Works matching IS 10427147 AND DT 2002 AND VI 13 AND IP 7
1
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 534, doi. 10.1002/pat.222
- Cai, Qing;
- Bei, Jianzhong;
- Wang, Shenguo
- Article
2
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 513, doi. 10.1002/pat.219
- Park, Sung-Young;
- Park, Hee-Young;
- Woo, Hang-Soo;
- Ha, Chang-Sik;
- Park, Dae-Won
- Article
3
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 527, doi. 10.1002/pat.221
- Noppakundilograt, Supaporn;
- Suzuki, Shota;
- Urano, Toshiyuki;
- Miyagawa, Nobukazu;
- Takahara, Shigeru;
- Yamaoka, Tsuguo
- Article
4
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 558, doi. 10.1002/pat.225
- Watanabe, Hirohmi;
- Miyagawa, Nobukazu;
- Takahara, Shigeru;
- Yamaoka, Tsuguo
- Article
5
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 507, doi. 10.1002/pat.218
- Seeboth, A.;
- Kriwanek, J.;
- Lötzsch, D.;
- Patzak, A.
- Article
6
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 522, doi. 10.1002/pat.220
- Kim, Yang-Bae;
- Kim, Wha-Suk;
- Yu, Jeong-A;
- Hong, Jin-Who
- Article
7
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 548, doi. 10.1002/pat.224
- Ibrahim, Maha M.;
- Flefel, Eman M.;
- El-Zawawy, Waleed K.
- Article
8
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 498, doi. 10.1002/pat.217
- Vallejo, F. J.;
- Bastida, S.;
- Eguiazábal, J. I.;
- Nazábal, J.
- Article
9
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 541, doi. 10.1002/pat.223
- Flefel, Eman M.;
- Ibrahim, Maha M.;
- El-Zawawy, Waleed K.;
- Ali, Amal M.
- Article
10
- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 491, doi. 10.1002/pat.216
- Guillard, H.;
- Sixou, P.;
- Tottreau, O.
- Article