Works matching IS 10637826 AND DT 2010 AND VI 44 AND IP 4
Results: 23
The sharply nonlinear current-voltage characteristic of a structure with a quantum well built in the depletion region of a Schottky Barrier.
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- Semiconductors, 2010, v. 44, n. 4, p. 478, doi. 10.1134/S1063782610040123
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Exciton binding energy in semiconductor quantum dots.
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- Semiconductors, 2010, v. 44, n. 4, p. 488, doi. 10.1134/S1063782610040147
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Optical absorption and diffusion of iron in ZnSe single crystals.
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- Semiconductors, 2010, v. 44, n. 4, p. 444, doi. 10.1134/S1063782610040068
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The effect of Fe, Cu, and Si impurities on the formation of emission spectra in bulk ZnO crystals.
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- Semiconductors, 2010, v. 44, n. 4, p. 426, doi. 10.1134/S1063782610040032
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Radiation damage of contact structures with diffusion barriers exposed to irradiation with <sup>60</sup>Coγ-ray photons.
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- Semiconductors, 2010, v. 44, n. 4, p. 448, doi. 10.1134/S106378261004007X
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Ordered arrays of Si nanocrystals in SiO<sub>2</sub>: Structural, optical, and electronic properties.
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- Semiconductors, 2010, v. 44, n. 4, p. 482, doi. 10.1134/S1063782610040135
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Light-emitting Si nanostructures formed in SiO<sub>2</sub> on irradiation with swift heavy ions.
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- Semiconductors, 2010, v. 44, n. 4, p. 525, doi. 10.1134/S1063782610040202
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Numerical simulation of hydrogenation of GaAs at the cooling stage.
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- Semiconductors, 2010, v. 44, n. 4, p. 413, doi. 10.1134/S1063782610040019
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Influence of the energy parameters of the deposited laser-induced flow of platinum atoms on characteristics of a Pt/ n-6 H-SiC thin-film structure.
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- Semiconductors, 2010, v. 44, n. 4, p. 537, doi. 10.1134/S1063782610040226
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Features of self-activated luminescence spectra of CdS:O in the context of band anticrossing theory.
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- Semiconductors, 2010, v. 44, n. 4, p. 438, doi. 10.1134/S1063782610040056
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X-ray and infrared spectroscopy of layers produced by cosputtering of spatially separated SiO<sub>2</sub> and Si sources.
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- Semiconductors, 2010, v. 44, n. 4, p. 531, doi. 10.1134/S1063782610040214
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Current flow mechanism in ohmic contact to n-4 H-SiC.
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- Semiconductors, 2010, v. 44, n. 4, p. 463, doi. 10.1134/S1063782610040093
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Specific features of erbium ion photoluminescence in structures with amorphous and crystalline silicon nanoclusters in silica matrix.
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- Semiconductors, 2010, v. 44, n. 4, p. 467, doi. 10.1134/S106378261004010X
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Characteristics of surface states at the insulator-semiconductor interface in the thin-film electroluminescent structures based on ZnS:Mn.
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- Semiconductors, 2010, v. 44, n. 4, p. 498, doi. 10.1134/S1063782610040160
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Effect of low-temperature annealing on photoluminescence of silicon nanocluster structures.
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- Semiconductors, 2010, v. 44, n. 4, p. 514, doi. 10.1134/S1063782610040184
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Deposition of thin Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> films by pulsed laser ablation.
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- Semiconductors, 2010, v. 44, n. 4, p. 544, doi. 10.1134/S1063782610040238
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Study of the transition of the epitaxial Ge film from layer-to-layer to three-dimensional growth in heterostructures with strained SiGe sublayers.
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- Semiconductors, 2010, v. 44, n. 4, p. 519, doi. 10.1134/S1063782610040196
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Stimulated radiation at a wavelength of 2.5 μm at room temperature from optically excited Cd<sub> x</sub>Hg<sub>1 − x</sub>Te-based structures.
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- Semiconductors, 2010, v. 44, n. 4, p. 457, doi. 10.1134/S1063782610040081
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1.5–1.6 μm photoluminescence of silicon layers with a high density of lattice defects.
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- Semiconductors, 2010, v. 44, n. 4, p. 432, doi. 10.1134/S1063782610040044
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Photoconductivity of two-phase hydrogenated silicon films.
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- Semiconductors, 2010, v. 44, n. 4, p. 494, doi. 10.1134/S1063782610040159
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Physical model of MOS structure aging.
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- Semiconductors, 2010, v. 44, n. 4, p. 508, doi. 10.1134/S1063782610040172
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Mixed conduction in doped semiconductor structures related to quasi-metallic conduction in the impurity band.
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- Semiconductors, 2010, v. 44, n. 4, p. 472, doi. 10.1134/S1063782610040111
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Influence of the defect structure of γ-La<sub>2(1 − x)</sub>Nd<sub>2 x</sub>S<sub>3</sub> crystals on their spectroscopic properties.
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- Semiconductors, 2010, v. 44, n. 4, p. 421, doi. 10.1134/S1063782610040020
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