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Title

Cover Image, Volume 76, Issue 5.

Authors

Liu, Zhenxiu; Zhou, Lijuan; Yao, Qiang; Liu, Yaqian; Bi, Xiaoyang; Huang, Jiguang

Abstract

The cover image is based on the Research Article Laboratory selection, resistance risk assessment, multi‐resistance, and management of Tetranychus urticae Koch to bifenthrin, bifenazate and cyflumetofen on cowpea by Zhenxiu Liu et al., https://doi.org/10.1002/ps.5723.

Subjects

TWO-spotted spider mite; IMAGE; RISK assessment

Publication

Pest Management Science, 2020, Vol 76, Issue 5, pi

ISSN

1526-498X

Publication type

Academic Journal

DOI

10.1002/ps.5853