Works matching IS 14060086 AND DT 2003 AND VI 52 AND IP 3

Results: 9

Effects of growth temperature on the properties of HfO[sub2] films grown by atomic layer deposition.

Published in:

Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 308

By:

Scarel, Giovanna;
Wiemer, Claudia;
Ferrari, Sandro;
Tallarida, Grazia;
Fanciulli, Marco

Publication type:

Article

Analysis of Zn(O,S) films for Cu(In,Ga)Se[sub2] solar cells.

Published in:

Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 299

By:

Platzer-Björkman, Charlotte;
Kessler, John;
Stolt, Lars

Publication type:

Article

Spectroscopic characterization of ZrO[sub2] thin films grown by atomic layer deposition.

Published in:

Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 289, doi. 10.3176/phys.math.2003.3.05

By:

Aarik, Jaan;
Mändar, Hugo;
Kirm, Marco

Publication type:

Article

Optical coatings grown by atomic layer deposition for high-power laser applications.

Published in:

Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 321

By:

Zaitsu, Shin-ichi;
Motokoshi, Shinji;
Jitsuno, Takahisa;
Nakatsuka, Masahiro;
Yamanaka, Tatsuhiko

Publication type:

Article

Atomic layer deposition of ZnO thin films and dot structures.

Published in:

Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 277

By:

Godlewski, Marek;
Kopalko, Krzysztof;
Szczerbakow, Andrzej;
Łusakowska, Elżbieta;
Godlewski, Michał M.;
Goldys, Ewa M.;
Butcher, Kenneth Scott A.;
Phillips, Matthew R.

Publication type:

Article

Atomic layer deposition: a key technology for the controlled growth of oxide thin films for advanced applications.

Published in:

Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 266, doi. 10.3176/phys.math.2003.3.03

By:

Niinistö, Lauri

Publication type:

Article

High-temperature atomic layer epitaxy of TiO[sub2] from TiCl[sub4] and H[sub2]O[sub2]--H[sub2]O.

Published in:

Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 257, doi. 10.3176/phys.math.2003.3.02

By:

Niilisk, Ahti;
Rosental, Arnold;
Tarre, Aivar;
Uustare, Teet

Publication type:

Article

Precursor design of vapour deposited cubic boron nitride versus diamond.

Published in:

Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 245, doi. 10.3176/phys.math.2003.3.01

By:

Larsson, Karin

Publication type:

Article

Preface.

Published in:

Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 243

By:

Rosental, Arnold

Publication type:

Article