Works matching IS 2010135X AND DT 2015 AND VI 5 AND IP 2
1
- Journal of Advanced Dielectrics, 2015, v. 5, n. 2, p. -1, doi. 10.1142/S2010135X15020014
- Article
2
- Journal of Advanced Dielectrics, 2015, v. 5, n. 2, p. -1, doi. 10.1142/S2010135X15300029
- Taghaddos, Elaheh;
- Hejazi, Mehdi;
- Safari, Ahmad
- Article
3
- Journal of Advanced Dielectrics, 2015, v. 5, n. 2, p. -1, doi. 10.1142/S2010135X15300017
- Elissalde, C.;
- Chung, U.-C.;
- Philippot, G.;
- Lesseur, J.;
- Berthelot, R.;
- Sallagoity, D.;
- Albino, M.;
- Epherre, R.;
- Chevallier, G.;
- Buffière, S.;
- Weibel, A.;
- Bernard, D.;
- Majimel, J.;
- Aymonier, C.;
- Mornet, S.;
- Estournès, C.;
- Maglione, M.
- Article
4
- Journal of Advanced Dielectrics, 2015, v. 5, n. 2, p. -1, doi. 10.1142/S2010135X15500113
- Shin, Seonhyeop;
- Ko, Jae-Hyeon;
- Tsukada, Shinya;
- Akishige, Yukikuni;
- Roleder, Krystian;
- Rytz, Daniel
- Article
5
- Journal of Advanced Dielectrics, 2015, v. 5, n. 2, p. -1, doi. 10.1142/S2010135X15500150
- Shur, Vladimir;
- Akhmatkhanov, Andrey;
- Lobov, Alexey;
- Turygin, Anton
- Article
6
- Journal of Advanced Dielectrics, 2015, v. 5, n. 2, p. -1, doi. 10.1142/S2010135X15500125
- Zhang, Lin;
- Bass, Patrick;
- Cheng, Z.-Y.
- Article