Works matching DE "EXTREME ultraviolet lithography"
Results: 155
Observations of solar X-ray and EUV jets and their related phenomena.
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- Astronomische Nachrichten, 2016, v. 337, n. 10, p. 1024, doi. 10.1002/asna.201612428
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- Article
LOFAR observations of the quiet solar corona.
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- Astronomy & Astrophysics / Astronomie et Astrophysique, 2018, v. 614, p. N.PAG, doi. 10.1051/0004-6361/201630067
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- Article
Solar type II radio bursts associated with CME expansions as shown by EUV waves.
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- Astronomy & Astrophysics / Astronomie et Astrophysique, 2015, v. 578, p. 1, doi. 10.1051/0004-6361/201425388
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- Article
MHD modelling of coronal loops: injection of high-speed chromospheric flows.
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- Astronomy & Astrophysics / Astronomie et Astrophysique, 2014, v. 567, p. 1, doi. 10.1051/0004-6361/201323012
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- Article
The dynamical behaviour of a jet in an on-disk coronal hole observed with AIA/SDO.
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- Astronomy & Astrophysics / Astronomie et Astrophysique, 2014, v. 562, p. 1, doi. 10.1051/0004-6361/201322408
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- Article
Excitation of an outflow from the lower solar atmosphere and a co-temporal EUV transient brightening.
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- Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 560, p. 1, doi. 10.1051/0004-6361/201322396
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- Article
Star-planet magnetic interaction and evaporation of planetary atmospheres.
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- Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 557, n. 1, p. 1, doi. 10.1051/0004-6361/201321790
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- Article
Modulation of neutral interstellar He, Ne, O in the heliosphere. Survival probabilities and abundances at IBEX.
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- Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 557, n. 1, p. 1, doi. 10.1051/0004-6361/201321700
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- Article
On the role of current dissipation in the energization of coronal bright points.
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- Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 557, n. 1, p. 1, doi. 10.1051/0004-6361/201321281
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- Article
Properties of multistranded, impulsively heated hydrodynamic loop models (Research Note).
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- Astronomy & Astrophysics / Astronomie et Astrophysique, 2013, v. 552, n. 1, p. 1, doi. 10.1051/0004-6361/201116542
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- Publication type:
- Article
Conversion efficiency calculations for EUV radiation emitted from laser-produced Tin plasmas.
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- Turkish Journal of Physics, 2009, v. 33, n. 6, p. 363, doi. 10.3906/fız-0903-5
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- Article
Radiative heating of thin Al foils by intense extreme ultraviolet radiation.
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- JETP Letters, 2016, v. 103, n. 5, p. 350, doi. 10.1134/S0021364016050040
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- Publication type:
- Article
New polyphenols of the fluorene family and positive-tone photoresists based on them for 22-nm nanolithography.
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- Doklady Chemistry, 2012, v. 442, n. 1, p. 7, doi. 10.1134/S0012500812010041
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- Publication type:
- Article
Nanoparticle Adhesion Models: Applications in Particulate Contaminant Removal from Extreme Ultraviolet Lithography Photomasks.
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- Journal of Adhesion Science & Technology, 2011, v. 25, n. 8, p. 781, doi. 10.1163/016942410X511123
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- Publication type:
- Article
Particle Cleaning of EUV Reticles.
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- Journal of Adhesion Science & Technology, 2009, v. 23, n. 12, p. 1603, doi. 10.1163/156856109X440975
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- Article
Prediction of particle deposition velocity onto an extreme ultraviolet lithography mask in parallel airflow considering electrophoresis.
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- International Journal of Modern Physics C: Computational Physics & Physical Computation, 2014, v. 25, n. 6, p. -1, doi. 10.1142/S0129183114500107
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- Article
Light sources: More efficient plasmas.
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- Nature Photonics, 2014, v. 8, n. 10, p. 747, doi. 10.1038/nphoton.2014.232
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- Article
Attosecond photonics: Probing molecular hydrogen.
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- Nature Photonics, 2014, v. 8, n. 5, p. 350, doi. 10.1038/nphoton.2014.99
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- Publication type:
- Article
Femtosecond to attosecond light pulses from a molecular modulator.
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- Nature Photonics, 2011, v. 5, n. 11, p. 664, doi. 10.1038/nphoton.2011.256
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- Publication type:
- Article
Extreme-ultraviolet sources: Higher harmonics with plasmonics.
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- Nature Photonics, 2011, v. 5, n. 11, p. 646, doi. 10.1038/nphoton.2011.266
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- Article
Cheating physics.
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- Nature Photonics, 2010, v. 4, n. 1, p. 19, doi. 10.1038/nphoton.2009.248
- Publication type:
- Article
EUV lithography: Lithography gets extreme.
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- Nature Photonics, 2010, v. 4, n. 1, p. 24, doi. 10.1038/nphoton.2009.251
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- Article
Lithography roadmap on track.
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- Nature Photonics, 2010, v. 4, n. 1, p. 20, doi. 10.1038/nphoton.2009.253
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- Article
The shrinking chip.
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- 2009
- Publication type:
- Editorial
Magnetic jam in the corona of the Sun.
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- Nature Physics, 2015, v. 11, n. 6, p. 492, doi. 10.1038/nphys3315
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- Article
Correction to: Investigation of recurrent EUV jets from highly dynamic magnetic field region.
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- 2017
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- Publication type:
- Erratum
Numerical optimization of the electrical characteristics of an EUV laser on 3 p-3 s transition in neonlike argon ions in low-inductance capillary-type discharge.
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- Technical Physics Letters, 2017, v. 43, n. 1, p. 31, doi. 10.1134/S1063785016120166
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- Publication type:
- Article
Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair.
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- Applied Physics A: Materials Science & Processing, 2014, v. 117, n. 4, p. 1705, doi. 10.1007/s00339-014-8745-0
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- Article
Performance boost for microchips.
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- Advanced Materials & Processes, 2012, v. 170, n. 6, p. 13
- Publication type:
- Article
First observation of natural circular dichroism spectra in the extreme ultraviolet region using a polarizing undulator-based optical system and its polarization characteristics.
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- Journal of Synchrotron Radiation, 2009, v. 16, n. 4, p. 455, doi. 10.1107/S0909049509012291
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- Article
Spectroscopic study of EUV and SXR transitions of Cs XXV.
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- Canadian Journal of Physics, 2018, v. 96, n. 8, p. 871, doi. 10.1139/cjp-2017-0359
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- Article
NEWS.
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- Glass Technology: European Journal of Glass Science & Technology Part A, 2022, v. 63, n. 1, p. 6
- Publication type:
- Article
Observations of the Earth's Ionosphere and Plasmasphere from International Space Station.
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- Transactions of the Japan Society of Aeronautical & Space Sciences, Aerospace Technology Japan, 2014, v. 12, n. ists 29, p. 47
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- Publication type:
- Article
Experimental Study on the Temporal Evolution Parameters of Laser–Produced Tin Plasma under Different Laser Pulse Energies for LPP–EUV Source.
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- Photonics, 2023, v. 10, n. 12, p. 1339, doi. 10.3390/photonics10121339
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- Publication type:
- Article
Research on Tip Characterization Techniques Based on Two-Dimensional Self-Traceable Nano-Gratings.
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- Photonics, 2023, v. 10, n. 11, p. 1272, doi. 10.3390/photonics10111272
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- Publication type:
- Article
XUV Transient Absorption Spectroscopy: Probing Laser-Perturbed Dipole Polarization in Single Atom, Macroscopic, and Molecular Regimes.
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- Photonics, 2017, v. 4, n. 1, p. 17, doi. 10.3390/photonics4010017
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- Publication type:
- Article
Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light.
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- Nanomaterials (2079-4991), 2024, v. 14, n. 11, p. 982, doi. 10.3390/nano14110982
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- Publication type:
- Article
Evolution in Lithography Techniques: Microlithography to Nanolithography.
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- Nanomaterials (2079-4991), 2022, v. 12, n. 16, p. 2754, doi. 10.3390/nano12162754
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- Article
High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results.
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- Nanomaterials (2079-4991), 2020, v. 10, n. 8, p. 1593, doi. 10.3390/nano10081593
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- Publication type:
- Article
Velocity map imaging and cross sections of Fe(CO)<sub>5</sub> for FEBIP applications.
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- European Physical Journal D (EPJ D), 2022, v. 76, n. 9, p. 1, doi. 10.1140/epjd/s10053-022-00476-6
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- Article
Recent Advances in Positive Photoresists: Mechanisms and Fabrication.
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- Materials (1996-1944), 2024, v. 17, n. 11, p. 2552, doi. 10.3390/ma17112552
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- Article
Transverse Deflection for Extreme Ultraviolet Pellicles.
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- Materials (1996-1944), 2023, v. 16, n. 9, p. 3471, doi. 10.3390/ma16093471
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- Article
Moving magnet multi-DOF planar actuator technology with contactless energy and data transfer.
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- Electromotion, 2009, v. 16, n. 2, p. 53
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- Publication type:
- Article
Removal of Tin from Extreme Ultraviolet Collector Optics by In- Situ Hydrogen Plasma Etching.
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- Plasma Chemistry & Plasma Processing, 2018, v. 38, n. 1, p. 223, doi. 10.1007/s11090-017-9852-4
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- Publication type:
- Article
The Solar Extreme Ultraviolet Monitor for MAVEN.
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- Space Science Reviews, 2015, v. 195, n. 1-4, p. 293, doi. 10.1007/s11214-015-0195-2
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- Publication type:
- Article
Enhancing Parameters Tuning of Overlay Models with Ridge Regression: Addressing Multicollinearity in High-Dimensional Data.
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- Mathematics (2227-7390), 2024, v. 12, n. 20, p. 3179, doi. 10.3390/math12203179
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- Publication type:
- Article
Temporal response of silicon EUV and soft X-ray detectors.
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- Instruments & Experimental Techniques, 2015, v. 58, n. 1, p. 102, doi. 10.1134/S0020441215010017
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- Publication type:
- Article
Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review.
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- High Power Laser Science & Engineering, 2023, v. 11, p. 1, doi. 10.1017/hpl.2023.53
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- Article
Optimization Design Method of a 6‐DOF Micromanipulation Mechanism for Extreme Ultraviolet Projection Lithography Objective Lens.
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- Shock & Vibration, 2024, v. 2024, p. 1, doi. 10.1155/2024/6168723
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- Publication type:
- Article
EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology.
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- Applied Sciences (2076-3417), 2019, v. 9, n. 14, p. 2827, doi. 10.3390/app9142827
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- Article