Works matching IS 0098-6445 AND VI 197 AND IP 5 AND DT 2010
1
- Chemical Engineering Communications, 2010, v. 197, n. 5, p. 633, doi. 10.1080/00986440903287742
- Abel, M.Subhas;
- Nandeppanavar, MahanteshM.;
- Malkhed, M. B.
- Article
2
- Chemical Engineering Communications, 2010, v. 197, n. 5, p. 656, doi. 10.1080/00986440903287775
- El-Sayed, M. F.;
- Moatimid, G. M.;
- Metwaly, T. M. N.
- Article
3
- Chemical Engineering Communications, 2010, v. 197, n. 5, p. 684, doi. 10.1080/00986440903287809
- Huo, Li;
- Liao, Fu-Hui;
- Li, Jun-Ran;
- Zhang, Shao-Hua;
- Zhang, Olivia;
- Xu, Ming-Yuan
- Article
4
- Chemical Engineering Communications, 2010, v. 197, n. 5, p. 692, doi. 10.1080/00986440903287882
- Rahimi, Amir;
- Niksiar, Arezou
- Article
5
- Chemical Engineering Communications, 2010, v. 197, n. 5, p. 709, doi. 10.1080/00986440903288039
- Pantoleontos, G.;
- Kaldis, S. P.;
- Koutsonikolas, D.;
- Skodras, G.;
- Sakellaropoulos, G. P.
- Article
6
- Chemical Engineering Communications, 2010, v. 197, n. 5, p. 733, doi. 10.1080/00986440903288096
- Bunin, GeneA.;
- Lima, FernandoV.;
- Georgakis, Christos;
- Hunt, ChristopherM.
- Article
7
- Chemical Engineering Communications, 2010, v. 197, n. 5, p. 753, doi. 10.1080/00986440903358915
- Wongsri, Montree;
- Siraworakun, Chaiyapop
- Article
8
- Chemical Engineering Communications, 2010, v. 197, n. 5, p. 775, doi. 10.1080/00986440903359004
- Royer, Betina;
- Lima, EderC.;
- Cardoso, NataliF.;
- Calvete, Tatiana;
- Bruns, RoyE.
- Article