Works matching DE "SILICON nitride films"
Results: 239
Advances in Flexible Optoelectronics Based on Chemical Vapor Deposition‐Grown Graphene (Adv. Funct. Mater. 42/2022).
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- Advanced Functional Materials, 2022, v. 32, n. 42, p. 1, doi. 10.1002/adfm.202270240
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Polarization‐Driven‐Orientation Selective Growth of Single‐Crystalline III‐Nitride Semiconductors on Arbitrary Substrates.
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- Advanced Functional Materials, 2022, v. 32, n. 14, p. 1, doi. 10.1002/adfm.202113211
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Structural Characteristics and Photocatalytic Activity of TiO<sub>2</sub>/Si<sub>3</sub>N<sub>4</sub> Nanocomposite Synthesized via Plasma Sputtering Technique.
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- Iraqi Journal of Physics, 2024, v. 22, n. 4, p. 99, doi. 10.30723/ijp.v22i4.1301
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Employment of Silicon Nitride Films Prepared by DC Reactive Sputtering Technique for Ion Release Applications.
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- Iraqi Journal of Physics, 2023, v. 21, n. 3, p. 33, doi. 10.30723/ijp.v21i3.1141
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Enhancement of Conformality of Silicon Nitride Thin Films by ABC‐Type Atomic Layer Deposition.
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- Advanced Electronic Materials, 2024, v. 10, n. 3, p. 1, doi. 10.1002/aelm.202300722
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Dependence of Mechanical and Tribological Properties of a-C:H:SiO<sub>x</sub> Films on the Bias Voltage Amplitude of the Substrate.
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- Technical Physics, 2022, v. 66, n. 4, p. 1111, doi. 10.1134/S1063784221080089
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Dependence of Mechanical and Tribological Properties of a-C:H:SiO<sub>x</sub> Films on the Bias Voltage Amplitude of the Substrate.
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- Technical Physics, 2021, v. 66, n. 10, p. 1111, doi. 10.1134/S1063784221080089
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A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition.
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- Technical Physics, 2021, v. 66, n. 5, p. 658, doi. 10.1134/S1063784221040174
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Resistive Switching Effect of the Structure Based on Silicon Nitride.
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- Technical Physics, 2021, v. 66, n. 1, p. 133, doi. 10.1134/S1063784221010126
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Experimental simulation of bending damage of silicon nitride yarn during 3D orthogonal fabric forming process.
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- Journal of Industrial Textiles, 2022, v. 51, p. 3811S, doi. 10.1177/15280837211010681
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(Allylamino)silanes: Synthesis, Properties, and Prospects of Use in Producing New Materials.
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- Russian Journal of General Chemistry, 2021, v. 91, n. 10, p. 1957, doi. 10.1134/S1070363221100054
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Structure related corrosion behavior of DLC films in high Cl<sup>−</sup> environment.
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- Corrosion Reviews, 2021, v. 39, n. 5, p. 465, doi. 10.1515/corrrev-2021-0004
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A heterogeneously integrated lithium niobate-on-silicon nitride photonic platform.
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- Nature Communications, 2023, v. 14, n. 1, p. 1, doi. 10.1038/s41467-023-39047-7
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Investigation on the Mist Intensity to Deposit Gallium Oxide Thin Films by Mist Chemical Vapor Deposition.
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- Physica Status Solidi - Rapid Research Letters, 2024, v. 18, n. 2, p. 1, doi. 10.1002/pssr.202300296
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Area‐Type Electronic Bipolar Resistive Switching of Pt/Al<sub>2</sub>O<sub>3</sub>/Si<sub>3</sub>N<sub>3.0</sub>/Ti with Forming‐Free, Self‐Rectification, and Nonlinear Characteristics.
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- Physica Status Solidi - Rapid Research Letters, 2020, v. 14, n. 8, p. 1, doi. 10.1002/pssr.202000209
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Transition Metals in a Cast‐Monocrystalline Silicon Ingot Studied by Silicon Nitride Gettering.
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- Physica Status Solidi - Rapid Research Letters, 2019, v. 13, n. 12, p. N.PAG, doi. 10.1002/pssr.201900456
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Deposition of Low Stress Silicon Nitride Thin Film and Its Application in Surface Micromachining Device Structures.
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- Advances in Materials Science & Engineering, 2013, p. 1, doi. 10.1155/2013/835942
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THERMAL ANNEALING OF MICRO-OXIDIZED ZINC NITRIDE SPUTTERED THIN FILMS FOR CONVERSION INTO CRYSTALLINE ZnO.
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- Surface Review & Letters, 2022, v. 29, n. 4, p. 1, doi. 10.1142/S0218625X2250055X
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The role of N<sub> x</sub>-Si-O<sub> y</sub> bonding configuration in acquiring strong blue to red photoluminescence from amorphous SiN<sub> x</sub>O<sub> y</sub> film<sup>1</sup>.
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- Canadian Journal of Physics, 2014, v. 92, n. 7/8, p. 602, doi. 10.1139/cjp-2013-0609
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The use of MACE technique on amorphous silicon-rich silicon nitride thin films for the formation of spherical silica nanoparticles.
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- Journal of Materials Science, 2019, v. 54, n. 23, p. 14296, doi. 10.1007/s10853-019-03937-3
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CW-diode laser crystallization of sputtered amorphous silicon on glass, SiN<sub>x</sub>, and SiO<sub>2</sub> intermediate layers.
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- Journal of Materials Science, 2013, v. 48, n. 12, p. 4177, doi. 10.1007/s10853-013-7230-z
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Detecting Chemical Shifts with Energy Dispersive Spectroscopy.
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- Microscopy & Microanalysis, 2024, v. 30, p. 1, doi. 10.1093/mam/ozae044.143
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Growing Cu<sub>2</sub>ZnSnS<sub>4</sub> Thin Film at Low Temperature Using a New Improved Configuration of Close‐Distance CVD Technique.
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- Crystal Research & Technology, 2023, v. 58, n. 6, p. 1, doi. 10.1002/crat.202300003
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Effects of Nitrogen Content on the Structural, Mechanical, and Corrosion Properties of ZrN Thin Films Grown on AISI 316L by Radiofrequency Magnetron Sputtering.
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- Crystal Research & Technology, 2021, v. 56, n. 12, p. 1, doi. 10.1002/crat.202100096
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Growth of SiC, AlN, and GaN Films on Silicon Parts of Arbitrary Geometry for Microelectromechanical Applications.
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- Technical Physics Letters, 2023, v. 49, p. S319, doi. 10.1134/S1063785023010182
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Vertical Ordering of Amorphous Ge Nanoclusters in Multilayer a-Ge/a-Si:H Heterostructures.
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- Technical Physics Letters, 2021, v. 47, n. 8, p. 609, doi. 10.1134/S1063785021060237
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Introduction of Nanoscale Si 3 N 4 to Improve the Dielectric Thermal Stability of a Si 3 N 4 /P(VDF-HFP) Composite Film.
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- Polymers (20734360), 2023, v. 15, n. 21, p. 4264, doi. 10.3390/polym15214264
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Enhanced Vapor Transmission Barrier Properties via Silicon-Incorporated Diamond-Like Carbon Coating.
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- Polymers (20734360), 2021, v. 13, n. 20, p. 3543, doi. 10.3390/polym13203543
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BUCKLING MORPHOLOGIES AND INTERFACIAL PROPERTIES OF SILICON NITRIDE FILMS DEPOSITED ON FLOAT GLASS SUBSTRATES.
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- Surface Review & Letters, 2015, v. 22, n. 4, p. -1, doi. 10.1142/S0218625X15500468
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Synthesis of Cobalt Molybdenum Nitrides From Precursors Precipitated at Different pH.
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- European Journal of Inorganic Chemistry, 2024, v. 27, n. 16, p. 1, doi. 10.1002/ejic.202400043
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Structural, morphological, and photoluminescence properties of nitrogen-doped CNTs and graphitic carbon nanostructures.
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- Journal of Materials Science, 2024, v. 59, n. 29, p. 13532, doi. 10.1007/s10853-024-09978-7
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Sputtered titanium nitride films as pseudocapacitive electrode for on chip micro-supercapacitors.
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- Journal of Materials Science, 2023, v. 58, n. 1, p. 337, doi. 10.1007/s10853-022-07417-z
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Structure and Phase Formation in Arc PVD Zr–B–Si–C–Ti–(N) Coatings.
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- Inorganic Materials, 2023, v. 59, n. 2, p. 157, doi. 10.1134/S0020168523020036
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Origin of visible photoluminescence of Si-rich and N-rich silicon nitride films.
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- Przegląd Elektrotechniczny, 2016, v. 92, n. 8, p. 184, doi. 10.15199/48.2016.08.50
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Spatially‐Modulated Silicon Interface Energetics Via Hydrogen Plasma‐Assisted Atomic Layer Deposition of Ultrathin Alumina.
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- Advanced Materials Interfaces, 2023, v. 10, n. 6, p. 1, doi. 10.1002/admi.202202166
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Laser‐Induced Reversible and Irreversible Surface Nanostructuring.
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- Advanced Materials Interfaces, 2021, v. 8, n. 7, p. 1, doi. 10.1002/admi.202001945
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In Situ Liquid Cell TEM Studies on Etching and Growth Mechanisms of Gold Nanoparticles at a Solid–Liquid–Gas Interface.
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- Advanced Materials Interfaces, 2019, v. 6, n. 20, p. N.PAG, doi. 10.1002/admi.201901027
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Structure and Electrical Conductivity of Thin AlN Films on Si.
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- Crystallography Reports, 2024, v. 69, n. 1, p. 65, doi. 10.1134/S1063774523601260
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Multiparametric Guided-Mode Resonance Biosensor Monitoring Bulk and Surface-Film Variations.
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- Chemosensors, 2022, v. 10, n. 12, p. 541, doi. 10.3390/chemosensors10120541
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Effect of Gas Flow Rate and Ratio on Structure and Properties of Nitrogen-Doped Diamond-like Carbon Films.
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- Applied Sciences (2076-3417), 2024, v. 14, n. 5, p. 2134, doi. 10.3390/app14052134
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Boron Carbonitride Films with Tunable Composition: LPCVD and PECVD Synthesis Using Trimethylamine Borane and Nitrogen Mixture and Characterization.
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- Applied Sciences (2076-3417), 2023, v. 13, n. 8, p. 4959, doi. 10.3390/app13084959
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Process Development of Low-Loss LPCVD Silicon Nitride Waveguides on 8-Inch Wafer.
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- Applied Sciences (2076-3417), 2023, v. 13, n. 6, p. 3660, doi. 10.3390/app13063660
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Simulation of electro-optic modulator based on optical waveguide formed byresidual thermal stress-induced on Bi<sub>4</sub>Ge<sub>3</sub>O<sub>12</sub> substrate by Si<sub>3</sub>N<sub>4</sub> thin film.
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- Journal of Microwaves, Optoelectronics & Electromagnetic Applications, 2013, v. 12, n. 1, p. Si18
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Downstream Electric Field Effects during Film Deposition with a Radio Frequency Plasma and Observations of Carbon Reduction.
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- Coatings (2079-6412), 2022, v. 12, n. 10, p. 1581, doi. 10.3390/coatings12101581
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Synthesis, Properties and Aging of ICP-CVD SiC x N y :H Films Formed from Tetramethyldisilazane.
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- Coatings (2079-6412), 2022, v. 12, n. 1, p. 80, doi. 10.3390/coatings12010080
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Hetero-Epitaxial Growth of AlN Deposited by DC Magnetron Sputtering on Si(111) Using a AlN Buffer Layer.
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- Coatings (2079-6412), 2021, v. 11, n. 9, p. 1063, doi. 10.3390/coatings11091063
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Optics of Inhomogeneous Thin Films with Defects: Application to Optical Characterization.
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- Coatings (2079-6412), 2021, v. 11, n. 1, p. 22, doi. 10.3390/coatings11010022
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Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects.
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- Coatings (2079-6412), 2019, v. 9, n. 7, p. 416, doi. 10.3390/coatings9070416
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Microfluidic Liquid Cell with Silicon Nitride Super-Thin Membrane for Electron Microscopy of Samples in Liquid.
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- Biosensors (2079-6374), 2022, v. 12, n. 12, p. 1138, doi. 10.3390/bios12121138
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Luminescence and Crystalline Properties of InGaN-based LED on Si Substrate with AlN/GaN Superlattice Structure.
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- Journal of Physical Science, 2021, v. 32, n. 3, p. 1, doi. 10.21315/jps2021.32.3.1
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