Works matching Etching
Results: 5000
Low-Damage and Self-Limiting (Al)GaN Etching Process through Atomic Layer Etching Using O 2 and BCl 3 Plasma.
- Published in:
- Coatings (2079-6412), 2021, v. 11, n. 3, p. 268, doi. 10.3390/coatings11030268
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- Article
Investigation into SiO 2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled.
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- Nanomaterials (2079-4991), 2022, v. 12, n. 24, p. 4457, doi. 10.3390/nano12244457
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- Article
Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching.
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- Plasma Chemistry & Plasma Processing, 2020, v. 40, n. 1, p. 423, doi. 10.1007/s11090-019-10025-6
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- Article
Atomic layer etching of SiO<sub>2</sub> with Ar and CHF <sub>3</sub> plasmas: A self‐limiting process for aspect ratio independent etching.
- Published in:
- Plasma Processes & Polymers, 2019, v. 16, n. 9, p. N.PAG, doi. 10.1002/ppap.201900051
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- Publication type:
- Article
Reactive ion etching of 4H-SiC with BCl<sub>3</sub> plasma.
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- Przegląd Elektrotechniczny, 2021, v. 97, n. 2, p. 57, doi. 10.15199/48.2021.02.14
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- Article
Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment.
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- Applied Sciences (2076-3417), 2022, v. 12, n. 11, p. 5684, doi. 10.3390/app12115684
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- Article
The effect of pre-etching with 37% orthophosphoric acid on the shear bond strength of orthodontic brackets bonded using self-etching primer-adhesive system.
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- 2016
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- Publication type:
- journal article
Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y<sub>2</sub>O<sub>3</sub>–Y<sub>4</sub>Al<sub>2</sub>O<sub>9</sub> composite under CF<sub>4</sub>/Ar/O<sub>2</sub> mixed gas conditions.
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- Scientific Reports, 2024, v. 14, n. 1, p. 1, doi. 10.1038/s41598-024-57697-5
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- Article
Excimer-ultraviolet-lamp-assisted selective etching of single-layer graphene and its application in edge-contact devices.
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- Nano Convergence, 2024, v. 11, n. 1, p. 1, doi. 10.1186/s40580-024-00442-5
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- Publication type:
- Article
Fabrication of Ultra-High Aspect Ratio (>420:1) Al2O3 Nanotube Arraysby Sidewall TransferMetal Assistant Chemical Etching.
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- Micromachines, 2020, v. 11, n. 4, p. 378, doi. 10.3390/mi11040378
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- Publication type:
- Article
蓝宝石晶体湿法刻蚀各向异性研究与机理分析.
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- Journal of Synthetic Crystals, 2023, v. 52, n. 6, p. 1128
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- Publication type:
- Article
利用干燥空气改善熔融 KOH 对单晶碳化硅的腐蚀.
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- Journal of Synthetic Crystals, 2023, v. 52, n. 5, p. 753
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- Publication type:
- Article
Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching.
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- Advanced Functional Materials, 2021, v. 31, n. 32, p. 1, doi. 10.1002/adfm.202103298
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- Article
The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials.
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- Nanomaterials (2079-4991), 2024, v. 14, n. 19, p. 1612, doi. 10.3390/nano14191612
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- Publication type:
- Article
Advanced Etching Techniques of LiNbO 3 Nanodevices.
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- Nanomaterials (2079-4991), 2023, v. 13, n. 20, p. 2789, doi. 10.3390/nano13202789
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- Publication type:
- Article
A Facile, Low-Cost Plasma Etching Method for Achieving Size Controlled Non-Close-Packed Monolayer Arrays of Polystyrene Nano-Spheres.
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- Nanomaterials (2079-4991), 2019, v. 9, n. 4, p. 605, doi. 10.3390/nano9040605
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- Publication type:
- Article
Highly Selective Plasma Etching Technique for Molybdenum.
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- Plasma Chemistry & Plasma Processing, 2023, v. 43, n. 3, p. 697, doi. 10.1007/s11090-023-10318-x
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- Publication type:
- Article
Study of Eutectic Etching Process for Defects Analysis in n-type 4H-SiC.
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- Defence Science Journal, 2020, v. 70, n. 5, p. 515, doi. 10.14429/dsj.70.16361
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- Publication type:
- Article
Combination of Reactive-Ion Etching and Chemical Etching as a Method for Optimizing the Surface Relief on AlGaInN Heterostructures.
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- Semiconductors, 2020, v. 54, n. 10, p. 1310, doi. 10.1134/S1063782620100218
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- Article
Damage recovery and low‐damage etching of ITO in H<sub>2</sub>/CO plasma: Effects of hydrogen or oxygen.
- Published in:
- Plasma Processes & Polymers, 2019, v. 16, n. 9, p. N.PAG, doi. 10.1002/ppap.201900029
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- Publication type:
- Article
Dry Etching Characteristics of InGaZnO Thin Films Under Inductively Coupled Plasma–Reactive-Ion Etching with Hydrochloride and Argon Gas Mixture.
- Published in:
- Materials (1996-1944), 2024, v. 17, n. 24, p. 6241, doi. 10.3390/ma17246241
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- Publication type:
- Article
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO 2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C 4 F 8 Plasma: Individual Ion Energy and Flux Controlled.
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- Materials (1996-1944), 2023, v. 16, n. 10, p. 3820, doi. 10.3390/ma16103820
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- Publication type:
- Article
Anisotropic Etching of InGaN Thin Films with Photoelectrochemical Etching to Form Quantum Dots.
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- Materials (1996-1944), 2023, v. 16, n. 5, p. 1890, doi. 10.3390/ma16051890
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- Article
A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide.
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- Materials (1996-1944), 2022, v. 15, n. 1, p. 123, doi. 10.3390/ma15010123
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- Publication type:
- Article
Ion-Enhanced Etching Characteristics of sp 2 -Rich Hydrogenated Amorphous Carbons in CF 4 Plasmas and O 2 Plasmas.
- Published in:
- Materials (1996-1944), 2021, v. 14, n. 11, p. 2941, doi. 10.3390/ma14112941
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- Publication type:
- Article
Enamel bonding of self-etching and phosphoric acid-etching orthodontic adhesives in simulated clinical conditions: Debonding force and enamel surface.
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- Dental Materials Journal, 2009, v. 28, n. 4, p. 419
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- Publication type:
- Article
Reconsidering the Double Etching of Enamel: Do Self-etching Primers Contaminate Phosphoric Acid-etched Enamel?
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- Journal of Adhesive Dentistry, 2013, v. 15, n. 2, p. 107, doi. 10.3290/j.jad.a28671
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- Article
Effect of Phosphoric Acid Etching and Self-etching Primer Application Methods on Dentinal Shear Bond Strength.
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- Journal of Adhesive Dentistry, 2008, v. 10, n. 5, p. 345
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- Publication type:
- Article
Effect of Acid Etching Time and a Self-etching Adhesive on the Shear Bond Strength of Composite Resin to Porcelain.
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- Journal of Adhesive Dentistry, 2006, v. 8, n. 1, p. 21
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- Publication type:
- Article
Correlation between the Grain Orientation Dependence of Color Etching and Chemical Etching.
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- Microscopy & Microanalysis, 2012, v. 18, n. 6, p. 1389, doi. 10.1017/S1431927612013554
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- Publication type:
- Article
Study the Effect of Etching Time on the Characteristics of the Porous Silicon that Prepare from N-Type Silicon by Photoelectrochemical Etching Method .
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- Journal of College of Education, 2022, n. 1, p. 12
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- Publication type:
- Article
Comparison of shear bond strength of composite resin to enamel surface with laser etching versus acid etching: An in vitro evaluation.
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- Journal of Conservative Dentistry, 2014, v. 17, n. 4, p. 320, doi. 10.4103/0972-0707.136438
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- Publication type:
- Article
Investigation of a Macromolecular Additive on the Decrease of the Aluminum Horizontal Etching Rate in the Wet Etching Process.
- Published in:
- Metals (2075-4701), 2022, v. 12, n. 5, p. 813, doi. 10.3390/met12050813
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- Publication type:
- Article
Comparison between Bosch and STiGer Processes for Deep Silicon Etching.
- Published in:
- Micromachines, 2021, v. 12, n. 10, p. 1143, doi. 10.3390/mi12101143
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- Publication type:
- Article
Curved Structure of Si by Improving Etching Direction Controllability in Magnetically Guided Metal-Assisted Chemical Etching.
- Published in:
- Micromachines, 2020, v. 11, n. 8, p. 744, doi. 10.3390/mi11080744
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- Publication type:
- Article
Demineralization adjacent to orthodontic brackets after application of conventional and self-etching primer systems.
- Published in:
- Journal of Orofacial Orthopedics/Fortschritte der Kieferorthopadie, 2014, v. 75, n. 5, p. 358, doi. 10.1007/s00056-014-0233-9
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- Publication type:
- Article
Formation Mechanisms and Crack Propagation Behaviors of White Etching Layers and Brown Etching Layers on Raceways of Failure Bearings.
- Published in:
- Lubricants (2075-4442), 2024, v. 12, n. 2, p. 59, doi. 10.3390/lubricants12020059
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- Publication type:
- Article
Removal of Dry-Etch-Induced Surface Layer Damage from p-GaN by Photoelectrochemical Etching.
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- Journal of Electronic Materials, 2020, v. 49, n. 6, p. 3481, doi. 10.1007/s11664-020-07986-2
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- Publication type:
- Article
Study on the Influence of Etchant Composition and Etching Process on the Precision of Stainless-Steel Microchannel and Etching Mechanism.
- Published in:
- Advanced Engineering Materials, 2024, v. 26, n. 10, p. 1, doi. 10.1002/adem.202301731
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- Publication type:
- Article
Highly Anisotropic Fluorine‐Based Plasma Etching of Ultralow Expansion Glass.
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- Advanced Engineering Materials, 2021, v. 23, n. 6, p. 1, doi. 10.1002/adem.202001336
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- Publication type:
- Article
Etching Patterns of Self-Etching Primers in Relation to Shear Bond Strength on Unground Enamel Samples.
- Published in:
- Dentistry Journal, 2021, v. 9, n. 11, p. 138, doi. 10.3390/dj9110138
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- Publication type:
- Article
Low global warming C<sub>5</sub>F<sub>10</sub>O isomers for plasma atomic layer etching and reactive ion etching of SiO<sub>2</sub> and Si<sub>3</sub>N<sub>4</sub>.
- Published in:
- Plasma Processes & Polymers, 2024, v. 21, n. 5, p. 1, doi. 10.1002/ppap.202300216
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- Publication type:
- Article
Noble gas effect on ACL etching selectivity to SiO<sub>2</sub> films.
- Published in:
- Plasma Processes & Polymers, 2023, v. 20, n. 8, p. 1, doi. 10.1002/ppap.202300026
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- Publication type:
- Article
High‐aspect‐ratio oxide etching using CF<sub>4</sub>/C<sub>6</sub>F<sub>12</sub>O plasma in an inductively coupled plasma etching system with low‐frequency bias power.
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- Plasma Processes & Polymers, 2023, v. 20, n. 3, p. 1, doi. 10.1002/ppap.202200167
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- Publication type:
- Article
Etching Characteristics of Hydrogen Environment Anisotropic Thermal Etching for GaN‐Based Functional Photonic Devices.
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- Physica Status Solidi. A: Applications & Materials Science, 2024, v. 221, n. 13, p. 1, doi. 10.1002/pssa.202300688
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- Article
Two‐Step Reactive Ion Etching Process for Diamond‐Based Nanophotonics Structure Formation.
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- Physica Status Solidi. A: Applications & Materials Science, 2021, v. 218, n. 5, p. 1, doi. 10.1002/pssa.202000206
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- Publication type:
- Article
Fabrication of Highly Ordered Macropore Arrays in p-Type Silicon by Electrochemical Etching: Effect of Wafer Resistivity and Other Etching Parameters.
- Published in:
- Micromachines, 2025, v. 16, n. 2, p. 154, doi. 10.3390/mi16020154
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- Publication type:
- Article
Vapor Phase Metal-Assisted Chemical Etching of Silicon.
- Published in:
- Advanced Functional Materials, 2014, v. 24, n. 24, p. 3827, doi. 10.1002/adfm.201304129
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- Article
From Top to Down—Recent Advances in Etching of 2D Materials.
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- Advanced Materials Interfaces, 2022, v. 9, n. 31, p. 1, doi. 10.1002/admi.202201334
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- Publication type:
- Article
Low‐Damaged Layer‐by‐Layer Etching of Large‐Area Molybdenum Disulfide Films via Mild Plasma Treatment.
- Published in:
- Advanced Materials Interfaces, 2020, v. 7, n. 17, p. 1, doi. 10.1002/admi.202000762
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- Publication type:
- Article