Works matching DE "PLASMA-enhanced chemical vapor deposition"
Results: 830
Bush‐Shaped Vertical Graphene/Nichrome Wire for Blackbody‐Like Radiative Heating.
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- Advanced Functional Materials, 2022, v. 32, n. 51, p. 1, doi. 10.1002/adfm.202208785
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Low‐Temperature Plasma‐Assisted Growth of Large‐Area MoS<sub>2</sub> for Transparent Phototransistors.
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- Advanced Functional Materials, 2022, v. 32, n. 44, p. 1, doi. 10.1002/adfm.202205106
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Direct Plasma‐Enhanced‐Chemical‐Vapor‐Deposition Syntheses of Vertically Oriented Graphene Films on Functional Insulating Substrates for Wide‐Range Applications (Adv. Funct. Mater. 42/2022).
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- Advanced Functional Materials, 2022, v. 32, n. 42, p. 1, doi. 10.1002/adfm.202270236
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Direct Plasma‐Enhanced‐Chemical‐Vapor‐Deposition Syntheses of Vertically Oriented Graphene Films on Functional Insulating Substrates for Wide‐Range Applications.
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- Advanced Functional Materials, 2022, v. 32, n. 42, p. 1, doi. 10.1002/adfm.202202026
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Biocompatible Cubic Boron Nitride: A Noncytotoxic Ultrahard Material.
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- Advanced Functional Materials, 2021, v. 31, n. 4, p. 1, doi. 10.1002/adfm.202005066
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Deposition of diamond coating on pure titanium using micro-wave plasma assisted chemical vapor deposition.
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- Journal of Materials Science, 1999, v. 34, n. 10, p. 2269, doi. 10.1023/A:1004569406535
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Plasma-assisted deposition of metal and metal oxide coatings.
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- Journal of Materials Science, 1998, v. 33, n. 5, p. 1189, doi. 10.1023/A:1004321508598
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Preparation of transparent water-repellent films by radio-frequency plasma-enhanced chemical vapour deposition.
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- Journal of Materials Science, 1997, v. 32, n. 15, p. 4253, doi. 10.1023/A:1018699101677
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Effect of precursor gas inlet position relative to hot wire cells in HWC-IP-PECVD systems for low-temperature graphene growth.
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- Materials Research Innovations, 2023, v. 27, n. 3, p. 131, doi. 10.1080/14328917.2022.2091353
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基于 Logistic 回归的数据富裕环境下制造过程质量动态监控.
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- Machine Tool & Hydraulics, 2023, v. 51, n. 11, p. 104, doi. 10.3969/j.issn.1001-3881.2023.11.017
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RAMAN SPECTRA ANALYSIS OF CARBON LAYERS ON MAGNESIUM ALLOYS.
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- Annales de Chimie Science des Matériaux, 2016, v. 40, n. 1/2, p. 1, doi. 10.3166/acsm.40.1-8
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Plasma and Gas‐based Semiconductor Technologies for 2D Materials with Computational Simulation & Electronic Applications.
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- Advanced Electronic Materials, 2024, v. 10, n. 6, p. 1, doi. 10.1002/aelm.202300835
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Enhanced Electrical Properties of Metal‐Organic Chemical Vapor Deposition‐Grown MoS<sub>2</sub> Thin Films through Oxygen‐Assisted Defect Control.
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- Advanced Electronic Materials, 2022, v. 8, n. 7, p. 1, doi. 10.1002/aelm.202101325
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Ultrahigh Sensitivity of Flexible Thermistors Based on 3D Porous Graphene Characterized by Imbedded Microheaters.
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- Advanced Electronic Materials, 2020, v. 6, n. 8, p. 1, doi. 10.1002/aelm.202000451
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Graphene Field‐Effect Transistors on Hexagonal‐Boron Nitride for Enhanced Interfacial Thermal Dissipation.
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- Advanced Electronic Materials, 2020, v. 6, n. 7, p. 1, doi. 10.1002/aelm.202000059
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The effect of diborane additive on the plasma-chemical properties of deposited carbon films.
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- Technical Physics Letters, 2017, v. 43, n. 1, p. 81, doi. 10.1134/S1063785017010114
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Synthesis of a-SiO: H thin films by the gas-jet electron beam plasma chemical vapor deposition method.
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- Technical Physics Letters, 2015, v. 41, n. 10, p. 1013, doi. 10.1134/S1063785015100181
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The effect of number of carbon atoms in a molecular precursor on the crystallite size in diamond films prepared by plasma-enhanced chemical-vapor deposition.
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- Technical Physics Letters, 2013, v. 39, n. 6, p. 501, doi. 10.1134/S1063785013060096
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Boron-doped transparent conducting nanodiamond films.
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- Technical Physics Letters, 2011, v. 37, n. 4, p. 322, doi. 10.1134/S1063785011040079
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(Allylamino)silanes: Synthesis, Properties, and Prospects of Use in Producing New Materials.
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- Russian Journal of General Chemistry, 2021, v. 91, n. 10, p. 1957, doi. 10.1134/S1070363221100054
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The roadmap of two-dimensional materials toward next-generation image sensor.
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- National Science Review, 2024, v. 11, n. 12, p. 1, doi. 10.1093/nsr/nwae431
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Innovative Approach to Graphene Film Synthesis: Factorial Design in PECVD Experiments.
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- Journal of Engineering & Technological Sciences, 2025, v. 57, n. 1, p. 78, doi. 10.5614/j.eng.technol.sci.2025.57.1.6
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Deposition of SiO x layer by plasma-enhanced chemical vapor deposition for the protection of silver (Ag) surfaces.
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- Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena, 2014, v. 169, n. 3, p. 217, doi. 10.1080/10420150.2013.860972
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Structured Semiconductors in Photocatalysis.
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- Catalysts (2073-4344), 2023, v. 13, n. 7, p. 1111, doi. 10.3390/catal13071111
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Preparation of TiO 2 -CNT-Ag Ternary Composite Film with Enhanced Photocatalytic Activity via Plasma-Enhanced Chemical Vapor Deposition.
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- Catalysts (2073-4344), 2022, v. 12, n. 5, p. 508, doi. 10.3390/catal12050508
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Ag-Doped TiO 2 Composite Films Prepared Using Aerosol-Assisted, Plasma-Enhanced Chemical Vapor Deposition.
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- Catalysts (2073-4344), 2022, v. 12, n. 4, p. 365, doi. 10.3390/catal12040365
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Towards Catalysts Prepared by Cold Plasma.
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- Catalysts (2073-4344), 2022, v. 12, n. 1, p. 75, doi. 10.3390/catal12010075
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Effect of Heating Rate on the Photocatalytic Activity of Ag–TiO 2 Nanocomposites by One-Step Process via Aerosol Routes.
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- Catalysts (2073-4344), 2022, v. 12, n. 1, p. 17, doi. 10.3390/catal12010017
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Enhancing CO 2 Conversion to CO over Plasma-Deposited Composites Based on Mixed Co and Fe Oxides.
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- Catalysts (2073-4344), 2021, v. 11, n. 8, p. 883, doi. 10.3390/catal11080883
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Plasma-Deposited Ru-Based Thin Films for Photoelectrochemical Water Splitting.
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- Catalysts (2073-4344), 2020, v. 10, n. 3, p. 278, doi. 10.3390/catal10030278
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Rapid Surface Modification of Ultrafiltration Membranes for Enhanced Antifouling Properties.
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- Membranes, 2020, v. 10, n. 12, p. 401, doi. 10.3390/membranes10120401
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Ge nanoclusters in PECVD-deposited glass after heat treatment and electron-beam irradiation.
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- Applied Physics B: Lasers & Optics, 2007, v. 87, n. 2, p. 327, doi. 10.1007/s00340-007-2594-x
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Excellent Passivation of n‐Type Silicon Surfaces Enabled by Pulsed‐Flow Plasma‐Enhanced Chemical Vapor Deposition of Phosphorus Oxide Capped by Aluminum Oxide.
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- Physica Status Solidi - Rapid Research Letters, 2021, v. 15, n. 1, p. 1, doi. 10.1002/pssr.202000399
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Multiwavelength Raman Scattering Spectroscopy Study of Graphene Synthesized on Si(100) and SiO<sub>2</sub> by Microwave Plasma‐Enhanced Chemical Vapor Deposition.
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- Physica Status Solidi - Rapid Research Letters, 2020, v. 14, n. 2, p. N.PAG, doi. 10.1002/pssr.201900462
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Effective Passivation of Black Silicon Surfaces via Plasma‐Enhanced Chemical Vapor Deposition Grown Conformal Hydrogenated Amorphous Silicon Layer.
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- Physica Status Solidi - Rapid Research Letters, 2020, v. 14, n. 1, p. N.PAG, doi. 10.1002/pssr.201900087
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Defect State Analysis in Ion‐Irradiated Amorphous‐Silicon Heterojunctions by HAXPES.
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- Physica Status Solidi - Rapid Research Letters, 2019, v. 13, n. 5, p. N.PAG, doi. 10.1002/pssr.201800655
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Toward Efficient Radial Junction Silicon Nanowire‐Based Solar Mini‐Modules.
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- Physica Status Solidi - Rapid Research Letters, 2019, v. 13, n. 2, p. N.PAG, doi. 10.1002/pssr.201800402
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Growth behavior of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> thin films on graphene substrate grown by plasma-enhanced chemical vapor deposition.
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- Physica Status Solidi - Rapid Research Letters, 2017, v. 11, n. 3, p. n/a, doi. 10.1002/pssr.201600369
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Comparison of batch and in-line PECVD of a-Si:H passivation layers for silicon heterojunction solar cells.
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- Physica Status Solidi - Rapid Research Letters, 2016, v. 10, n. 10, p. 725, doi. 10.1002/pssr.201600256
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21.0%-efficient co-diffused screen printed n-type silicon solar cell with rear-side boron emitter.
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- Physica Status Solidi - Rapid Research Letters, 2016, v. 10, n. 2, p. 148, doi. 10.1002/pssr.201510393
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Amorphous silicon solar cells on nano-imprinted commodity paper without sacrificing efficiency.
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- Physica Status Solidi - Rapid Research Letters, 2015, v. 9, n. 11, p. 622, doi. 10.1002/pssr.201510308
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Silicon nitride/silicon oxide interlayers for solar cell passivating contacts based on PECVD amorphous silicon.
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- Physica Status Solidi - Rapid Research Letters, 2015, v. 9, n. 11, p. 617, doi. 10.1002/pssr.201510325
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CVD Process produces thick diamond films.
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- Advanced Materials & Processes, 2003, v. 161, n. 1, p. 24
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- Article
Improving Barrier Properties of PET by Depositing a Layer of DLC Films on Surface.
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- Advances in Materials Science & Engineering, 2013, p. 1, doi. 10.1155/2013/861804
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Fabrication of Si<sub>3</sub>N<sub>4</sub> Nanocrystals and Nanowires Using PECVD.
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- Advances in Materials Science & Engineering, 2010, p. 1, doi. 10.1155/2010/892792
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Graphene In Situ Coated High-Oxygen Vacancy Co3O4−x Sphere Composites for High-Stability Supercapacitors.
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- Arabian Journal for Science & Engineering (Springer Science & Business Media B.V. ), 2020, v. 45, n. 6, p. 4809, doi. 10.1007/s13369-020-04337-5
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The Effect of Helium Dilution on Optical and Photoelectric Properties of a-Si: H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Technique.
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- Arabian Journal for Science & Engineering (Springer Science & Business Media B.V. ), 2012, v. 37, n. 1, p. 183, doi. 10.1007/s13369-011-0147-4
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Plasma-Enhanced Chemical Vapor Deposition of Indene for Gas Separation Membrane.
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- ASEAN Journal of Chemical Engineering, 2019, v. 19, n. 1, p. 47
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Diseño e implementación de un reactor de deposición química de vapor para producir películas delgadas.
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- INGENIARE - Revista Chilena de Ingeniería, 2015, v. 23, n. 1, p. 85
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Effect of oxidation on intrinsic residual stress in amorphous silicon carbide films.
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- Journal of Biomedical Materials Research, Part B: Applied Biomaterials, 2019, v. 107, n. 5, p. 1654, doi. 10.1002/jbm.b.34258
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