We found a match
Your institution may have access to this item. Find your institution then sign in to continue.
- Title
Immobilization of enzyme and antibody on ALD-HfO2-EIS structure by NH3 plasma treatment.
- Authors
Wang, I-Shun; Lin, Yi-Ting; Huang, Chi-Hsien; Lu, Tseng-Fu; Lue, Cheng-En; Yang, Polung; Pijanswska, Dorota G; Yang, Chia-Ming; Wang, Jer-Chyi; Yu, Jau-Song; Chang, Yu-Sun; Chou, Chien; Lai, Chao-Sung
- Abstract
Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH3 plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobilization. Compared to conventional methods using chemical procedures, remote NH3 plasma treatment reduces the processing steps and time. The results exhibited that urea and antigen can be successfully detected, which indicated that the immobilization process is correct.
- Publication
Nanoscale research letters, 2012, Vol 7, p179
- ISSN
1556-276X
- Publication type
Journal Article
- DOI
10.1186/1556-276X-7-179