Works matching DE "TITANIUM nitride films"
Results: 101
Influence of nitrogen content on the thermal diffusivity of TiN films prepared by magnetron sputtering.
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- Surface Engineering, 2020, v. 36, n. 2, p. 192, doi. 10.1080/02670844.2019.1646964
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- Article
Preferentially oriented electron beam deposited TiN thin films using focused jet of nitrogen gas.
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- Surface Engineering, 2016, v. 32, n. 11, p. 834, doi. 10.1080/02670844.2016.1159832
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- Article
Bias influence on titanium interlayer for titanium nitride films.
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- Surface Engineering, 2016, v. 32, n. 4, p. 279, doi. 10.1179/1743294415Y.0000000097
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- Article
Titanium-nitride-oxIde-coated stents multicenter registry in diaBEtic patienTs: the TIBET registry.
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- Heart & Vessels, 2012, v. 27, n. 2, p. 151, doi. 10.1007/s00380-011-0136-2
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- Article
Nonequilibrium transport near the superconducting transition in TiN films.
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- JETP Letters, 2015, v. 100, n. 10, p. 635, doi. 10.1134/S0021364014220135
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- Article
Tuning the plasmonic resonance in TiN refractory metal.
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- Scientific Reports, 2024, v. 14, n. 1, p. 1, doi. 10.1038/s41598-024-55000-0
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- Article
Field-Emission Cathodes Based on Microchannel Plates.
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- Semiconductors, 2019, v. 53, n. 15, p. 2037, doi. 10.1134/S1063782619150090
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- Article
Impact of nitrogen reactive gas and substrate temperature on the optical, electrical and structural properties of sputtered TiN thin films.
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- Journal of Materials Science: Materials in Electronics, 2020, v. 31, n. 22, p. 20009, doi. 10.1007/s10854-020-04523-z
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- Article
Effect of nitrogen concentration on titanium nitride thin film formation.
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- International Journal of Mathematics & Physics, 2023, v. 14, n. 2, p. 49, doi. 10.26577/ijmph.2023.v14.i2.06
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- Article
切削工具用 Al 高含有 fcc-AlTiN 皮膜の開発と実用化.
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- Journal of the Japan Society of Powder & Powder Metallurgy / Funtai Oyobi Fummatsu Yakin, 2021, v. 68, n. 7, p. 265, doi. 10.2497/jjspm.68.265
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- Article
Crack growth based on indentation along substrate and nanocrystallites in titanium diboride thin films.
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- Fatigue & Fracture of Engineering Materials & Structures, 2023, v. 46, n. 7, p. 2714, doi. 10.1111/ffe.13986
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- Article
Fracture associated with static and sliding indentation of multicomponent hard coatings on silicon substrates.
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- Fatigue & Fracture of Engineering Materials & Structures, 2023, v. 46, n. 4, p. 1641, doi. 10.1111/ffe.13960
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- Article
Influence of substrates on the properties of titanium nitride films deposited by DC reaction magnetron sputtering.
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- Applied Physics A: Materials Science & Processing, 2018, v. 124, n. 8, p. 1, doi. 10.1007/s00339-018-1981-y
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- Article
Correlations of plasma parameters and properties of magnetron sputtered TiN films.
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- European Physical Journal - Applied Physics, 2012, v. 59, n. 2, p. N.PAG, doi. 10.1051/epjap/2012120108
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- Article
Reactive ionized physical vapor deposition of thin films.
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- 2011
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- Case Study
Effects of Annealing on TiN Thin Film Growth by DC Magnetron Sputtering.
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- Advances in Mechanical Engineering (Sage Publications Inc.), 2014, p. 1, doi. 10.1155/2014/373847
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- Article
Electrical Characterization of Postmetal Annealed Ultrathin TiN Gate Electrodes in Si MOS Capacitors.
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- Advances in Materials Science & Engineering, 2016, p. 1, doi. 10.1155/2016/3740517
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- Article
PROPERTIES OF (Ti, Al)N FILM PREPARED BY PVD CATHODIC ARC.
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- Suranaree Journal of Science & Technology, 2013, v. 20, n. 3, p. 221
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- Article
RETRACTED ARTICLE: Nanocharacterization of Titanium Nitride Thin Films Obtained by Reactive Magnetron Sputtering.
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- JOM: The Journal of The Minerals, Metals & Materials Society (TMS), 2017, v. 69, n. 8, p. 1455, doi. 10.1007/s11837-015-1460-2
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- Article
In‐Plane AlN‐based Actuator: Toward a New Generation of Piezoelectric MEMS.
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- Advanced Electronic Materials, 2023, v. 9, n. 8, p. 1, doi. 10.1002/aelm.202300015
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- Article
Cover Feature: Sputtered Titanium Nitride Films on Titanium Foam Substrates as Electrodes for High‐Power Electrochemical Capacitors (ChemElectroChem 16/2018).
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- 2018
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- Publication type:
- Cover Art
Sputtered Titanium Nitride Films on Titanium Foam Substrates as Electrodes for High‐Power Electrochemical Capacitors.
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- ChemElectroChem, 2018, v. 5, n. 16, p. 2199, doi. 10.1002/celc.201800467
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- Article
ITO-Induced Nonlinear Optical Response Enhancement of Titanium Nitride Thin Films.
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- Nanomaterials (2079-4991), 2024, v. 14, n. 12, p. 1040, doi. 10.3390/nano14121040
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- Article
Nanostructures for Photonics and Optoelectronics.
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- Nanomaterials (2079-4991), 2022, v. 12, n. 11, p. 1820, doi. 10.3390/nano12111820
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- Article
Broadband Absorption Based on Thin Refractory Titanium Nitride Patterned Film Metasurface.
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- Nanomaterials (2079-4991), 2021, v. 11, n. 5, p. 1092, doi. 10.3390/nano11051092
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- Article
Organic Optoelectronic Materials (Volume II).
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- Crystals (2073-4352), 2021, v. 11, n. 11, p. 1327, doi. 10.3390/cryst11111327
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- Article
X-Ray Photoelectron Spectroscopy Depth Profiling of As-Grown and Annealed Titanium Nitride Thin Films.
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- Crystals (2073-4352), 2021, v. 11, n. 3, p. 239, doi. 10.3390/cryst11030239
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- Article
Influence of Interlayers on Adhesion Strength of TiN Film on Mg Alloy.
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- Coatings (2079-6412), 2024, v. 14, n. 1, p. 121, doi. 10.3390/coatings14010121
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- Article
The Effect of Match between High Power Impulse and Bias Voltage: TiN Coating Deposited by High Power Impulse Magnetron Sputtering.
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- Coatings (2079-6412), 2021, v. 11, n. 7, p. 822, doi. 10.3390/coatings11070822
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- Article
Effect of Ion Energy on the Microstructure and Properties of Titanium Nitride Thin Films Deposited by High Power Pulsed Magnetron Sputtering.
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- Coatings (2079-6412), 2021, v. 11, n. 5, p. 579, doi. 10.3390/coatings11050579
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- Article
Special Issue: Current Research in Thin Film Deposition: Applications, Theory, Processing, and Characterisation.
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- 2020
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- Publication type:
- Editorial
Influence of C2H2 Flows on Microstructure and Corrosion Resistance of TiCN Films Doped with Carbon Atoms.
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- Coatings (2079-6412), 2018, v. 8, n. 12, p. 458, doi. 10.3390/coatings8120458
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- Publication type:
- Article
Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering.
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- Coatings (2079-6412), 2017, v. 7, n. 12, p. 209, doi. 10.3390/coatings7120209
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- Publication type:
- Article
Evolution of Chemical, Structural, and Mechanical Properties of Titanium Nitride Films with Different Thicknesses Fabricated Using Pulsed DC Magnetron Sputtering.
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- Materials (1996-1944), 2024, v. 17, n. 24, p. 6067, doi. 10.3390/ma17246067
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- Article
Structural, Mechanical, and Decorative Properties of Sputtered TiN and Ti (N, C) Films for Orthodontic Applications; an In Vitro Study.
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- Materials (1996-1944), 2021, v. 14, n. 18, p. 5175, doi. 10.3390/ma14185175
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- Article
Chalcedony beads coated with titanium nitride.
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- Gems & Gemology, 2017, v. 53, n. 2, p. 257
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- Article
Optimization of process conditions for the production of TiON film by sol-gel process using response surface methodology.
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- Bulletin of Materials Science, 2014, v. 37, n. 6, p. 1301, doi. 10.1007/s12034-014-0075-5
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- Article
Tribological Investigation of W-Ti-N Thin Film on Plasma Nitrided Stainless-Steel Multilayer Coating.
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- JOM: The Journal of The Minerals, Metals & Materials Society (TMS), 2023, v. 75, n. 8, p. 3111, doi. 10.1007/s11837-023-05854-y
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- Article
The effect of formation of titanium nitride thin film on surface characteristics of titanium by nitrogen ion implantation.
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- Journal of Chemical Research, 2016, v. 40, n. 1, p. 12, doi. 10.3184/174751916X14495697549295
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- Article
Magnetic Field Evolution of the Linear and Nonlinear Conduction of Perforated TiN Films.
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- Journal of Experimental & Theoretical Physics, 2020, v. 131, n. 2, p. 298, doi. 10.1134/S1063776120050167
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- Publication type:
- Article
Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structures.
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- Applied Sciences (2076-3417), 2022, v. 12, n. 20, p. N.PAG, doi. 10.3390/app122010415
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- Publication type:
- Article
THE INFLUENCE OF NITROGEN CONTENT ON THE MECHANICAL PROPERTIES OF TiN<sub>x</sub>THIN FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING.
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- Bulletin of the Transilvania University of Brasov, Series I: Engineering Sciences, 2012, v. 5, n. 2, p. 59
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- Publication type:
- Article
Titanium Nitride Thin Film Based Low-Redox-Interference Potentiometric pH Sensing Electrodes.
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- Sensors (14248220), 2021, v. 21, n. 1, p. 42, doi. 10.3390/s21010042
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- Publication type:
- Article
Composition, microstructure and SERS properties of titanium nitride thin film prepared via nitridation of sol-gel derived titania thin films.
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- Journal of Raman Spectroscopy, 2017, v. 48, n. 4, p. 578, doi. 10.1002/jrs.5080
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- Article
Effects of polyvinylpyrrolidone on carbothermal reduction and nitridation of titanium nitride powder.
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- Materials Research Innovations, 2015, v. 19, p. S9-73, doi. 10.1179/1432891715Z.0000000001923
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- Article
Crystal structure and mechanical properties of titanium nitride films synthesized by magnetron sputtering with a hot target.
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- Glass Physics & Chemistry, 2017, v. 43, n. 5, p. 477, doi. 10.1134/S1087659617050157
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- Publication type:
- Article
Growth and Characterisation of Pulsed-Laser Deposited Tin Thin Films on Cube-Textured Copper at Different Temperatures.
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- Archives of Metallurgy & Materials, 2016, v. 61, n. 2, p. 1031, doi. 10.1515/amm-2016-0174
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- Publication type:
- Article
Ion-beam assisted sputtering of titanium nitride thin films.
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- Scientific Reports, 2023, v. 13, n. 1, p. 1, doi. 10.1038/s41598-023-31549-0
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- Publication type:
- Article
CARBON ION IRRADIATION EFFECTS ON PULSED LASER DEPOSITED TITANIUM NITRIDE THIN FILMS.
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- Surface Review & Letters, 2015, v. 22, n. 2, p. -1, doi. 10.1142/S0218625X15500201
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- Publication type:
- Article
EFFECT OF SUBSTRATE TEMPERATURE ON MICRO-STRUCTURAL PROPERTIES OF AND FILMS DEPOSITED BY E-BEAM EVAPORATION TECHNIQUE.
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- Surface Review & Letters, 2012, v. 19, n. 4, p. -1, doi. 10.1142/S0218625X12500370
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- Publication type:
- Article