Works matching IS 14381656 AND DT 2025 AND VI 27 AND IP 3


Results: 23
    1
    2
    3

    Issue Information.

    Published in:
    Advanced Engineering Materials, 2025, v. 27, n. 3, p. 1, doi. 10.1002/adem.202570010
    Publication type:
    Article
    4
    5
    6
    7
    8
    9
    10
    11

    RuAl Thin‐Film Deposition by DC Magnetron Sputtering.

    Published in:
    Advanced Engineering Materials, 2025, v. 27, n. 3, p. 1, doi. 10.1002/adem.202400258
    By:
    • Ott, Vincent;
    • Wojcik, Tomasz;
    • Kolozsvari, Szilard;
    • Polcik, Peter;
    • Schäfer, Christian;
    • Pauly, Christoph;
    • Mücklich, Frank;
    • Ulrich, Sven;
    • Mayrhofer, Paul H.;
    • Riedl, Helmut;
    • Stüber, Michael
    Publication type:
    Article
    12
    13
    14
    15
    16
    17
    18
    19
    20
    21

    A Novel Method for Preparation of Al–Ni Reactive Coatings by Incorporation of Ni Nanoparticles into an Al Matrix Fabricated by Electrodeposition in AlCl<sub>3</sub>:1‐Eethyl‐3‐Methylimidazolium Chloride (1.5:1) Ionic Liquid Containing Ni Nanoparticles

    Published in:
    Advanced Engineering Materials, 2025, v. 27, n. 3, p. 1, doi. 10.1002/adem.202302217
    By:
    • Mejia Chueca, Maria del Carmen;
    • Winter, Andreas;
    • Abdi, Azadeh;
    • Baumer, Christoph;
    • Ispas, Adriana;
    • Stich, Michael;
    • Riegler, Sascha;
    • Ecke, Gernot;
    • Isaac, Nishchay A.;
    • Graske, Marcus;
    • Gallino, Isabella;
    • Schaaf, Peter;
    • Jacobs, Heiko O.;
    • Bund, Andreas
    Publication type:
    Article
    22
    23