Optical characteristics of nickel and boron carbonitride films in Si(100)/Ni/BCN structures.

Ayupov, B.; Prokhorova, S.; Kosinova, M.; Rumyantsev, Yu.

The optical characteristics of nickel films deposited on Si(100) substrates by vacuum thermal evaporation have been studied. The thickness and optical constants of the films are determined using monochromatic zero ellipsometry, while the inverse problems are solved within the three-layer optical model of the samples. It is shown that thermal annealing leads to a change in the optical constants of nickel films in the heating-temperature range of 500-900°C. Boron carbonitride layers deposited on silicon substrates with a nickel sublayer are analyzed within multilayer optical models, which make it possible to determine the refractive index and absorption coefficient distributions along the thickness of the synthesized Si(100)/Ni/BCN structure.

OPTICAL properties of metals; NICKEL; BORON compounds; THIN films; SILICON; MOLECULAR structure; EVAPORATION (Chemistry); ELLIPSOMETRY; HIGH temperatures; REFRACTIVE index

Optics & Spectroscopy, 2012, Vol 112, Issue 2, p201

0030-400X

Academic Journal

10.1134/S0030400X1202004X