Works matching DE "EXTREME ultraviolet lithography"

Results: 166

Extreme Ultraviolet Multilayer Defect Profile Parameters Reconstruction via Transfer Learning with Fine-Tuned VGG-16.

Published in:

Micromachines, 2025, v. 16, n. 5, p. 541, doi. 10.3390/mi16050541

By:

Mohammad, Hala;
Li, Jiawei;
Li, Bochao;
Baraya, Jamilu Tijjani;
Kone, Sana;
Zhao, Zhenlong;
Song, Xiaowei;
Lin, Jingquan

Publication type:

Article

Motorola plans heavy NGL mask investment; EUV and e-beam capabilities in development.

Published in:: Solid State Technology, 1999, v. 42, n. 10, p. 26
Publication type:: Article

EUCLIDES: European EUV lithography milestones.

Published in:

Solid State Technology, 1999, v. 42, n. 9, p. 43

By:

Benschop, Jos P.H.;
van Dijsseldonk, Anton J.J.

Publication type:

Article

Japan's ASET researches EUV litho.

Published in:

Solid State Technology, 1998, v. 41, n. 11, p. 22

By:

DUNN, PETER N.

Publication type:

Article

New venture to commercialize EUV litho technology.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 58

By:

Dunn, Peter N.

Publication type:

Article

An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by UV-Nanoimprint Lithography.

Published in:

Macromolecular Rapid Communications, 2014, v. 35, n. 19, p. 1712, doi. 10.1002/marc.201400251

By:

Hu, Xin;
Huang, Shisong;
Gu, Ronghua;
Yuan, Changsheng;
Ge, Haixiong;
Chen, Yanfeng

Publication type:

Article

The Solar Extreme Ultraviolet Monitor for MAVEN.

Published in:

Space Science Reviews, 2015, v. 195, n. 1-4, p. 293, doi. 10.1007/s11214-015-0195-2

By:

Eparvier, F.;
Chamberlin, P.;
Woods, T.;
Thiemann, E.

Publication type:

Article

Systematic Observation of EUV Spectra from Highly Charged Lanthanide Ions in the Large Helical Device.

Published in:

Atoms (2218-2004), 2018, v. 6, n. 2, p. 24, doi. 10.3390/atoms6020024

By:

Suzuki, Chihiro;
Koike, Fumihiro;
Murakami, Izumi;
Tamura, Naoki;
Sudo, Shigeru

Publication type:

Article

Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types.

Published in:

Photonics, 2025, v. 12, n. 3, p. 266, doi. 10.3390/photonics12030266

By:

Moon, Seungchan;
Lee, Dong Gi;
Choi, Jinhyuk;
Hong, Junho;
Lee, Taeho;
Ekinci, Yasin;
Ahn, Jinho

Publication type:

Article

Experimental Study on the Temporal Evolution Parameters of Laser–Produced Tin Plasma under Different Laser Pulse Energies for LPP–EUV Source.

Published in:

Photonics, 2023, v. 10, n. 12, p. 1339, doi. 10.3390/photonics10121339

By:

Chen, Yiyi;
Zhao, Chongxiao;
Pan, Qikun;
Zhang, Ranran;
Gao, Yang;
Li, Xiaoxi;
Guo, Jin;
Chen, Fei

Publication type:

Article

Research on Tip Characterization Techniques Based on Two-Dimensional Self-Traceable Nano-Gratings.

Published in:

Photonics, 2023, v. 10, n. 11, p. 1272, doi. 10.3390/photonics10111272

By:

Xiong, Yingfan;
Gou, Jinming;
Tang, Zhaohui;
Xiao, Guangxu;
Lei, Lihua;
Song, Song;
Deng, Xiao;
Cheng, Xinbin

Publication type:

Article

New polyphenols of the fluorene family and positive-tone photoresists based on them for 22-nm nanolithography.

Published in:

Doklady Chemistry, 2012, v. 442, n. 1, p. 7, doi. 10.1134/S0012500812010041

By:

Vainer, A.;
Dyumaev, K.;
Kovalenko, A.;
Davidovich, M.;
Zelikson, K.;
Pinchuk, E.

Publication type:

Article

Improvement of Quality Performance in Mask Production by Feature Selection and Machine Learning Methods and An Application.

Published in:

Journal of Defense Sciences / Savunma Bilmleri Dergisi, 2024, v. 20, n. 1, p. 167, doi. 10.17134/khosbd.1298163

By:

TEBRİZCİK, Semra;
ERSÖZ, Süleyman;
AKTEPE, Adnan

Publication type:

Article

Extreme-ultraviolet emissivity from Xe to Xe by using a detailed line-by-line method.

Published in:

European Physical Journal D (EPJ D), 2010, v. 60, n. 2, p. 309, doi. 10.1140/epjd/e2010-00192-6

By:

Zeng, J.;
Gao, C.;
Yuan, J.

Publication type:

Article

Advancements in Lithography Techniques and Emerging Molecular Strategies for Nanostructure Fabrication.

Published in:

International Journal of Molecular Sciences, 2025, v. 26, n. 7, p. 3027, doi. 10.3390/ijms26073027

By:

Basu, Prithvi;
Verma, Jyoti;
Abhinav, Vishnuram;
Ratnesh, Ratneshwar Kumar;
Singla, Yogesh Kumar;
Kumar, Vibhor

Publication type:

Article

纳米流体通道的制备及其应用研究进展.

Published in:

Journal of Materials Engineering / Cailiao Gongcheng, 2022, v. 50, n. 12, p. 13, doi. 10.11868/j.issn.1001-4381.2022.000153

By:

宋光辉;
吴忠旋;
陈阁谷;
彭锋

Publication type:

Article

XUV Transient Absorption Spectroscopy: Probing Laser-Perturbed Dipole Polarization in Single Atom, Macroscopic, and Molecular Regimes.

Published in:

Photonics, 2017, v. 4, n. 1, p. 17, doi. 10.3390/photonics4010017

By:

Chen-Ting Liao;
Sandhu, Arvinder

Publication type:

Article

Temporal response of silicon EUV and soft X-ray detectors.

Published in:

Instruments & Experimental Techniques, 2015, v. 58, n. 1, p. 102, doi. 10.1134/S0020441215010017

By:

Artyomov, A.;
Baksht, E.;
Tarasenko, V.;
Fedunin, A.;
Chaikovsky, S.;
Aruev, P.;
Zabrodskii, V.;
Petrenko, M.;
Sobolev, N.;
Suhanov, V.

Publication type:

Article

A synchrotron-based kilowatt-level radiation source for EUV lithography.

Published in:

Scientific Reports, 2022, v. 12, n. 1, p. 1, doi. 10.1038/s41598-022-07323-z

By:

Jiang, Bocheng;
Feng, Chao;
Li, Changliang;
Bai, Zhenghe;
Wan, Weishi;
Xiang, Dao;
Gu, Qiang;
Wang, Kun;
Zhang, Qinglei;
Huang, Dazhang;
Chen, Senyu

Publication type:

Article

Velocity map imaging and cross sections of Fe(CO)<sub>5</sub> for FEBIP applications.

Published in:

European Physical Journal D (EPJ D), 2022, v. 76, n. 9, p. 1, doi. 10.1140/epjd/s10053-022-00476-6

By:

Pintea, Maria;
Mason, Nigel;
Tudorovskaya, Maria

Publication type:

Article

Accurate level energies in the EF1[image omitted], GK1[image omitted], H1[image omitted], B1[image omitted], [image omitted], B'1[image omitted], [image omitted], [image omitted], J1Δg states of H2.

Published in:

Molecular Physics, 2010, v. 108, n. 7-9, p. 827, doi. 10.1080/00268970903413350

By:

Bailly, D.;
Salumbides, E. J.;
Vervloet, M.;
Ubachs, W.

Publication type:

Article

Prediction of particle deposition velocity onto an extreme ultraviolet lithography mask in parallel airflow considering electrophoresis.

Published in:

International Journal of Modern Physics C: Computational Physics & Physical Computation, 2014, v. 25, n. 6, p. -1, doi. 10.1142/S0129183114500107

By:

Kang, Soojin;
Yook, Se-Jin;
Lee, Kwan-Soo

Publication type:

Article

Removal of Tin from Extreme Ultraviolet Collector Optics by In- Situ Hydrogen Plasma Etching.

Published in:

Plasma Chemistry & Plasma Processing, 2018, v. 38, n. 1, p. 223, doi. 10.1007/s11090-017-9852-4

By:

Elg, Daniel T.;
Panici, Gianluca A.;
Liu, Sumeng;
Girolami, Gregory;
Srivastava, Shailendra N.;
Ruzic, David N.

Publication type:

Article

Anionic Photoacid Generator Bound Polymer Photoresists With Improved Performance for Advanced Lithography Patterning.

Published in:

Journal of Applied Polymer Science, 2025, v. 142, n. 12, p. 1, doi. 10.1002/app.56622

By:

Zhuang, Changchang;
Chen, Jiao;
Wang, Tao;
Zhao, Jun;
Li, Haoyuan;
Xin, Hanshen;
Zhang, Jianhua

Publication type:

Article

NEWS.

Published in:: Glass Technology: European Journal of Glass Science & Technology Part A, 2022, v. 63, n. 1, p. 6
Publication type:: Article

Quantum Dot Channel (QDC) FETs with Wraparound II-VI Gate Insulators: Numerical Simulations.

Published in:

Journal of Electronic Materials, 2016, v. 45, n. 11, p. 5663, doi. 10.1007/s11664-016-4812-y

By:

Jain, F.;
Lingalugari, M.;
Kondo, J.;
Mirdha, P.;
Suarez, E.;
Chandy, J.;
Heller, E.

Publication type:

Article

Observations of solar X-ray and EUV jets and their related phenomena.

Published in:

Astronomische Nachrichten, 2016, v. 337, n. 10, p. 1024, doi. 10.1002/asna.201612428

By:

Innes, D. E.;
Bučík, R.;
Guo, L.-J.;
Nitta, N.

Publication type:

Article

LOFAR observations of the quiet solar corona.

Published in:

Astronomy & Astrophysics / Astronomie et Astrophysique, 2018, v. 614, p. N.PAG, doi. 10.1051/0004-6361/201630067

By:

Vocks, C.;
Mann, G.;
Breitling, F.;
Bisi, M. M.;
Dąbrowski, B.;
Fallows, R.;
Gallagher, P. T.;
Krankowski, A.;
Magdalenić, J.;
Marqué, C.;
Morosan, D.;
Rucker, H.

Publication type:

Article

Solar type II radio bursts associated with CME expansions as shown by EUV waves.

Published in:

Astronomy & Astrophysics / Astronomie et Astrophysique, 2015, v. 578, p. 1, doi. 10.1051/0004-6361/201425388

By:

Cunha-Silva, R. D.;
Fernandes, F. C. R.;
Selhorst, C. L.

Publication type:

Article

MHD modelling of coronal loops: injection of high-speed chromospheric flows.

Published in:

Astronomy & Astrophysics / Astronomie et Astrophysique, 2014, v. 567, p. 1, doi. 10.1051/0004-6361/201323012

By:

Petralia, A.;
Reale, F.;
Orlando, S.;
Klimchuk, J. A.

Publication type:

Article

The dynamical behaviour of a jet in an on-disk coronal hole observed with AIA/SDO.

Published in:

Astronomy & Astrophysics / Astronomie et Astrophysique, 2014, v. 562, p. 1, doi. 10.1051/0004-6361/201322408

By:

Chandrashekhar, K.;
Morton, R. J;
Banerjee, D.;
Gupta, G. R.

Publication type:

Article

Excitation of an outflow from the lower solar atmosphere and a co-temporal EUV transient brightening.

Published in:

Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 560, p. 1, doi. 10.1051/0004-6361/201322396

By:

Nelson, C. J.;
Doyle, J. G.

Publication type:

Article

Star-planet magnetic interaction and evaporation of planetary atmospheres.

Published in:

Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 557, n. 1, p. 1, doi. 10.1051/0004-6361/201321790

By:

A. F. Lanza

Publication type:

Article

Modulation of neutral interstellar He, Ne, O in the heliosphere. Survival probabilities and abundances at IBEX.

Published in:

Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 557, n. 1, p. 1, doi. 10.1051/0004-6361/201321700

By:

Bzowski, M.;
Sokół, J. M.;
Kubiak, M. A.;
Kucharek, H.

Publication type:

Article

On the role of current dissipation in the energization of coronal bright points.

Published in:

Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 557, n. 1, p. 1, doi. 10.1051/0004-6361/201321281

By:

Adamson, E.;
Büchner, J.;
Otto, A.

Publication type:

Article

Properties of multistranded, impulsively heated hydrodynamic loop models (Research Note).

Published in:

Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 552, n. 1, p. 1, doi. 10.1051/0004-6361/201116542

By:

Susino, R.;
Spadaro, D.;
Lanzafame, A. C.;
Lanza, A. F.

Publication type:

Article

Comparative Study of the Thermal Stability of Be-Based Extreme Ultraviolet Pellicles.

Published in:

Technical Physics, 2023, v. 68, p. S630, doi. 10.1134/S106378422390098X

By:

Zuev, S. Yu.;
Lopatin, A. Ya.;
Luchin, V. I.;
Salashchenko, N. N.;
Tatarskiy, D. A.;
Tsybin, N. N.;
Chkhalo, N. I.

Publication type:

Article

Absolutely Calibrated Spectrally Resolved Measurements of Xe Laser Plasma Radiation Intensity in the EUV Range.

Published in:

Technical Physics, 2018, v. 63, n. 10, p. 1507, doi. 10.1134/S1063784218100080

By:

Butorin, P. S.;
Zadiranov, Yu. M.;
Zuev, S. Yu.;
Kalmykov, S. G.;
Polkovnikov, V. N.;
Sasin, M. E.;
Chkhalo, N. I.

Publication type:

Article

EUV SOURCE AT HiLASE: THE STATE OF THE ART.

Published in:

MM Science Journal, 2019, p. 3406, doi. 10.17973/MMSJ.2019_12_2018131

By:

LIBERATORE, CHIARA;
DUDA, MARTIN;
SIKOCINSKI, PAWEL;
CHYLA, MICHAL;
ENDO, AKIRA;
SMRZ, MARTIN;
MOCEK, TOMAS

Publication type:

Article

Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair.

Published in:

Applied Physics A: Materials Science & Processing, 2014, v. 117, n. 4, p. 1705, doi. 10.1007/s00339-014-8745-0

By:

Noh, J.;
Stanford, M.;
Lewis, B.;
Fowlkes, J.;
Plank, H.;
Rack, P.

Publication type:

Article

EUV damage threshold measurements of Mo/Si multilayer mirrors.

Published in:

Applied Physics A: Materials Science & Processing, 2012, v. 108, n. 2, p. 263, doi. 10.1007/s00339-012-7037-9

By:

Müller, Matthias;
Barkusky, Frank;
Feigl, Torsten;
Mann, Klaus

Publication type:

Article

EUV reflectometry for thickness and density determination of thin film coatings.

Published in:

Applied Physics A: Materials Science & Processing, 2012, v. 107, n. 4, p. 795, doi. 10.1007/s00339-012-6914-6

By:

Döring, S.;
Hertlein, F.;
Bayer, A.;
Mann, K.

Publication type:

Article

Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source.

Published in:

Applied Physics A: Materials Science & Processing, 2011, v. 105, n. 1, p. 17, doi. 10.1007/s00339-011-6540-8

By:

Barkusky, Frank;
Bayer, Armin;
Mann, Klaus

Publication type:

Article

Moving magnet multi-DOF planar actuator technology with contactless energy and data transfer.

Published in:

Electromotion, 2009, v. 16, n. 2, p. 53

By:

Jansen, J. W.;
Van Lierop, C. M. M.;
De Boeij, J.;
Lomonova, Elena A.;
Duarte, J. L.;
Vandenput, A. J. A.

Publication type:

Article

ionospheres of planets and exoplanets.

Published in:

Astronomy & Geophysics, 2019, v. 60, n. 1, p. 1.25, doi. 10.1093/astrogeo/atz047

By:

Mendillo, Michael

Publication type:

Article

Conversion efficiency calculations for EUV radiation emitted from laser-produced Tin plasmas.

Published in:

Turkish Journal of Physics, 2009, v. 33, n. 6, p. 363, doi. 10.3906/fız-0903-5

By:

ATALAY, Betül;
KENAR, Necla;
DEMİR, Arif

Publication type:

Article

Dynamics of the ion energy spectrum in EUV-induced hydrogen plasma.

Published in:

Plasma Physics Reports, 2017, v. 43, n. 6, p. 614, doi. 10.1134/S1063780X17060010

By:

Abrikosov, A.;
Yakushev, O.;
Lopaev, D.;
Krivtsun, V.

Publication type:

Article

Loss of hydrogen atoms in H plasma on the surfaces of materials used in EUV lithography.

Published in:

Plasma Physics Reports, 2011, v. 37, n. 10, p. 881, doi. 10.1134/S1063780X11090157

By:

Zyryanov, S.;
Kovalev, A.;
Lopaev, D.;
Malykhin, E.;
Rakhimov, A.;
Rakhimova, T.;
Koshelev, K.;
Krivtsun, V.

Publication type:

Article

Study of the generation of the 13.5-nm EUV radiation from Sn ions in a CO<sub>2</sub> laser-produced plasma.

Published in:

Plasma Physics Reports, 2010, v. 36, n. 2, p. 129, doi. 10.1134/S1063780X10020042

By:

Volkov, G.;
Zaitsev, V.;
Makarov, K.;
Napartovich, A.;
Rerikh, V.;
Smakovskii, Yu.;
Stepanov, A.;
Cherkovets, V.;
Rupasov, A.;
Satov, Yu.

Publication type:

Article

Enhancing Parameters Tuning of Overlay Models with Ridge Regression: Addressing Multicollinearity in High-Dimensional Data.

Published in:

Mathematics (2227-7390), 2024, v. 12, n. 20, p. 3179, doi. 10.3390/math12203179

By:

Magklaras, Aris;
Gogos, Christos;
Alefragis, Panayiotis;
Birbas, Alexios

Publication type:

Article