Works matching Electron mobility


Results: 5000
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    Effect of Strain in Channel on Electron Transport Properties of Ga<sub>1−x</sub>In<sub>x</sub>Sb High Electron Mobility Transistor Structures with Strained‐Al<sub>0.40</sub>In<sub>0.60</sub>Sb/Al<sub>0.25</sub>In<sub>0.75</sub>Sb Stepped Buffer

    Published in:
    Physica Status Solidi. A: Applications & Materials Science, 2023, v. 220, n. 8, p. 1, doi. 10.1002/pssa.202200529
    By:
    • Endoh, Akira;
    • Hatori, Koharu;
    • Kishimoto, Naoyuki;
    • Hiraoka, Mizuho;
    • Kemmochi, Yuta;
    • Endoh, Yuki;
    • Osawa, Koki;
    • Hayashi, Takuya;
    • Machida, Ryuto;
    • Watanabe, Issei;
    • Yamashita, Yoshimi;
    • Hara, Shinsuke;
    • Kasamatsu, Akifumi;
    • Fujishiro, Hiroki I.
    Publication type:
    Article
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    Understanding Local and Macroscopic Electron Mobilities in the Fullerene Network of Conjugated Polymer-based Solar Cells: Time-Resolved Microwave Conductivity and Theory.

    Published in:
    Advanced Functional Materials, 2014, v. 24, n. 6, p. 784, doi. 10.1002/adfm.201301757
    By:
    • Aguirre, Jordan C.;
    • Arntsen, Christopher;
    • Hernandez, Samuel;
    • Huber, Rachel;
    • Nardes, Alexandre M.;
    • Halim, Merissa;
    • Kilbride, Daniel;
    • Rubin, Yves;
    • Tolbert, Sarah H.;
    • Kopidakis, Nikos;
    • Schwartz, Benjamin J.;
    • Neuhauser, Daniel
    Publication type:
    Article
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    Enhancing Device Performance with High Electron Mobility GeSn Materials.

    Published in:
    Advanced Electronic Materials, 2025, v. 11, n. 5, p. 1, doi. 10.1002/aelm.202400561
    By:
    • Junk, Yannik;
    • Concepción, Omar;
    • Frauenrath, Marvin;
    • Sun, Jingxuan;
    • Bae, Jin Hee;
    • Bärwolf, Florian;
    • Mai, Andreas;
    • Hartmann, Jean‐Michel;
    • Grützmacher, Detlev;
    • Buca, Dan;
    • Zhao, Qing‐Tai
    Publication type:
    Article
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    50-NM SELF-ALIGNED HIGH ELECTRON-MOBILITY TRANSISTORS ON GaAs SUBSTRATES WITH EXTREMELY HIGH EXTRINSIC TRANSCONDUCTANCE AND HIGH GAIN.

    Published in:
    International Journal of High Speed Electronics & Systems, 2011, v. 20, n. 3, p. 393, doi. 10.1142/S0129156411006672
    By:
    • XU, DONG;
    • YANG, XIAOPING;
    • SEEKELL, P.;
    • PLEASANT, L. MT.;
    • ISAAK, R.;
    • KONG, W.M.T.;
    • CUEVA, G.;
    • CHU, K.;
    • MOHNKERN, L.;
    • SCHLESINGER, L.;
    • STEDMAN, R.;
    • KARIMY, H.;
    • CARNEVALE, R.;
    • VERA, A.;
    • GOLJA, B.;
    • DUH, K.H.G.;
    • SMITH, P.M.;
    • CHAO, P.C.
    Publication type:
    Article
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