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Title

Dual-Lens Electron Holography for Junction Profiling and Strain Mapping on Semiconductor Devices.

Authors

Yun-Yu Wang; Domenicucci, Anthony; Bruley, John

Abstract

The article focuses on the use of dual-lens electron holography for strain mapping and junction profiling of semiconductor devices. Topics discussed include electron hologram formation from imaging system and leakage current from junction mapping at the narrow silicon diffusion region. It also presents several mathematical equations, graphs and diagrams related to strain mapping and junction profiling of bright-field electron holography and dark-field electron holography.

Subjects

ELECTRON holography; STRAY currents; FUNCTIONAL equations; GRAPHIC methods in statistics; GRAPHIC methods

Publication

Electronic Device Failure Analysis, 2014, Vol 16, Issue 1, p4

ISSN

1537-0755

Publication type

Academic Journal

DOI

10.31399/asm.edfa.2014-1.p004