Title: OXYGEN PARTIAL PRESSURE AND SUBSTRATE BIAS VOLTAGE INFLUENCED STRUCTURAL, ELECTRICAL AND OPTICAL PROPERTIES OF RF MAGNETRON SPUTTERED Ag2Cu2O3 FILMS.
Authors: UTHANNA, S.; REDDY, M. HARI PRASAD; PIERSON, J. F.
Abstract: Ag2Cu2O3 films were deposited on glass substrates held at 303 K by RF magnetron sputtering of Ag70 Cu30 target at different oxygen partial pressures and substrate bias voltages. Single phase Ag2Cu2O3 films were formed at an oxygen partial pressure of 2 × 10-2Pa. The films deposited at oxygen partial pressure 2 × 10-2Pa and substrate bias voltage of -60 V were nanocrystalline with crystallite size of 20 nm, low electrical resistivity of 3.9 Ωcm and optical band gap of 2.02 eV.
Subjects: ELECTRIC properties of metals; OXYGEN; PRESSURE; ELECTRIC potential; MOLECULAR structure; OPTICAL properties of metals; MAGNETRON sputtering; SILVER compounds; THIN films
Publication: International Journal of Nanoscience, 2011, Vol 10, Issue 4/5, p653
ISSN: 0219-581X
Publication type: Academic Journal
DOI: 10.1142/S0219581X11009209

OXYGEN PARTIAL PRESSURE AND SUBSTRATE BIAS VOLTAGE INFLUENCED STRUCTURAL, ELECTRICAL AND OPTICAL PROPERTIES OF RF MAGNETRON SPUTTERED Ag<sub>2</sub>Cu<sub>2</sub>O<sub>3</sub> FILMS.

UTHANNA, S.; REDDY, M. HARI PRASAD; PIERSON, J. F.