Works matching AU Dan’ko, V. A.
Results: 19
ANALYSIS OF THE OPERATION PECULIARITIES OF THE SUPERCONDUCTING INDUCTIVE CURRENT LIMITER WITH ADDITIONAL SUPERCONDUCTING SCREEN.
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- Electrical Engineering & Electromechanics, 2017, n. 4, p. 16, doi. 10.20998/2074-272X.2017.4.03
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Features of operation of a superconducting current limiter at the sudden short circuit.
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- Electrical Engineering & Electromechanics, 2014, n. 6, p. 30, doi. 10.20998/2074-272x.2014.6.04
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The Effect of an External Shield on the Efficiency of an Induction-Type Linear-Pulse Electromechanical Converter.
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- Russian Electrical Engineering, 2018, v. 89, n. 4, p. 275, doi. 10.3103/S106837121804003X
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Photoinduced etching of thin films of chalcogenide glassy semiconductors.
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- Semiconductors, 2012, v. 46, n. 4, p. 504, doi. 10.1134/S1063782612040057
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Calculating the parameters of an inductive short-circuit current limiter with a superconducting shield.
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- Russian Electrical Engineering, 2013, v. 84, n. 9, p. 478, doi. 10.3103/S1068371213090046
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Luminescent and Raman study of nanostructures formed upon annealing of SiO<sub>x</sub>:Sm films.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2023, v. 26, n. 1, p. 68, doi. 10.15407/spqeo26.01.068
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The effect of surface plasmon-polaritons on the photostimulated diffusion in light-sensitive Ag-As<sub>4</sub>Ge<sub>30</sub>S<sub>66</sub> structures.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2021, v. 24, n. 4, p. 436, doi. 10.15407/spqeo24.04.436
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Formation of laterally ordered arrays of noble metal nanocavities for SERS substrates by using interference photolithography.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2021, v. 24, n. 1, p. 48, doi. 10.15407/spqeo24.01.048
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Doping the thin films by using the original Close Space Sublimation method.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2020, v. 23, n. 1, p. 5, doi. 10.15407/spqeo23.01.005
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Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2019, v. 22, n. 3, p. 353, doi. 10.15407/spqeo22.03.353
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Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2015, v. 18, n. 4, p. 438, doi. 10.15407/spqeo18.04.438
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Nickel-induced enhancement of photoluminescence in nc-Si-SiO<sub>x</sub> nanostructures.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2014, v. 17, n. 4, p. 336
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Photostimulated etching of germanium chalcogenide films.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2012, v. 15, n. 4, p. 345
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Controlling the photoluminescence spectra of porous nc-Si-SiO<sub>x</sub> structures by vapor treatment.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2010, v. 13, n. 4, p. 413, doi. 10.15407/spqeo13.04.413
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Shack-hartmann wavefront sensor with holographic lenslet array for the aberration measurements in a speckle field.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2008, v. 11, n. 1, p. 29, doi. 10.15407/spqeo11.01.029
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Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiO<sub>x</sub> films.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2006, v. 9, n. 1, p. 9, doi. 10.15407/spqeo9.01.009
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Visible photoluminescence of selectively etched porous nc-Si-Sio<sub>x</sub> structures.
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- Semiconductors, 2010, v. 44, n. 2, p. 206, doi. 10.1134/S1063782610020120
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Effect of chemical treatment on photoluminescence spectra of SiO<sub> x </sub> layers with built-in Si nanocrystals.
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- Semiconductors, 2007, v. 41, n. 10, p. 1248, doi. 10.1134/S1063782607100223
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Kinetics of Structural and Phase Transformations in Thin SiO<sub>x</sub> Films in the Course of a Rapid Thermal Annealing.
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- Semiconductors, 2005, v. 39, n. 10, p. 1197, doi. 10.1134/1.2085270
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