氮化硅的ECCP刻蚀特性研究.Published in:Chinese Journal of Liquid Crystal & Displays, 2017, v. 32, n. 7, p. 533By:白金超;王 静;赵 磊;张益存;郭会斌;曲泓铭;宋勇志;张 亮Publication type:Article
垂直线不良分析与改善.Published in:Chinese Journal of Liquid Crystal & Displays, 2017, v. 32, n. 5, p. 352, doi. 10.3788/YJYXS20173205.0352By:张光明;白金超;曲泓铭;张益存;于 凯Publication type:Article