Works matching DE "ULTRAVIOLET lithography"

Results: 59

基于液晶的太赫兹可调谐超材料吸波体.

Published in:

Electronic Science & Technology, 2022, v. 35, n. 6, p. 43, doi. 10.16180/j.cnki.issn1007-7820.2022.06.007

By:

史添;
徐俊杰;
孙双元;
殷明君;
杨军;
尹治平

Publication type:

Article

An Ultrabroadband and Cost-Effective Edge Coupler for Efficient Thin Film Lithium Niobate Photonics.

Published in:

Photonics, 2023, v. 10, n. 7, p. 760, doi. 10.3390/photonics10070760

By:

Chen, Houhong;
Ma, Fei;
Chen, Ke;
Dong, Jianwen

Publication type:

Article

Study of accelerated degradation of pigmented UV-cured print inks.

Published in:

Journal of Graphic Engineering & Design (JGED), 2013, v. 4, n. 2, p. 21, doi. 10.24867/jged-2013-2-021

By:

Gonçalves Bardi, Marcelo Augusto;
Machado, Luci Diva Brocardo

Publication type:

Article

Definition of Quality Criteria of the Technological Process of Narrow Web UV-Printing.

Published in:

Journal of Graphic Engineering & Design (JGED), 2013, v. 4, n. 2, p. 7, doi. 10.24867/jged-2013-2-007

By:

Gurgal, Natalia;
Repeta, Vyacheslav;
Senkivsky, Vsevolod;
Shybanov, Volodymyr

Publication type:

Article

Untitled.

Published in:

Journal of Graphic Engineering & Design (JGED), 2013, v. 4, n. 2, p. 5

By:

Novaković, Dragoljub

Publication type:

Article

Flexible Bistable Smectic-A Liquid Crystal Device Using Photolithography and Photoinduced Phase Separation.

Published in:

Advances in Condensed Matter Physics, 2012, p. 1, doi. 10.1155/2012/843264

By:

Yang Lu;
Jinbao Guo;
Hao Wang;
Jie Wei

Publication type:

Article

Experimental investigation of electroplated CBN wheel with phyllotactic pattern part I: cylindrical-face grinding performance.

Published in:

International Journal of Advanced Manufacturing Technology, 2021, v. 117, n. 11/12, p. 3681, doi. 10.1007/s00170-021-07927-1

By:

Liu, Yueming;
Gao, Guimin;
Lyu, Yushan;
Li, Xingshan

Publication type:

Article

The effect of curvature on chondrocytes migration and bone mesenchymal stem cells differentiation.

Published in:

Journal of Applied Polymer Science, 2021, v. 138, n. 19, p. 1, doi. 10.1002/app.50392

By:

Cao, Xing;
Liu, Xiangli;
Liu, Yan;
Ma, Rui;
Sun, Shichang

Publication type:

Article

Deconstructing the Effects of Matrix Elasticity and Geometry in Mesenchymal Stem Cell Lineage Commitment.

Published in:

Advanced Functional Materials, 2014, v. 24, n. 16, p. 2396, doi. 10.1002/adfm.201303400

By:

Harris, Greg M.;
Piroli, Maria E.;
Jabbarzadeh, Ehsan

Publication type:

Article

Surface roughness and geometrical characterization of ultra-thick micro moulds for ceramic micro fabrication using soft lithography.

Published in:

International Journal of Advanced Manufacturing Technology, 2013, v. 67, n. 9-12, p. 2293, doi. 10.1007/s00170-012-4650-x

By:

Hassanin, H.;
Ostadi, H.;
Jiang, K.

Publication type:

Article

Fabrication of 3D metal micro-mold based on femtosecond laser cutting and micro-electric resistance slip welding.

Published in:

International Journal of Advanced Manufacturing Technology, 2013, v. 66, n. 5-8, p. 601, doi. 10.1007/s00170-012-4351-5

By:

Xu, Bin;
Wu, Xiao-yu;
Ling, Shi-quan;
Luo, Feng;
Du, Chen-lin;
Sun, Xiu-quan

Publication type:

Article

Design and experimental verification of all waveguide type triplexers using cascaded MMI couplers.

Published in:

Optical & Quantum Electronics, 2015, v. 47, n. 5, p. 1151, doi. 10.1007/s11082-014-9971-6

By:

Zhang, Lei;
Chen, Pengxin;
Shi, Yaocheng

Publication type:

Article

Single etch grating couplers for mass fabrication with DUV lithography.

Published in:

Optical & Quantum Electronics, 2012, v. 44, n. 12/13, p. 521, doi. 10.1007/s11082-012-9563-2

By:

Halir, R.;
Zavargo-Peche, L.;
Xu, D.-X.;
Cheben, P.;
Ma, R.;
Schmid, J.;
Janz, S.;
Densmore, A.;
Ortega-Moñux, A.;
Molina-Fernández, Í.;
Fournier, M.;
Fédeli, J.-M.

Publication type:

Article

High-Q photonic crystal cavities realised using deep ultraviolet lithography.

Published in:

Electronics Letters (Wiley-Blackwell), 2015, v. 51, n. 16, p. 1277, doi. 10.1049/el.2015.1120

By:

Welna, K.;
Debnath, K.;
Krauss, T. F.;
O'Faolain, L.

Publication type:

Article

interview.

Published in:

2014

By:

Yongmeng Liu

Publication type:

Interview

Advancements in the Preparation and Application of Ni-Co System (Alloys, Composites, and Coatings): A Review.

Published in:

2025

By:

Lai, Liyan;
Qian, Feng;
Bi, Yuxiao;
Niu, Bing;
Yu, Guanliang;
Li, Yigui;
Ding, Guifu

Publication type:

Literature Review

Large-Scale Moth-Eye-Structured Roll Mold Fabrication Using Sputtered Glassy Carbon Layer and Transferred Moth-Eye Film Characterization.

Published in:

Nanomaterials (2079-4991), 2023, v. 13, n. 10, p. 1591, doi. 10.3390/nano13101591

By:

Kato, Kazuhiro;
Sugawara, Hiroyuki;
Taniguchi, Jun

Publication type:

Article

Molecular Dynamics Study on Behavior of Resist Molecules in UV-Nanoimprint Lithography Filling Process.

Published in:

Nanomaterials (2079-4991), 2022, v. 12, n. 15, p. 2554, doi. 10.3390/nano12152554

By:

Iwata, Jun;
Ando, Tadashi

Publication type:

Article

Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin.

Published in:

Nanomaterials (2079-4991), 2020, v. 10, n. 10, p. 1956, doi. 10.3390/nano10101956

By:

Marumo, Tetsuma;
Hiwasa, Shin;
Taniguchi, Jun

Publication type:

Article

Design and Fabrication of Wafer-Level Microlens Array with Moth-Eye Antireflective Nanostructures.

Published in:

Nanomaterials (2079-4991), 2019, v. 9, n. 5, p. 747, doi. 10.3390/nano9050747

By:

Xie, Shuping;
Wan, Xinjun;
Yang, Bo;
Zhang, Wei;
Wei, Xiaoxiao;
Zhuang, Songlin

Publication type:

Article

Tin, The Enabler—Hydrogen Diffusion into Ruthenium.

Published in:

Nanomaterials (2079-4991), 2019, v. 9, n. 1, p. 129, doi. 10.3390/nano9010129

By:

Onwudinanti, Chidozie;
Tranca, Ionuţ;
Morgan, Thomas;
Tao, Shuxia

Publication type:

Article

A NOVEL FABRICATION METHOD OF TWO-DIMENSIONAL NANO-MOLD BY COMBINING ULTRAVIOLET LITHOGRAPHY WITH WET ETCHING TECHNOLOGY.

Published in:

Surface Review & Letters, 2021, v. 28, n. 1, p. N.PAG, doi. 10.1142/S0218625X20500286

By:

CHENG, E;
TANG, SUZHOU;
LIU, LINGPENG;
ZOU, HELIN;
ZHANG, ZHENGYAN

Publication type:

Article

High-Aspect-Ratio Shape Replica Mold Fabrication Using Nanoimprinting and Silver Ink as Etching Mask.

Published in:

Nanomanufacturing, 2025, v. 5, n. 1, p. 2, doi. 10.3390/nanomanufacturing5010002

By:

Enomoto, Keisuke;
Taniguchi, Jun

Publication type:

Article

Fracture in Microscale SU-8 Polymer Thin Films.

Published in:

Experimental Mechanics, 2017, v. 57, n. 5, p. 687, doi. 10.1007/s11340-017-0262-6

By:

Das, A.;
Sinha, A.;
Rao, V.R.;
Jonnalagadda, K.N.

Publication type:

Article

Large-Scale β -Ga 2 O 3 Trench MOS-Type Schottky Barrier Diodes with 1.02 Ideality Factor and 0.72 V Turn-On Voltage.

Published in:

Electronics (2079-9292), 2023, v. 12, n. 20, p. 4315, doi. 10.3390/electronics12204315

By:

He, Hao;
Zhou, Xinlong;
Liu, Yinchi;
Liu, Wenjing;
Yang, Jining;
Zhang, Hao;
Xie, Genran;
Liu, Wenjun

Publication type:

Article

Numerical Investigation for the Resin Filling Behavior during Ultraviolet Nanoimprint Lithography of Subwavelength Moth-Eye Nanostructure.

Published in:

Coatings (2079-6412), 2021, v. 11, n. 7, p. 799, doi. 10.3390/coatings11070799

By:

Cui, Yuanchi;
Wang, Xuewen;
Zhang, Chengpeng;
Wang, Jilai;
Shi, Zhenyu

Publication type:

Article

Numerical Study on the Optimization of Roll-to-Roll Ultraviolet Imprint Lithography.

Published in:

Coatings (2079-6412), 2019, v. 9, n. 9, p. 573, doi. 10.3390/coatings9090573

By:

Tahir, Usama;
Kamran, Muhammad Ahmad;
Jeong, Myung Yung

Publication type:

Article

Error Analysis of 3D Metal Micromold Fabricated by Femtosecond Laser Cutting and Microelectric Resistance Slip Welding.

Published in:

Advances in Mechanical Engineering (Sage Publications Inc.), 2013, v. 5, p. 1, doi. 10.1155/2013/464769

By:

Bin Xu;
Xiao-Yu Wu;
Jian-Guo Lei;
Feng Luo;
Feng Gong;
Chen-Lin Du;
Xiu-Quan Sun;
Shuang-Chen Ruan

Publication type:

Article

Transparent Electric Heaters Based on Photoresist‐Derived Carbon Micropatterns on Quartz Plates.

Published in:

Macromolecular Materials & Engineering, 2018, v. 303, n. 12, p. N.PAG, doi. 10.1002/mame.201800296

By:

Lee, Byoung‐Min;
Nam, Hui‐Gyun;
Choi, Hyeong Yeol;
Hong, Sung‐Kwon;
Jeong, Young Gyu;
Choi, Jae‐Hak

Publication type:

Article

Development and Characterization of Two-Dimensional Gratings for Single-Shot X-ray Phase-Contrast Imaging.

Published in:

Applied Sciences (2076-3417), 2018, v. 8, n. 3, p. 468, doi. 10.3390/app8030468

By:

Zakharova, Margarita;
Vlnieska, Vitor;
Fornasier, Heike;
Börner, Martin;
dos Santos Rolo, Tomy;
Mohr, Jürgen;
Kunka, Danays

Publication type:

Article

Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography.

Published in:

Nano-Micro Letters, 2025, v. 17, n. 1, p. 1, doi. 10.1007/s40820-025-01737-w

By:

Li, Junlong;
Guo, Yanmin;
Wang, Kun;
Huang, Wei;
Su, Hao;
Li, Wenhao;
Zhou, Xiongtu;
Zhang, Yongai;
Guo, Tailiang;
Wu, Chaoxing

Publication type:

Article

Manufacture of Binary Nanofeatured Polymeric Films Using Nanosphere Lithography and Ultraviolet Roller Imprinting.

Published in:

Materials (1996-1944), 2021, v. 14, n. 7, p. 1669, doi. 10.3390/ma14071669

By:

Lee, Demei;
Hsu, Ming-Yi;
Tang, Ya-Ling;
Liu, Shih-Jung;
Sorrentino, Andrea

Publication type:

Article

Quantitative analysis of trace levels of surface contamination by X-ray photoelectron spectroscopy. Part II: Systematic uncertainties and absolute quantification.

Published in:

Surface & Interface Analysis: SIA, 2017, v. 49, n. 12, p. 1214, doi. 10.1002/sia.6289

By:

Faradzhev, Nadir S.;
Hill, Shannon B.;
Powell, Cedric J.

Publication type:

Article

Characterization and reduction of pellicle degradation due to haze formation on leading edge technology photomasks.

Published in:

Surface & Interface Analysis: SIA, 2017, v. 49, n. 10, p. 985, doi. 10.1002/sia.6258

By:

Penley, C.;
Bekka, S.

Publication type:

Article

Single mode semiconductor laser based on coupled cavities of an active ring laser and Fabry Perot.

Published in:

IET Optoelectronics (Wiley-Blackwell), 2018, v. 12, n. 3, p. 118, doi. 10.1049/iet-opt.2017.0062

By:

Dernaika, Mohamad;
Kelly, Niall P.;
Caro, Ludovic;
Peters, Frank H.

Publication type:

Article

Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review.

Published in:

Micromachines, 2024, v. 15, n. 11, p. 1321, doi. 10.3390/mi15111321

By:

Khonina, Svetlana N.;
Kazanskiy, Nikolay L.;
Butt, Muhammad A.

Publication type:

Article

Comprehensive Simulations for Ultraviolet Lithography Process of Thick SU-8 Photoresist.

Published in:

Micromachines, 2018, v. 9, n. 7, p. 341, doi. 10.3390/mi9070341

By:

Zhou, Zai-Fa;
Huang, Qing-An

Publication type:

Article

Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios.

Published in:

Micromachines, 2018, v. 9, n. 7, p. 335, doi. 10.3390/mi9070335

By:

Yin, Minqi;
Sun, Hongwen;
Wang, Haibin

Publication type:

Article

Recent Advances in Positive Photoresists: Mechanisms and Fabrication.

Published in:

Materials (1996-1944), 2024, v. 17, n. 11, p. 2552, doi. 10.3390/ma17112552

By:

Hassaan, Muhammad;
Saleem, Umama;
Singh, Akash;
Haque, Abrar Jawad;
Wang, Kaiying

Publication type:

Article

Fabrication of Rose Petal Surface Using Release-Coated UV-Curable Resin via Ultraviolet Nanoimprint Lithography.

Published in:

International Journal of Automation Technology, 2024, v. 18, n. 4, p. 521, doi. 10.20965/ijat.2024.p0521

By:

Wakasa, Takuto;
Fujiwara, Kazuki;
Taniguchi, Jun

Publication type:

Article

Thickness-dependent Magnetic and Microwave Resonance Characterization of Combined Stripe Patterned FeCoBSi Films.

Published in:

Nanoscale Research Letters, 2018, v. 13, n. 1, p. 1, doi. 10.1186/s11671-018-2506-5

By:

Zhang, Li;
Liu, Yaoming;
Zheng, Hanyu;
Zhu, Wenbin;
Zhang, Min;
Zhang, Linbo;
Zhou, Peiheng;
Chen, Haiyan;
Wang, Xin;
Lu, Haipeng;
Xie, Jianliang;
Deng, Longjiang

Publication type:

Article

Detailed analysis of the UV-adjustment techniques used in paper and graphic industries.

Published in:

Color Research & Application, 2017, v. 42, n. 1, p. 19, doi. 10.1002/col.22015

By:

Yang, Li

Publication type:

Article

(TMT)<sub>n</sub> clusters as dilute debris‐free tin source for generation of multiply charged tin ions of relevance in extreme ultraviolet (EUV) lithography, under intense laser irradiation.

Published in:

Rapid Communications in Mass Spectrometry: RCM, 2018, v. 32, n. 14, p. 1135, doi. 10.1002/rcm.8152

By:

Sharma, Pramod;
Das, Soumitra;
Vatsa, Rajesh K.

Publication type:

Article

A Micro Pattern of Fine Scale PZT Ceramic Structures for the Energy Harvester.

Published in:

Integrated Ferroelectrics, 2013, v. 140, n. 1, p. 84, doi. 10.1080/10584587.2012.741461

By:

Shin, Dong-Jin;
Koh, Jung-Hyuk

Publication type:

Article

Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems.

Published in:

Polymers (20734360), 2024, v. 16, n. 6, p. 846, doi. 10.3390/polym16060846

By:

Wen, Zaoxia;
Liu, Xingyu;
Chen, Wenxiu;
Zhou, Ruolin;
Wu, Hao;
Xia, Yongmei;
Wu, Lianbin

Publication type:

Article

High-Durability Photothermal Slippery Surfaces for Droplet Manipulation Based on Ultraviolet Lithography.

Published in:

Polymers (20734360), 2023, v. 15, n. 5, p. 1132, doi. 10.3390/polym15051132

By:

Wen, Tong;
Zhang, Chen;
Gong, Yanyan;
Liu, Zezhi;
Zhao, Wei;
Zhan, Yongjie;
Zhang, Ce;
Wang, Kaige;
Bai, Jintao

Publication type:

Article

Fast Fabrication of Nanostructured Films Using Nanocolloid Lithography and UV Soft Mold Roller Embossing: Effects of Processing Parameters.

Published in:

Polymers (20734360), 2021, v. 13, n. 3, p. 405, doi. 10.3390/polym13030405

By:

Lee, Demei;
Tang, Ya-Ling;
Liu, Shih-Jung

Publication type:

Article

Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography.

Published in:

Polymers (20734360), 2020, v. 12, n. 10, p. 2359, doi. 10.3390/polym12102359

By:

Vlnieska, Vitor;
Zakharova, Margarita;
Mikhaylov, Andrey;
Kunka, Danays

Publication type:

Article

Pattern Roughness Mitigation of 22nm Lines and Spaces: The Impact of a H<sub>2</sub> Plasma Treatment.

Published in:

Plasma Processes & Polymers, 2015, v. 12, n. 2, p. 153, doi. 10.1002/ppap.201400078

By:

De Schepper, Peter;
Vaglio Pret, Alessandro;
el Otell, Ziad;
Hansen, Terje;
Altamirano‐Sanchez, Efrain;
De Gendt, Stefan

Publication type:

Article

Multilayer Reconfigurable 3D Photonics Integrated Circuits Based on Deposition Method.

Published in:

Laser & Photonics Reviews, 2025, v. 19, n. 2, p. 1, doi. 10.1002/lpor.202400827

By:

Xu, Xinru;
Zhang, Daming;
Zhang, Peng;
Tang, Bo;
Yin, Yuexin

Publication type:

Article