Works matching DE "SPUTTERING (Physics)"
Results: 1509
Synthesis and high-temperature corrosion resistance of Ti-Zr-Si-N coatings deposited by means of sputtering.
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- Corrosion Engineering, Science & Technology, 2019, v. 54, n. 3, p. 233, doi. 10.1080/1478422X.2019.1573498
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Properties and corrosion behaviour of reactive magnetron sputtered TiAlN coatings on AISI 316L SS in simulated bodily fluid.
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- Corrosion Engineering, Science & Technology, 2007, v. 42, n. 4, p. 349, doi. 10.1179/174327807X234723
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A Breakthrough in the Production of Flexible Thin Film Solar Cells.
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- Innovation, 2009, v. 9, n. 1, p. 7
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- Article
Strongly (001) Oriented Bimorph PZT Film on Metal Foils Grown by rf‐Sputtering for Wrist‐Worn Piezoelectric Energy Harvesters.
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- Advanced Functional Materials, 2018, v. 28, n. 36, p. 1, doi. 10.1002/adfm.201801327
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- Article
Annealing characteristics of Si doped amorphous silica films by rf sputtering.
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- Journal of Materials Science, 1999, v. 34, n. 2, p. 267, doi. 10.1023/A:1004441203187
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Dissolution and adhesion behaviour of radio-frequency magnetron-sputtered Ca–P coatings.
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- Journal of Materials Science, 1998, v. 33, n. 13, p. 3371, doi. 10.1023/A:1013245632321
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- Article
The effects of aluminium composition on the mechanical properties of reactivity sputtered TiAlN films.
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- Journal of Materials Science, 1998, v. 33, n. 8, p. 2137, doi. 10.1023/A:1004327421261
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Formation of CuInSe2 by the selenization of sputtered Cu/In layers.
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- Journal of Materials Science, 1997, v. 32, n. 7, p. 1889, doi. 10.1023/A:1018517209661
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- Article
Prediction of fracture in grain boundaries of nano-coatings using cohesive zone elements.
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- PAMM: Proceedings in Applied Mathematics & Mechanics, 2016, v. 16, n. 1, p. 163, doi. 10.1002/pamm.201610070
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- Article
Characterization of multilayer pvd nanocoatings deposited on tungsten carbide cutting tools.
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- International Journal of Advanced Manufacturing Technology, 2008, v. 38, n. 5/6, p. 622, doi. 10.1007/s00170-007-1059-z
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Electrical glow discharges and plasma parameter of planar sputtering system for silver target.
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- Iraqi Journal of Physics, 2018, v. 16, n. 37, p. 65, doi. 10.30723/ijp.v16i37.77
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- Article
Preparation and Optimization of High Quality TiN Films.
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- Turkish Journal of Physics, 2003, v. 27, n. 6, p. 519
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- Article
Flexible and Transparent Aluminum‐Nitride‐Based Surface‐Acoustic‐Wave Device on Polymeric Polyethylene Naphthalate.
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- Advanced Electronic Materials, 2019, v. 5, n. 6, p. N.PAG, doi. 10.1002/aelm.201900095
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- Article
A Sustainable Approach to Flexible Electronics with Zinc‐Tin Oxide Thin‐Film Transistors.
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- Advanced Electronic Materials, 2018, v. 4, n. 7, p. 1, doi. 10.1002/aelm.201800032
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- Article
High-temperature sputtering of bimetallic clusters by low-energy argon clusters.
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- Technical Physics Letters, 2016, v. 42, n. 10, p. 975, doi. 10.1134/S106378501610014X
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Nitriding of stainless steel in plasma of a pulse electron beam.
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- Technical Physics Letters, 2016, v. 42, n. 5, p. 491, doi. 10.1134/S1063785016050096
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Neutral cluster size and fragmentation during ion sputtering of solids.
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- Technical Physics Letters, 2015, v. 41, n. 8, p. 771, doi. 10.1134/S106378501508026X
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Ion beam crystallization of InAs/GaAs(001) nanostructures.
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- Technical Physics Letters, 2015, v. 41, n. 7, p. 661, doi. 10.1134/S1063785015070056
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Simulation of material sputtering with a focused ion beam.
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- Technical Physics Letters, 2015, v. 41, n. 6, p. 610, doi. 10.1134/S106378501506019X
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Sputtering of atoms during ion bombardment of media containing nanosized particles in the near-surface region.
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- Technical Physics Letters, 2015, v. 41, n. 2, p. 187, doi. 10.1134/S1063785015020224
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Properties of dust particles formed upon sputtering of a barium strontium titanate ceramic target in plasma of high-frequency discharge in oxygen.
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- Technical Physics Letters, 2014, v. 40, n. 9, p. 819, doi. 10.1134/S1063785014090168
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Epitaxy of Pb(Zr, Ti)O films on Ir/YSZ/Si under conditions of cathode sputtering: The effect of reactive gas composition.
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- Technical Physics Letters, 2014, v. 40, n. 8, p. 644, doi. 10.1134/S1063785014080045
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Photoelectric properties of n-TiO/ p-CoNiO heterostructures.
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- Technical Physics Letters, 2014, v. 40, n. 2, p. 149, doi. 10.1134/S1063785014020229
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Depth profiling of fullerene-containing structures by time-of-flight secondary ion mass spectrometry.
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- Technical Physics Letters, 2013, v. 39, n. 12, p. 1097, doi. 10.1134/S1063785013120183
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- Article
Photoreflectance of GaAs structures with a Mn δ-doped layer.
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- Technical Physics Letters, 2013, v. 39, n. 11, p. 1008, doi. 10.1134/S1063785013110199
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Amorphous silicon coatings with silver nanoparticles.
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- Technical Physics Letters, 2013, v. 39, n. 11, p. 998, doi. 10.1134/S1063785013110242
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Nonequilibrium structures and decay processes of clusters sputtered by ion bombardment.
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- Technical Physics Letters, 2013, v. 39, n. 6, p. 514, doi. 10.1134/S1063785013060072
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The effect of ion energy on the surface morphology of platinum film under high-frequency ion plasma sputtering.
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- Technical Physics Letters, 2013, v. 39, n. 1, p. 130, doi. 10.1134/S1063785013010306
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A new alternative to secondary CsM ions for depth profiling of multilayer metal structures by secondary ion mass spectrometry.
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- Technical Physics Letters, 2013, v. 39, n. 1, p. 46, doi. 10.1134/S1063785013010070
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Morphology and phase changes in laser-ablated TiO particles during thermal annealing.
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- Technical Physics Letters, 2012, v. 38, n. 4, p. 328, doi. 10.1134/S1063785012040128
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Peculiarities in the formation of gold nanoparticles by ion implantation in stabilized zirconia.
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- Technical Physics Letters, 2012, v. 38, n. 2, p. 185, doi. 10.1134/S1063785012020253
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Broadband dielectric response of amorphous arsenic triselenide layers grown by different methods.
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- Technical Physics Letters, 2011, v. 37, n. 9, p. 842, doi. 10.1134/S1063785011090215
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Carbon nanocapsules formed in T-10 tokamak.
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- Technical Physics Letters, 2010, v. 36, n. 7, p. 585, doi. 10.1134/S1063785010070011
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Catalytic layers for fuel cells based on polyaniline and α-C〈Pt〉 composite obtained by magnetron sputtering.
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- Technical Physics Letters, 2007, v. 33, n. 7, p. 545, doi. 10.1134/S1063785007070024
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- Article
Single crystal aluminum deposit formation on isotropic substrates by means of self-organized ion sputtering.
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- Technical Physics Letters, 2006, v. 32, n. 10, p. 868, doi. 10.1134/S1063785006100154
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Growth of GaAs nanowhisker arrays by magnetron sputtering on Si(111) substrates.
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- Technical Physics Letters, 2006, v. 32, n. 6, p. 520, doi. 10.1134/S1063785006060216
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Laser deposition of gallium nitride films.
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- Technical Physics Letters, 2006, v. 32, n. 3, p. 197, doi. 10.1134/S1063785006030059
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Fluoride compound targets for the sputter deposition of thin films of high- T <sub>c</sub> superconductors.
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- Technical Physics Letters, 2006, v. 32, n. 2, p. 158, doi. 10.1134/S1063785006020222
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Thin Fullerene-Containing Films Synthesized by Ion Beam Sputtering of Fullerene Mixtures with Doping Additives in Vacuum.
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- Technical Physics Letters, 2005, v. 31, n. 12, p. 1022, doi. 10.1134/1.2150887
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- Article
Use of the Anisotropic Magnetoresistance Effect for Direct Measurement of the Coercivity and Exchange Bias Fields of Magnetization Reversal in Conducting Magnetic Films of Nanometer Thickness.
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- Technical Physics Letters, 2005, v. 31, n. 10, p. 875, doi. 10.1134/1.2121844
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GaAs Nanowhisker Arrays Grown by Magnetron Sputter Deposition.
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- Technical Physics Letters, 2005, v. 31, n. 8, p. 644, doi. 10.1134/1.2035352
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Magnetron Sputter Deposition of (SiC)<sub>1 – </sub><sub>x</sub>(AlN)<sub>x</sub> Solid Solution Films.
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- Technical Physics Letters, 2005, v. 31, n. 2, p. 138, doi. 10.1134/1.1877627
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Conductivity and the Hall Coefficient of Nanostructured Titanium Nitride Films.
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- Technical Physics Letters, 2004, v. 30, n. 11, p. 930, doi. 10.1134/1.1829346
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- Article
Synthesis and Characterization of n-ZnO:Al/CoPc/p-Si Structures.
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- Technical Physics Letters, 2004, v. 30, n. 11, p. 967, doi. 10.1134/1.1829358
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Statistical Modeling of the Ion–Plasma Sputter Deposition of Thin YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7 – x</sub> High-Temperature Superconductor Films.
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- Technical Physics Letters, 2004, v. 30, n. 4, p. 287, doi. 10.1134/1.1748602
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Inhomogeneous Character of the Initial Stage of Ion Beam Deposition of Ultrathin Gold Films.
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- Technical Physics Letters, 2004, v. 30, n. 3, p. 256, doi. 10.1134/1.1707185
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X-Ray Interference Effects in Thin Equiatomic Co–Pt Single Crystal Films.
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- Technical Physics Letters, 2004, v. 30, n. 1, p. 42, doi. 10.1134/1.1646711
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The Energy Spectra of Clusters Formed during Ion Sputtering of Metals.
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- Technical Physics Letters, 2003, v. 29, n. 12, p. 1048, doi. 10.1134/1.1639470
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Simulation of Ion Sputtering of Copper Clusters from Single Crystal Graphite Surface.
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- Technical Physics Letters, 2003, v. 29, n. 11, p. 938, doi. 10.1134/1.1631370
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Wavy Nanorelief Transferred to the Surface of Various Materials.
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- Technical Physics Letters, 2003, v. 29, n. 11, p. 951, doi. 10.1134/1.1631375
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