Works matching IS 09574522 AND DT 2012 AND VI 23 AND IP 8


Results: 25
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    Characterization deep boron diffused p silicon layer.

    Published in:
    Journal of Materials Science: Materials in Electronics, 2012, v. 23, n. 8, p. 1569, doi. 10.1007/s10854-012-0630-z
    By:
    • Dutta, Shankar;
    • Pandey, Akhilesh;
    • Saxena, G.;
    • Raman, R.;
    • Dhaul, A.;
    • Pal, Ramjay;
    • Chatterjee, Ratnamala
    Publication type:
    Article
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    Growth and characterization of lead selenide thin films.

    Published in:
    Journal of Materials Science: Materials in Electronics, 2012, v. 23, n. 8, p. 1562, doi. 10.1007/s10854-012-0629-5
    By:
    • Thanikaikarasan, Sethuramachandran;
    • Mahalingam, Thaiyan;
    • Dhanasekaran, V.;
    • Kathalingam, A.;
    • Rhee, Jin-Koo
    Publication type:
    Article
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