied Physics B: Lasers & Optics, 2014, v. 117, n. 1, p. 253, doi. 10.1007/s00340-014-5829-7
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- Article
Laser-plasma extreme ultraviolet source at 6.7 nm using a rotating cryogenic Xe target.
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- Applied Physics B: Lasers & Optics, 2012, v. 108, n. 4, p. 743, doi. 10.1007/s00340-012-5215-2
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- Article
Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target.
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- Applied Physics B: Lasers & Optics, 2010, v. 101, n. 4, p. 773, doi. 10.1007/s00340-010-4327-9
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Toward single attosecond pulses using harmonic emission from solid-density plasmas.
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- Applied Physics B: Lasers & Optics, 2010, v. 101, n. 3, p. 511, doi. 10.1007/s00340-010-4281-6
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Laser–plasma–source debris-related investigations: an aspect of the ENEA micro-exposure tool.
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- Applied Physics B: Lasers & Optics, 2009, v. 96, n. 2/3, p. 479, doi. 10.1007/s00340-009-3583-z
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- Article
Displacement Analysis of Solar Magnetic Field Images in EUV Wavelengths of Space Solar Telescope.
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- International Journal of Pattern Recognition & Artificial Intelligence, 2019, v. 33, n. 3, p. N.PAG, doi. 10.1142/S0218001419500058
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Spectroscopic study of EUV and SXR transitions of Cs XXV.
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- Canadian Journal of Physics, 2018, v. 96, n. 8, p. 871, doi. 10.1139/cjp-2017-0359
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- Article
The US Made the Dutch an Offer They Couldn't Refuse.
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- CounterPunch, 2024, p. 1
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The Nightmare of Great Power Rivalry Over Taiwan.
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- CounterPunch, 2023, p. 1
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Delayed response of the global total electron content to solar EUV variations.
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- Advances in Radio Science, 2016, v. 14, p. 175, doi. 10.5194/ars-14-175-2016
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- Article
Ni-Al Alloys as Alternative EUV Mask Absorber.
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- Applied Sciences (2076-3417), 2018, v. 8, n. 4, p. 521, doi. 10.3390/app8040521
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- Article
Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems.
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- Polymers (20734360), 2024, v. 16, n. 6, p. 846, doi. 10.3390/polym16060846
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- Article
Coarse-Grained Modeling of EUV Patterning Process Reflecting Photochemical Reactions and Chain Conformations.
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- Polymers (20734360), 2023, v. 15, n. 9, p. 1988, doi. 10.3390/polym15091988
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ULE<sup>®</sup>Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates.
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- International Journal of Applied Glass Science, 2014, v. 5, n. 1, p. 82, doi. 10.1111/ijag.12041
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Measurement of the Imaginary Index of Refraction of UOx in the Extreme Ultraviolet.
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- Journal of the Utah Academy of Sciences, Arts & Letters, 2010, v. 87, p. 255
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Moving magnet multi-DOF planar actuator technology with contactless energy and data transfer.
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- Electromotion, 2009, v. 16, n. 2, p. 53
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- Article
Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method.
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- European Journal of Inorganic Chemistry, 2019, v. 2019, n. 38, p. 4136, doi. 10.1002/ejic.201900745
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- Article
Magnetic jam in the corona of the Sun.
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- Nature Physics, 2015, v. 11, n. 6, p. 492, doi. 10.1038/nphys3315
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- Article
Evaluation of H<sub>2</sub> Plasma-Induced Damage in Materials for EUV Lithography.
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- Advanced Materials Interfaces, 2024, v. 11, n. 7, p. 1, doi. 10.1002/admi.202300867
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- Article
Vapor‐Phase Infiltrated Organic–Inorganic Positive‐Tone Hybrid Photoresist for Extreme UV Lithography.
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- Advanced Materials Interfaces, 2023, v. 10, n. 28, p. 1, doi. 10.1002/admi.202300420
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- Article
Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology.
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- Advanced Materials Interfaces, 2023, v. 10, n. 10, p. 1, doi. 10.1002/admi.202202489
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- Article
The 100 mm × 100 mm Extreme Ultraviolet Graphite Pellicle: Nano‐Pellicle Production Using the Lowest Free Energy at the Graphite–Water Interface.
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- Advanced Materials Interfaces, 2020, v. 7, n. 24, p. 1, doi. 10.1002/admi.202001141
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- Article
Temporal response of silicon EUV and soft X-ray detectors.
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- Instruments & Experimental Techniques, 2015, v. 58, n. 1, p. 102, doi. 10.1134/S0020441215010017
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Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration.
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- Optical Engineering, 2016, v. 55, n. 9, p. 095108-1, doi. 10.1117/1.OE.55.9.095108
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Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process.
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- Optical Engineering, 2015, v. 54, n. 7, p. 1, doi. 10.1117/1.OE.54.7.075102
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- Article
Grouping design method with real ray tracing model for extreme ultraviolet lithographic objective.
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- Optical Engineering, 2013, v. 52, n. 12, p. 1, doi. 10.1117/1.OE.52.12.125102
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- Article
Effectiveness of Mo–Au Gibbsian segregating alloys and the surface removal effect on the Gibbsian segregating performance for extreme ultraviolet collector optics.
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- Optical Engineering, 2009, v. 48, n. 5, p. 056501, doi. 10.1117/1.3126002
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Research on Nanometer Precision Measurement Method of High Order Even Aspheres.
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- Applied Sciences (2076-3417), 2024, v. 14, n. 21, p. 9969, doi. 10.3390/app14219969
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- Article
EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology.
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- Applied Sciences (2076-3417), 2019, v. 9, n. 14, p. 2827, doi. 10.3390/app9142827
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Nanoparticle Adhesion Models: Applications in Particulate Contaminant Removal from Extreme Ultraviolet Lithography Photomasks.
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- Journal of Adhesion Science & Technology, 2011, v. 25, n. 8, p. 781, doi. 10.1163/016942410X511123
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- Article
Particle Cleaning of EUV Reticles.
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- Journal of Adhesion Science & Technology, 2009, v. 23, n. 12, p. 1603, doi. 10.1163/156856109X440975
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Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography.
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- Micromachines, 2024, v. 15, n. 9, p. 1122, doi. 10.3390/mi15091122
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Line-Edge Roughness from Extreme Ultraviolet Lithography to Fin-Field-Effect-Transistor: Computational Study.
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- Micromachines, 2021, v. 12, n. 12, p. 1493, doi. 10.3390/mi12121493
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Prediction of particle deposition velocity onto an extreme ultraviolet lithography mask in parallel airflow considering electrophoresis.
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- International Journal of Modern Physics C: Computational Physics & Physical Computation, 2014, v. 25, n. 6, p. -1, doi. 10.1142/S0129183114500107
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- Article
Quantum Dot Channel (QDC) FETs with Wraparound II-VI Gate Insulators: Numerical Simulations.
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- Journal of Electronic Materials, 2016, v. 45, n. 11, p. 5663, doi. 10.1007/s11664-016-4812-y
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Correction to: Investigation of recurrent EUV jets from highly dynamic magnetic field region.
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- 2017
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- Erratum
Observations of the Earth's Ionosphere and Plasmasphere from International Space Station.
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- Transactions of the Japan Society of Aeronautical & Space Sciences, Aerospace Technology Japan, 2014, v. 12, n. ists 29, p. 47
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- Article
Absolutely Calibrated Spectrally Resolved Measurements of Xe Laser Plasma Radiation Intensity in the EUV Range.
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- Technical Physics, 2018, v. 63, n. 10, p. 1507, doi. 10.1134/S1063784218100080
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- Article
Enhancing Parameters Tuning of Overlay Models with Ridge Regression: Addressing Multicollinearity in High-Dimensional Data.
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- Mathematics (2227-7390), 2024, v. 12, n. 20, p. 3179, doi. 10.3390/math12203179
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- Article
Systematic Observation of EUV Spectra from Highly Charged Lanthanide Ions in the Large Helical Device.
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- Atoms (2218-2004), 2018, v. 6, n. 2, p. 24, doi. 10.3390/atoms6020024
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Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review.
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- High Power Laser Science & Engineering, 2023, v. 11, p. 1, doi. 10.1017/hpl.2023.53
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- Article
A synchrotron-based kilowatt-level radiation source for EUV lithography.
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- Scientific Reports, 2022, v. 12, n. 1, p. 1, doi. 10.1038/s41598-022-07323-z
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Improvement of Quality Performance in Mask Production by Feature Selection and Machine Learning Methods and An Application.
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- Journal of Defense Sciences / Savunma Bilmleri Dergisi, 2024, v. 20, n. 1, p. 167, doi. 10.17134/khosbd.1298163
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Removal of Tin from Extreme Ultraviolet Collector Optics by In- Situ Hydrogen Plasma Etching.
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- Plasma Chemistry & Plasma Processing, 2018, v. 38, n. 1, p. 223, doi. 10.1007/s11090-017-9852-4
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Visibility and Origin of Compact Interplanetary Radio Type IV Bursts.
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- Solar Physics, 2018, v. 293, n. 11, p. 1, doi. 10.1007/s11207-018-1371-9
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- Article
Can a Fast-Mode EUV Wave Generate a Stationary Front?
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- Solar Physics, 2016, v. 291, n. 11, p. 3195, doi. 10.1007/s11207-016-0920-3
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- Article