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Synthesis and the Crystal Structure of Aqua-Dioxo-Nitrato-(2,2[sup ′],6[sup ′],2[sup ″]-Terpyridine)-Neptunium(V) [NpO[sub 2](NO[sub 3])(Terpy)(H[sub 2]O)].
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- Crystallography Reports, 2003, v. 48, n. 1, p. 58, doi. 10.1134/1.1541744
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Crystal Structure of Samarium Hexamolybdoaluminate Sm[Al(OH)[sub 6]Mo[sub 6]O[sub 18]] · 11H[sub 2]O.
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- Crystallography Reports, 2002, v. 47, n. 3, p. 394, doi. 10.1134/1.1481922
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Synthesis and Crystal Structure of Bis(carbamide)chromatoneptunyl NpO[sub 2]CrO[sub 4] · 2[OC(NH[sub 2])[sub 2]].
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- Crystallography Reports, 2001, v. 46, n. 3, p. 383, doi. 10.1134/1.1376464
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POINTWISE APPROXIMATION OF CORNER SINGULARITIES FOR SINGULARLY PERTURBED ELLIPTIC PROBLEMS WITH CHARACTERISTIC LAYERS.
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- International Journal of Numerical Analysis & Modeling, 2010, v. 7, n. 3, p. 416
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Decomposition of the Solution to a Two-Dimensional Singularly Perturbed Convection–Diffusion Equation with Variable Coefficients in a Square and Estimates in Hölder Norms.
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- Computational Mathematics & Mathematical Physics, 2021, v. 61, n. 2, p. 194, doi. 10.1134/S0965542521020044
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Estimates in Hölder Classes for the Solution of an Inhomogeneous Dirichlet Problem for a Singularly Perturbed Homogeneous Convection–Diffusion Equation.
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- Computational Mathematics & Mathematical Physics, 2019, v. 59, n. 2, p. 253, doi. 10.1134/S0965542519020039
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Hölder Estimates for the Regular Component of the Solution to a Singularly Perturbed Convection-Diffusion Equation.
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- Computational Mathematics & Mathematical Physics, 2017, v. 57, n. 12, p. 1935, doi. 10.1134/S0965542517120053
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Plasmaenhanced chemical vapor deposition of 99.95 28Si in form of nano and polycrystals using silicon tetrafluoride precursor.
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- Crystal Research & Technology, 2010, v. 45, n. 9, p. 983
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PECVD growth of crystalline silicon from its tetrafluoride.
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- Crystal Research & Technology, 2010, v. 45, n. 9, p. 899, doi. 10.1002/crat.201000090
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Synthesis and Characteristics of Double Np(VI) Potassium and Pu(VI) Potassium Silicates K[(NpO<sub>2</sub>)(SiO<sub>3</sub>OH)]·H<sub>2</sub>O and K[(PuO<sub>2</sub>)(SiO<sub>3</sub>OH)]·H<sub>2</sub>O.
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- Radiochemistry, 2003, v. 45, n. 5, p. 488, doi. 10.1023/A:1026264026512
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Tetramethylammonium Neptunium(IV) Isothiocyanate [N(CH<sub>3</sub>)<sub>4</sub>]<sub>4</sub>[Np(NCS)<sub>8</sub>].
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- Radiochemistry, 2003, v. 45, n. 4, p. 335, doi. 10.1023/A:1026145117038
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Features of Formation of In<sub>x</sub>Ga<sub>1 –</sub><sub>x</sub>N Bulk Layers in the Immiscibility Gap of Solid Solutions (x ~ 0.6) by Molecular Beam Epitaxy with Plasma Nitrogen Activation.
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- Semiconductors, 2024, v. 58, n. 3, p. 231, doi. 10.1134/S1063782624030072
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Radiative Properties of Up-Conversion Coatings Formed on the Basis of Erbium-Doped Barium Titanate Xerogels.
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- Semiconductors, 2021, v. 55, n. 9, p. 735, doi. 10.1134/S1063782621090062
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Ge/Si Core/Shell Quantum Dots in an Alumina Matrix: Influence of the Annealing Temperature on the Optical Properties.
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- Semiconductors, 2020, v. 54, n. 2, p. 181, doi. 10.1134/S1063782620020207
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Emission Properties of Heavily Doped Epitaxial Indium-Nitride Layers.
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- Semiconductors, 2019, v. 53, n. 10, p. 1357, doi. 10.1134/S1063782619100038
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Comparative Analysis of the Luminescence of Ge:Sb Layers Grown on Ge(001) and Si(001) Substrates.
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- Semiconductors, 2019, v. 53, n. 10, p. 1318, doi. 10.1134/S1063782619100154
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Specific features of the photoexcitation spectra of epitaxial InN layers grown by molecular-beam epitaxy with the plasma activation of nitrogen.
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- Semiconductors, 2017, v. 51, n. 12, p. 1537, doi. 10.1134/S1063782617120041
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Features of InN growth by nitrogen-plasma-assisted MBE at different ratios of fluxes of group-III and -V elements.
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- Semiconductors, 2016, v. 50, n. 2, p. 261, doi. 10.1134/S1063782616020159
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Effect of the annealing temperature on the low-temperature photoluminescence in Si:Er light-emitting structures grown by molecular-beam epitaxy.
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- Semiconductors, 2013, v. 47, n. 10, p. 1333, doi. 10.1134/S1063782613100035
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Mechanism of the subband excitation of photoluminescence from erbium ions in silicon under high-intensity optical pumping.
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- Semiconductors, 2012, v. 46, n. 11, p. 1407, doi. 10.1134/S1063782612110231
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Determination of the excitation cross section of photoluminescence from an Er ion in the case of homogeneous and inhomogeneous optical excitation.
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- Semiconductors, 2012, v. 46, n. 11, p. 1372, doi. 10.1134/S1063782612110036
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Electroluminescence at a wavelength of 1.54 μm in Si:Er/Si structures consisting of a number of p-n junctions.
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- Semiconductors, 2011, v. 45, n. 11, p. 1430, doi. 10.1134/S1063782611110169
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Dependence of the concentration of ionized donors on epitaxy temperature for Si:Er/Si layers grown by sublimation molecular-beam epitaxy.
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- Semiconductors, 2011, v. 45, n. 1, p. 130, doi. 10.1134/S1063782611010143
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Electroluminescence at a wavelength of 1.5 μm in Si:Er/Si diode structures doped with Al, Ga, and B acceptors.
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- Semiconductors, 2010, v. 44, n. 12, p. 1597, doi. 10.1134/S1063782610120110
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Specific features of the mechanisms of excitation of erbium photoluminescence in epitaxial Si:Er/Si structures.
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- Semiconductors, 2010, v. 44, n. 11, p. 1472, doi. 10.1134/S1063782610110187
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GaAsSb/GaAs strained structures with quantum wells for lasers with emission wavelength near 1.3 μm.
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- Semiconductors, 2010, v. 44, n. 3, p. 405, doi. 10.1134/S1063782610030231
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Fabrication of nanocrystalline silicon layers by plasma enhanced chemical vapor deposition from silicon tetrafluoride.
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- Semiconductors, 2009, v. 43, n. 7, p. 968, doi. 10.1134/S1063782609070288
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Electrical properties of Si:Er/Si layers grown by sublimation molecular-beam epitaxy.
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- Semiconductors, 2008, v. 42, n. 2, p. 137, doi. 10.1134/S1063782608020036
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- Article
Erbium ion electroluminescence in p <sup>++</sup>/ n <sup>+</sup>/ n-Si:Er/ n <sup>++</sup> silicon diode structures.
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- Semiconductors, 2007, v. 41, n. 11, p. 1312, doi. 10.1134/S1063782607110073
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Light-Emitting Si:Er Structures Produced by Molecular-Beam Epitaxy: High-Resolution Photoluminescence Spectroscopy.
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- Semiconductors, 2005, v. 39, n. 12, p. 1399, doi. 10.1134/1.2140312
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Spectroscopic Parameters of the Absorption Bands Related to the Local Vibrational Modes of Carbon and Oxygen Impurities in Silicon Enriched with <sup>28</sup>Si, <sup>29</sup>Si, and <sup>30</sup>Si Isotopes.
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- Semiconductors, 2005, v. 39, n. 3, p. 300, doi. 10.1134/1.1882791
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Photoluminescence at 1.5 μm from Single-Crystal Silicon Layers Subjected to Mechanical Treatment.
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- Semiconductors, 2003, v. 37, n. 12, p. 1380, doi. 10.1134/1.1634657
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Radioluminography measurement of tritium distribution.
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- Atomic Energy, 2008, v. 104, n. 3, p. 218, doi. 10.1007/s10512-008-9019-8
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Demercaptanization of Light Hydrocarbon Fractions with Strong Aqueous Ammonia without Producing Sulfur Caustic Wastewater.
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- Theoretical Foundations of Chemical Engineering, 2020, v. 54, n. 5, p. 1078, doi. 10.1134/S004057952005005X
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Treatment of Sulfide Alkali Waste Waters from Mercaptans Using Distillation.
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- Theoretical Foundations of Chemical Engineering, 2018, v. 52, n. 4, p. 673, doi. 10.1134/S0040579518040024
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Superconvergence Postprocessing for Eigenvalues.
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- Computational Methods in Applied Mathematics, 2002, v. 2, n. 2, p. 171, doi. 10.2478/cmam-2002-0011
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Superconvergence of the gradient for quadratic triangular finite elements.
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- Numerical Methods for Partial Differential Equations, 1988, v. 4, n. 1, p. 15, doi. 10.1002/num.1690040103
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An optimal order numerical quadrature approximation of a planar isoparametric eigenvalue problem on triangular finite element meshes.
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- Calcolo, 2005, v. 42, n. 2, p. 47, doi. 10.1007/s10092-005-0097-x
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On Nonergodicity of Some Continuous-Time Markov Chains.
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- Journal of Mathematical Sciences, 2004, v. 122, n. 4, p. 3332, doi. 10.1023/B:JOTH.0000031878.03206.fc
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On the accuracy of grid approximations to nonsmooth solutions of a singularly perturbed reaction-diffusion equation in the square.
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- Differential Equations, 2006, v. 42, n. 7, p. 954, doi. 10.1134/S0012266106070044
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On the Theory of Difference Schemes for Singularly Perturbed Equations.
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- Differential Equations, 2004, v. 40, n. 7, p. 959, doi. 10.1023/B:DIEQ.0000047027.16299.38
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Isoparametric finite‐element approximation of a Steklov eigenvalue problem.
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- IMA Journal of Numerical Analysis, 2004, v. 24, n. 2, p. 309, doi. 10.1093/imanum/24.2.309
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- Article
Doping of Silicon Layers from a Sublimating Erbium Source in Molecular Beam Epitaxy.
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- Technical Physics Letters, 2000, v. 26, n. 1, p. 41, doi. 10.1134/1.1262734
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- Article
Luminescent Si–Ge Solid Solution Layers Er-Doped in Molecular-Beam Epitaxy.
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- Semiconductors, 2002, v. 36, n. 6, p. 625, doi. 10.1134/1.1485659
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Electrically Active Centers in Si:Er Light-Emitting Layers Grown by Sublimation Molecular-Beam Epitaxy.
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- Semiconductors, 2002, v. 36, n. 2, p. 171, doi. 10.1134/1.1453432
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- Article
Simultaneous Doping of Silicon Layers with Erbium and Oxygen in the Course of Molecular-Beam Epitaxy.
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- Semiconductors, 2001, v. 35, n. 8, p. 918, doi. 10.1134/1.1393027
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- Article
Shallow Acceptors in Strained Ge/Ge[sub 1 – ][sub x]Si[sub x] Heterostructures with Quantum Wells.
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- Semiconductors, 2000, v. 34, n. 5, p. 563, doi. 10.1134/1.1188029
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- Article
Low-temperature photoluminescence in holmium-doped silicon.
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- Semiconductors, 1999, v. 33, n. 4, p. 407, doi. 10.1134/1.1187703
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Optically active layers of silicon doped with erbium during sublimation molecular-beam epitaxy.
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- Semiconductors, 1999, v. 33, n. 2, p. 131, doi. 10.1134/1.1187658
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Isotope-modified silicon layers obtained by plasma enhanced chemical vapor deposition from gaseous silicon tetrafluoride.
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- Technical Physics Letters, 2009, v. 35, n. 10, p. 948, doi. 10.1134/S1063785009100216
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- Article