Works matching IS 2010135X AND DT 2012 AND VI 2 AND IP 3
1
- Journal of Advanced Dielectrics, 2012, v. 2, n. 3, p. -1, doi. 10.1142/S2010135X12200019
- ZHOU, QIFA;
- LAM, KWOK HO;
- ZHU, BENPENG;
- ZHANG, XIABING;
- SHUNG, K. KIRK;
- YANG, TONGQING;
- TAKEUCHI, S.
- Article
2
- Journal of Advanced Dielectrics, 2012, v. 2, n. 3, p. -1, doi. 10.1142/S2010135X12500191
- Article
3
- Journal of Advanced Dielectrics, 2012, v. 2, n. 3, p. -1, doi. 10.1142/S2010135X12300113
- LU, SHENG-GUO;
- ZHANG, QIMING
- Article
4
- Journal of Advanced Dielectrics, 2012, v. 2, n. 3, p. -1, doi. 10.1142/S2010135X12500178
- CUI, WEIWEI;
- TANG, DONGYAN
- Article
5
- Journal of Advanced Dielectrics, 2012, v. 2, n. 3, p. -1, doi. 10.1142/S2010135X12500166
- MANNA, J. S.;
- MITRA, M. K.;
- MUKHERJEE, S.;
- DAS, G. C.
- Article
6
- Journal of Advanced Dielectrics, 2012, v. 2, n. 3, p. -1, doi. 10.1142/S2010135X12500142
- DE SOUSA, F. F.;
- FREIRE, P. T. C.;
- FILHO, J. MENDES;
- OLIVEIRA, A. C.;
- LONGHINOTTI, E.;
- DE VASCONCELOS, P. H. M.;
- SARAIVA, G. D.;
- MOREIRA, S. G. C.;
- ALCANTARA, P.
- Article