Nonmonotonic variations in the concentration of the donor-and acceptor-type radiation defects in silicon irradiated with low-intensity fluxes of β particles.
Deep-level transient spectroscopy is used to study the dependence of the concentration of the donor-and acceptor-type radiation defects in silicon on the duration of irradiation with low-intensity fluxes of β particles ( I ≈ 9 × 105 cm−2 s−1). It is found that the concentrations of the defects C i , C i -C s , and/or V-O in n-Si and the defects V-B, C i -O i , and/or V 2-O-C in p-Si vary nonmonotonically.