Works matching DE "PHOTOMASKS"
Results: 35
A study of mask planning in projection-based stereolithography using digital image correlation.
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- International Journal of Advanced Manufacturing Technology, 2019, v. 104, n. 1-4, p. 451, doi. 10.1007/s00170-019-03778-z
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- Article
Multi-Compartmental Hydrogel Microparticles Fabricated by Combination of Sequential Electrospinning and Photopatterning.
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- Angewandte Chemie International Edition, 2015, v. 54, n. 39, p. 11511, doi. 10.1002/anie.201504317
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- Article
Dynamic Photocontrol of the Coffee-Ring Effect with Optically Tunable Particle Stickiness.
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- Angewandte Chemie International Edition, 2014, v. 53, n. 51, p. 14077, doi. 10.1002/anie.201406903
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- Article
ZEISS launches next generation AIMS™ system.
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- infocus Magazine, 2014, n. 35, p. 91
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- Article
Creating Metal Figures in the Surface Layer of Glass.
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- Glass & Ceramics, 2015, v. 72, n. 1/2, p. 10, doi. 10.1007/s10717-015-9711-9
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- Article
Fabrication of biocompatible monolithic microchannels with high pressure-resistance using direct polymerization of PEG-modified PMMA.
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- Journal of Applied Polymer Science, 2014, v. 131, n. 21, p. n/a, doi. 10.1002/app.41031
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- Article
Photoswitchable Hydrogel Surface Topographies by Polymerisation-Induced Diffusion.
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- Chemistry - A European Journal, 2013, v. 19, n. 33, p. 10922, doi. 10.1002/chem.201300852
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- Article
Characterization and reduction of pellicle degradation due to haze formation on leading edge technology photomasks.
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- Surface & Interface Analysis: SIA, 2017, v. 49, n. 10, p. 985, doi. 10.1002/sia.6258
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- Article
A chemical analysis method to identify the source of pellicle adhesive contaminants.
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- Surface & Interface Analysis: SIA, 2014, v. 46, p. 294, doi. 10.1002/sia.5469
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- Article
A Low-Cost Strain Gauge Displacement Sensor Fabricated via Shadow Mask Printing.
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- Sensors (14248220), 2019, v. 19, n. 21, p. 4713, doi. 10.3390/s19214713
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- Article
Facile Fabrication of Concentrated Polymer Brushes with Complex Patterning by Photocontrolled Organocatalyzed Living Radical Polymerization.
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- Angewandte Chemie, 2018, v. 130, n. 41, p. 13692, doi. 10.1002/ange.201807207
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- Article
The application of elastic auxiliary air bag imprinting technology to the development of linear gradient micro-structure replication processes.
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- Polymers for Advanced Technologies, 2013, v. 24, n. 1, p. 1, doi. 10.1002/pat.3037
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- Article
UV-curable positive photoresists for screen printing plate.
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- Polymer International, 2016, v. 65, n. 4, p. 362, doi. 10.1002/pi.5065
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- Article
Removal Processing inside PDMS by Short Pulse Laser.
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- Journal of Laser Micro / Nanoengineering, 2017, v. 12, n. 2, p. 141, doi. 10.2961/jlmn.2017.02.0016
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- Article
Electroless Deposition of Nickel on Photografted Polymeric Microscale Patterns.
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- Macromolecular Rapid Communications, 2017, v. 38, n. 2, p. n/a, doi. 10.1002/marc.201600564
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- Article
Photoactive Self-Shaping Hydrogels as Noncontact 3D Macro/Microscopic Photoprinting Platforms.
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- Macromolecular Rapid Communications, 2015, v. 36, n. 24, p. 2129, doi. 10.1002/marc.201500390
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- Article
Rapid & low-cost prototyping of metallic patterns in limited facilities condition.
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- Journal of Materials Science: Materials in Electronics, 2018, v. 29, n. 16, p. 14328, doi. 10.1007/s10854-018-9567-1
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- Article
Dynamic Photocontrol of the Coffee-Ring Effect with Optically Tunable Particle Stickiness.
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- Angewandte Chemie, 2014, v. 126, n. 51, p. 14301, doi. 10.1002/ange.201406903
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- Article
Rigidity-Patterned Polyelectrolyte Films to Control Myoblast Cell Adhesion and Spatial Organization.
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- Advanced Functional Materials, 2013, v. 23, n. 27, p. 3432, doi. 10.1002/adfm.201203580
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- Article
Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography.
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- Entropy, 2020, v. 22, n. 3, p. 295, doi. 10.3390/e22030295
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- Article
Rapid and Large‐Scale Fabrication of Full Color Woodpile Photonic Crystals via Interference from a Conformal Multilevel Phase Mask.
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- Advanced Functional Materials, 2019, v. 29, n. 44, p. N.PAG, doi. 10.1002/adfm.201904971
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- Article
5.4: Sub-pixel Rendering for a High Resolution OLED Display with Low Resolution Photomasks.
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- SID Symposium Digest of Technical Papers, 2015, v. 46, n. 1, p. 33, doi. 10.1002/sdtp.10197
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- Article
P-9: Study of the Origin of Major Donor States in Oxide Semiconductor.
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- SID Symposium Digest of Technical Papers, 2014, v. 45, n. 1, p. 975, doi. 10.1002/j.2168-0159.2014.tb00253.x
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- Article
PHOTOLITHOGRAPHIC MASK FABRICATION PROCESS USING CR/SAPPHIRE CARRIERS.
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- Advances in Electrical & Electronic Engineering, 2019, v. 17, n. 3, p. 374, doi. 10.15598/aeee.v17i3.3357
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- Article
Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities.
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- Micromachines, 2014, v. 5, n. 3, p. 738, doi. 10.3390/mi5030738
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- Article
Stop-flow Lithography to Continuously Fabricate Microlens Structures Utilizing an Adjustable Three-Dimensional Mask.
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- Micromachines, 2014, v. 5, n. 3, p. 667, doi. 10.3390/mi5030667
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- Article
Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications.
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- Micromachines, 2013, v. 4, n. 2, p. 206, doi. 10.3390/mi4020206
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- Article
Lithographically Designed Conical Microcarriers for Programed Release of Multiple Actives.
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- Advanced Materials Interfaces, 2018, v. 5, n. 1, p. 1, doi. 10.1002/admi.201701163
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- Article
Calibrating the pupil fill balance for hypernumerical aperture lithographic objective.
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- Optical Engineering, 2015, v. 54, n. 9, p. 1, doi. 10.1117/1.OE.54.9.095103
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- Article
Holographically encoded volume phase masks.
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- Optical Engineering, 2015, v. 54, n. 7, p. 1, doi. 10.1117/1.OE.54.7.076104
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- Article
Femtosecond laser lithography technique for submicron T-gate fabrication on positive photoresist.
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- Optical Engineering, 2012, v. 51, n. 5, p. 1, doi. 10.1117/1.OE.51.5.054303
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- Article
Extreme ultraviolet microscope characterization using photomask surface roughness.
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- Scientific Reports, 2020, v. 10, n. 1, p. 1, doi. 10.1038/s41598-020-68588-w
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- Article
Teflon/SiO<sub>2</sub> Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process.
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- Materials (1996-1944), 2015, v. 8, n. 4, p. 1704, doi. 10.3390/ma8041704
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- Article
A Self-Aligned a-IGZO Thin-Film Transistor Using a New Two-Photo-Mask Process with a Continuous Etching Scheme.
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- Materials (1996-1944), 2014, v. 7, n. 8, p. 5761, doi. 10.3390/ma7085761
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- Article
Soft X‐ray varied‐line‐spacing gratings fabricated by near‐field holography using an electron beam lithography‐written phase mask.
- Published in:
- Journal of Synchrotron Radiation, 2019, v. 26, n. 5, p. 1782, doi. 10.1107/S1600577519008245
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- Article