Works matching IS 09359648 AND DT 2016 AND VI 28 AND IP 13


Results: 28
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    Athermal Azobenzene-Based Nanoimprint Lithography.

    Published in:
    Advanced Materials, 2016, v. 28, n. 13, p. 2624, doi. 10.1002/adma.201505552
    By:
    • Probst, Christian;
    • Meichner, Christoph;
    • Kreger, Klaus;
    • Kador, Lothar;
    • Neuber, Christian;
    • Schmidt, Hans-Werner
    Publication type:
    Article
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    Photothermoelectric Effects in Nanoporous Silicon.

    Published in:
    Advanced Materials, 2016, v. 28, n. 13, p. 2644, doi. 10.1002/adma.201504990
    By:
    • Lai, Yu-Sheng;
    • Tsai, Chao-Yang;
    • Chang, Chin-Kai;
    • Huang, Cheng-Yin;
    • Hsiao, Vincent K. S.;
    • Su, Yuhlong Oliver
    Publication type:
    Article
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    Monolithic 3D CMOS Using Layered Semiconductors.

    Published in:
    Advanced Materials, 2016, v. 28, n. 13, p. 2547, doi. 10.1002/adma.201505113
    By:
    • Sachid, Angada B.;
    • Tosun, Mahmut;
    • Desai, Sujay B.;
    • Hsu, Ching-Yi;
    • Lien, Der-Hsien;
    • Madhvapathy, Surabhi R.;
    • Chen, Yu-Ze;
    • Hettick, Mark;
    • Kang, Jeong Seuk;
    • Zeng, Yuping;
    • He, Jr-Hau;
    • Chang, Edward Yi;
    • Chueh, Yu-Lun;
    • Javey, Ali;
    • Hu, Chenming
    Publication type:
    Article
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