Works matching Lithography

Results: 5000

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography.

Published in:

Micromachines, 2013, v. 4, n. 4, p. 370, doi. 10.3390/mi4040370

By:

Villanueva, Luis Guillermo;
Vazquez-Mena, Oscar;
Martin-Olmos, Cristina;
Savu, Veronica;
Sidler, Katrin;
Brugger, Juergen

Publication type:

Article

Fabrication of platinum nanoparticles and nanowires by electron beam lithography (EBL) and nanoimprint lithography (NIL): comparison of ethylene hydrogenation kinetics.

Published in:

Catalysis Letters, 2005, v. 100, n. 3/4, p. 115, doi. 10.1007/s10562-004-3436-7

By:

Contreras, A. M.;
Grunes, J.;
Yan, X.-M.;
Liddle, A.;
Somorjai, G.A.

Publication type:

Article

Advancements in Lithography Techniques and Emerging Molecular Strategies for Nanostructure Fabrication.

Published in:

International Journal of Molecular Sciences, 2025, v. 26, n. 7, p. 3027, doi. 10.3390/ijms26073027

By:

Basu, Prithvi;
Verma, Jyoti;
Abhinav, Vishnuram;
Ratnesh, Ratneshwar Kumar;
Singla, Yogesh Kumar;
Kumar, Vibhor

Publication type:

Article

A review of nanoimprint lithography for high-volume semiconductor device manufacturing.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 229, doi. 10.1515/aot-2017-0020

By:

Resnick, Douglas J.;
Jin Choi

Publication type:

Article

Vapor‐Phase Infiltrated Organic–Inorganic Positive‐Tone Hybrid Photoresist for Extreme UV Lithography.

Published in:

Advanced Materials Interfaces, 2023, v. 10, n. 28, p. 1, doi. 10.1002/admi.202300420

By:

Subramanian, Ashwanth;
Tiwale, Nikhil;
Lee, Won‐Il;
Kisslinger, Kim;
Lu, Ming;
Stein, Aaron;
Kim, Jiyoung;
Nam, Chang‐Yong

Publication type:

Article

System for Fabrication of Large-Area Roll Molds by Step-and-Repeat Liquid Transfer Imprint Lithography.

Published in:

Materials (1996-1944), 2020, v. 13, n. 8, p. 1938, doi. 10.3390/ma13081938

By:

Lim, Hyungjun;
Jung, Sanghee;
Ahn, Junhyoung;
Choi, Kee-Bong;
Kim, Geehong;
Kwon, Soongeun;
Lee, Jaejong

Publication type:

Article

Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review.

Published in:

Micromachines, 2024, v. 15, n. 11, p. 1321, doi. 10.3390/mi15111321

By:

Khonina, Svetlana N.;
Kazanskiy, Nikolay L.;
Butt, Muhammad A.

Publication type:

Article

具有双重显影特性的多用途单分子树脂化学放大光刻胶.

Published in:

Chinese Journal of Applied Chemistry, 2024, v. 41, n. 7, p. 1024, doi. 10.19894/j.issn.1000-0518.240036

By:

苑晓冬;
陈金平;
于天君;
曾毅;
李嫕

Publication type:

Article

Poisson Effect‐Assisted Replication Lithography for Rapid Fabrication of Three‐Dimensional Microstructures.

Published in:

Small Structures, 2024, v. 5, n. 6, p. 1, doi. 10.1002/sstr.202300460

By:

Kim, Minsu;
Kyeong, Dokyung;
Kwak, Moon Kyu

Publication type:

Article

Combining Interference Lithography and Two-Photon Lithography for Fabricating Large-Area Photonic Crystal Structures with Controlled Defects.

Published in:

Applied Sciences (2076-3417), 2021, v. 11, n. 14, p. 6559, doi. 10.3390/app11146559

By:

Jee, Hongsub;
Park, Min-Joon;
Jeon, Kiseok;
Jeong, Chaehwan;
Lee, Jaehyeong

Publication type:

Article

Guided domino lithography for uniform fabrication of single-digit-nanometer scale plasmonic nanoantenna.

Published in:

Nanophotonics (21928606), 2023, v. 12, n. 8, p. 1435, doi. 10.1515/nanoph-2022-0694

By:

Oh, Dong Kyo;
Kim, Yeseul;
Kim, Jaekyung;
Kim, Inki;
Rho, Junsuk

Publication type:

Article

硅藻土光固化成型浆料和多孔陶瓷的制备.

Published in:

Bulletin of the Chinese Ceramic Society, 2022, v. 41, n. 4, p. 1416

By:

王卿;
鲍崇高;
李世佳;
董文彩;
马海强

Publication type:

Article

Nanosphere Lithography for Sub‐10‐nm Nanogap Electrodes.

Published in:

Advanced Electronic Materials, 2017, v. 3, n. 1, p. 1, doi. 10.1002/aelm.201600348

By:

Ji, Deyang;
Li, Tao;
Fuchs, Harald

Publication type:

Article

Exposition time analysis of AlGaN/GaN HEMT fabrication by electron beam lithography.

Published in:

Optica Applicata, 2019, v. 49, n. 1, p. 161, doi. 10.5277/oa190114

By:

INDYKIEWICZ, KORNELIA;
PASZKIEWICZ, BOGDAN;
PASZKIEWICZ, REGINA

Publication type:

Article

Real-time mask-division technique based on DMD digital lithography.

Published in:

Optica Applicata, 2010, v. 40, n. 1, p. 239

By:

NINGNING LUO;
YIQING GAO;
MIN CHEN;
LIXIA YU;
QING YE

Publication type:

Article

Lithography Alignment Techniques Based on Moiré Fringe.

Published in:

Photonics, 2023, v. 10, n. 4, p. 351, doi. 10.3390/photonics10040351

By:

Jiang, Wenbo;
Wang, Huaran;
Xie, Wenda;
Qu, Zhefei

Publication type:

Article

Anionic Photoacid Generator Bound Polymer Photoresists With Improved Performance for Advanced Lithography Patterning.

Published in:

Journal of Applied Polymer Science, 2025, v. 142, n. 12, p. 1, doi. 10.1002/app.56622

By:

Zhuang, Changchang;
Chen, Jiao;
Wang, Tao;
Zhao, Jun;
Li, Haoyuan;
Xin, Hanshen;
Zhang, Jianhua

Publication type:

Article

STED lithography in microfluidics for 3D thrombocyte aggregation testing.

Published in:

Journal of Nanobiotechnology, 2021, v. 19, n. 1, p. 1, doi. 10.1186/s12951-020-00762-8

By:

Buchegger, Bianca;
Tanzer, Alexander;
Posch, Sandra;
Gabriel, Christian;
Klar, Thomas A.;
Jacak, Jaroslaw

Publication type:

Article

Three-dimensional nanoimprint lithography using photocurable resins.

Published in:

Plastics, Rubber & Composites, 2010, v. 39, n. 7, p. 327, doi. 10.1179/174328910X12691245470473

By:

Taniguchi, J.;
Unno, N.;
Kamiya, Y.;
Sakai, N.;
Ohsaki, T.

Publication type:

Article

Surface roughness and geometrical characterization of ultra-thick micro moulds for ceramic micro fabrication using soft lithography.

Published in:

International Journal of Advanced Manufacturing Technology, 2013, v. 67, n. 9-12, p. 2293, doi. 10.1007/s00170-012-4650-x

By:

Hassanin, H.;
Ostadi, H.;
Jiang, K.

Publication type:

Article

Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography.

Published in:

Nanomaterials (2079-4991), 2023, v. 13, n. 9, p. 1556, doi. 10.3390/nano13091556

By:

Haslinger, Michael J.;
Maier, Oliver S.;
Pribyl, Markus;
Taus, Philipp;
Kopp, Sonja;
Wanzenboeck, Heinz D.;
Hingerl, Kurt;
Muehlberger, Michael M.;
Guillén, Elena

Publication type:

Article

Evolution in Lithography Techniques: Microlithography to Nanolithography.

Published in:

Nanomaterials (2079-4991), 2022, v. 12, n. 16, p. 2754, doi. 10.3390/nano12162754

By:

Sharma, Ekta;
Rathi, Reena;
Misharwal, Jaya;
Sinhmar, Bhavya;
Kumari, Suman;
Dalal, Jasvir;
Kumar, Anand

Publication type:

Article

Fabrication of High Aspect Ratio Micro-Structures with Superhydrophobic and Oleophobic Properties by Using Large-Area Roll-to-Plate Nanoimprint Lithography.

Published in:

Nanomaterials (2079-4991), 2021, v. 11, n. 2, p. 339, doi. 10.3390/nano11020339

By:

Atthi, Nithi;
Dielen, Marc;
Sripumkhai, Witsaroot;
Pattamang, Pattaraluck;
Meananeatra, Rattanawan;
Saengdee, Pawasuth;
Thongsook, Oraphan;
Ranron, Norabadee;
Pankong, Krynnaras;
Uahchinkul, Warinrampai;
Supadech, Jakrapong;
Klunngien, Nipapan;
Jeamsaksiri, Wutthinan;
Veldhuizen, Pim;
ter Meulen, Jan Matthijs;
Cheng, Yang-Tse

Publication type:

Article

In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices.

Published in:

Nanomaterials (2079-4991), 2020, v. 10, n. 4, p. 666, doi. 10.3390/nano10040666

By:

Mizuno, Naomi;
Camino, Fernando;
Du, Xu

Publication type:

Article

Fabrication of 3D microstructures using grayscale lithography.

Published in:

Advanced Optical Technologies, 2019, v. 8, n. 6, p. 499, doi. 10.1515/aot-2019-0023

By:

Lima, Frederico;
Khazi, Isman;
Mescheder, Ulrich;
Tungal, Alok C.;
Muthiah, Uma

Publication type:

Article

Fabrication of 3D microstructures using grayscale lithography.

Published in:

Advanced Optical Technologies, 2019, v. 8, n. 3/4, p. 181, doi. 10.1515/aot-2019-0023

By:

Lima, Frederico;
Khazi, Isman;
Mescheder, Ulrich;
Tungal, Alok C.;
Muthiah, Uma

Publication type:

Article

Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect.

Published in:

Advanced Optical Technologies, 2019, v. 8, n. 3/4, p. 233, doi. 10.1515/aot-2019-0005

By:

Fallica, Roberto

Publication type:

Article

A NOVEL FABRICATION METHOD OF TWO-DIMENSIONAL NANO-MOLD BY COMBINING ULTRAVIOLET LITHOGRAPHY WITH WET ETCHING TECHNOLOGY.

Published in:

Surface Review & Letters, 2021, v. 28, n. 1, p. N.PAG, doi. 10.1142/S0218625X20500286

By:

CHENG, E;
TANG, SUZHOU;
LIU, LINGPENG;
ZOU, HELIN;
ZHANG, ZHENGYAN

Publication type:

Article

ION BEAM LITHOGRAPHY AND NANOFABRICATION:: A REVIEW.

Published in:

International Journal of Nanoscience, 2005, v. 4, n. 3, p. 269, doi. 10.1142/S0219581X05003139

By:

Watt, F.;
Bettiol, A. A.;
van Kan, J. A.;
Teo, E. J.;
Breese, M. B. H.

Publication type:

Article

Electron‐Irradiation Promoted Exchange Reaction as a Tool for Surface Engineering and Chemical Lithography.

Published in:

Advanced Materials Interfaces, 2021, v. 8, n. 10, p. 1, doi. 10.1002/admi.202100148

By:

Terfort, Andreas;
Zharnikov, Michael

Publication type:

Article

Nanogap Lithography: Spontaneous Formation of Nanogap Electrodes by Self‐Peeling Adhesion Lithography (Adv. Mater. Interfaces 17/2019).

Published in:

Advanced Materials Interfaces, 2019, v. 6, n. 17, p. N.PAG, doi. 10.1002/admi.201970107

By:

Luo, Sihai;
Hoff, Bård H.;
deMello, John C.

Publication type:

Article

Kitchen Lithography as an Alternative to Traditional Litography.

Published in:

Participatory Educational Research, 2017, v. 4, n. 1, p. 224

By:

BAHAR, Tezcan;
KOYUNCU, Sevgi

Publication type:

Article

An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography.

Published in:

Micromachines, 2024, v. 15, n. 12, p. 1408, doi. 10.3390/mi15121408

By:

Xu, Feifan;
Ding, Yinye;
Chen, Wenhao;
Xia, Haojie

Publication type:

Article

Real-Time Imaging of Plasmonic Concentric Circular Gratings Fabricated by Lens–Axicon Laser Interference Lithography.

Published in:

Micromachines, 2023, v. 14, n. 11, p. 1981, doi. 10.3390/mi14111981

By:

Mazloumi, Mahyar;
Sabat, Ribal Georges

Publication type:

Article

Micromask Lithography for Cheap and Fast 2D Materials Microstructures Fabrication.

Published in:

Micromachines, 2021, v. 12, n. 8, p. 850, doi. 10.3390/mi12080850

By:

Pugachev, Mikhail V.;
Duleba, Aliaksandr I.;
Galiullin, Arslan A.;
Kuntsevich, Aleksandr Y.

Publication type:

Article

Biomimetic surfaces prepared by soft lithography and vapour deposition for hydrophobic and antibacterial performance.

Published in:

Materials Technology, 2022, v. 37, n. 8, p. 745, doi. 10.1080/10667857.2021.1874760

By:

Gürsoy, Mehmet;
Testici, Hilal;
Çıtak, Emre;
Kaya, Murat;
Türk Daği, Hatice;
Öztürk, Bahadır;
Karaman, Mustafa

Publication type:

Article

Electron Beam Lithography: CO<sub>2</sub>‐Based Dual‐Tone Resists for Electron Beam Lithography (Adv. Funct. Mater. 13/2021).

Published in:

Advanced Functional Materials, 2021, v. 31, n. 13, p. 1, doi. 10.1002/adfm.202007417

By:

Lu, Xin‐Yu;
Luo, Hao;
Wang, Kai;
Zhang, Yao‐Yao;
Zhu, Xiao‐Feng;
Li, Dongxue;
Ma, Bingze;
Xiong, Shisheng;
Nealey, Paul F.;
Li, Qiang;
Wu, Guang‐Peng

Publication type:

Article

Computational Lithography Using Machine Learning Models.

Published in:

IPSJ Transactions on System LSI Design Methodology, 2021, v. 14, n. 1, p. 2, doi. 10.2197/ipsjtsldm.14.2

By:

YOUNGSOO SHIN

Publication type:

Article

Zapomenutá brněnská tiskárna a kamenotiskárna Prokopa Fritsche.

Published in:

Studia Bibliographica Posoniensia, 2021, p. 100

By:

Heilandová, Lucie

Publication type:

Article

Writing Behavior of Phospholipids in Polymer Pen Lithography (PPL) for Bioactive Micropatterns.

Published in:

Polymers (20734360), 2019, v. 11, n. 5, p. 891, doi. 10.3390/polym11050891

By:

Angelin, Alessandro;
Bog, Uwe;
Kumar, Ravi;
Niemeyer, Christof M.;
Hirtz, Michael

Publication type:

Article

Scaling up multispectral color filters with binary lithography and reflow (BLR).

Published in:

Nanophotonics (21928606), 2024, v. 13, n. 19, p. 3671, doi. 10.1515/nanoph-2024-0090

By:

Rahman, Md Abdur;
Rezaei, Soroosh Daqiqeh;
Arora, Deepshikha;
Wang, Hao;
Mori, Tomohiro;
Chia, Ser Chern;
Chan, John You En;
Nair, Parvathi Nair Suseela;
Uddin, Siam;
Pan, Cheng-Feng;
Zhang, Wang;
Wang, Hongtao;
Ruitao, Zheng;
Heng, Lim Sin;
Yang, Joel K. W.

Publication type:

Article

Inverse design of high-NA metalens for maskless lithography.

Published in:

Nanophotonics (21928606), 2023, v. 12, n. 13, p. 2371, doi. 10.1515/nanoph-2022-0761

By:

Chung, Haejun;
Zhang, Feng;
Li, Hao;
Miller, Owen D.;
Smith, Henry I.

Publication type:

Article

High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography.

Published in:

Nanophotonics (21928606), 2021, v. 10, n. 14, p. 3759, doi. 10.1515/nanoph-2021-0263

By:

Kabouraki, Elmina;
Melissinaki, Vasileia;
Yadav, Amit;
Melninkaitis, Andrius;
Tourlouki, Konstantina;
Tachtsidis, Theodoros;
Kehagias, Nikolaos;
Barmparis, Georgios D.;
Papazoglou, Dimitris G.;
Rafailov, Edik;
Farsari, Maria

Publication type:

Article

An electron beam lithography and digital image acquisition system for scanning electron microscopes.

Published in:

Journal of Microscopy, 2007, v. 226, n. 1, p. 64, doi. 10.1111/j.1365-2818.2007.01753.x

By:

RUSSEV, S.;
TSUTSUMANOVA, G.;
ANGELOV, S.;
BACHEV, K.

Publication type:

Article

Influence of Lithography Process Parameters on Continuous Surface Diffractive Optical Elements for Laser Beam Shaping.

Published in:

Micromachines, 2025, v. 16, n. 5, p. 601, doi. 10.3390/mi16050601

By:

Liu, Wenjing;
Cao, Axiu;
Liu, Junbo;
Pang, Hui;
Deng, Qiling;
Wang, Jian;
Hu, Song

Publication type:

Article

Frequency-Decoupled Dual-Stage Inverse Lithography Optimization via Hierarchical Sampling and Morphological Enhancement.

Published in:

Micromachines, 2025, v. 16, n. 5, p. 515, doi. 10.3390/mi16050515

By:

Zhou, Jie;
Zhang, Qingyan;
Sun, Haifeng;
Jin, Chuan;
Zhou, Ji;
Liu, Junbo

Publication type:

Article

Review of Industrialization Development of Nanoimprint Lithography Technology.

Published in:

Chips, 2025, v. 4, n. 1, p. 10, doi. 10.3390/chips4010010

By:

Cao, Yuanxun;
Ma, Dayong;
Li, Haiming;
Cui, Guangxu;
Zhang, Jie;
Yang, Zhiwei

Publication type:

Article

Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography.

Published in:

Photonics, 2024, v. 11, n. 10, p. 990, doi. 10.3390/photonics11100990

By:

Feng, Yaobin;
Liu, Jiamin;
Jiang, Hao;
Liu, Shiyuan

Publication type:

Article

Annular Gray Tone Lithography for the Fabrication of Rotationally Symmetric Continuous Relief Meso- and Microscale Optical Elements.

Published in:

Photonics, 2023, v. 10, n. 9, p. 1000, doi. 10.3390/photonics10091000

By:

Knoblich, Maria;
Uwurukundo, Xavier;
Stumpf, Daniela;
Kraus, Matthias;
Hillmer, Hartmut;
Brunner, Robert

Publication type:

Article

Low-voltage Driving Liquid Crystal Lens with Precise Control of Pretilt Angles using E-beam Lithography.

Published in:

SID Symposium Digest of Technical Papers, 2016, v. 47, n. 1, p. 386, doi. 10.1002/sdtp.10693

By:

Zhao, Chen‐xiang;
Fan, Fan;
Chigrinov, Vladimir;
Kwok, Hoi‐Sing

Publication type:

Article