Found: 19
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VPD/TXRF analysis of trace elements on a silicon wafer.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 451, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<451::AID-XRS381>3.0.CO;2-V
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Guest Editorial.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 419, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<419::AID-XRS407>3.0.CO;2-Z
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Distribution of iron in a single neuron of patients with Parkinson's disease.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 456, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<456::AID-XRS392>3.0.CO;2-C
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Valence band structure and decay process in the inner-shell excitation of boron oxide.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 503, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<503::AID-XRS385>3.0.CO;2-F
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Atomic excitation and ionization as the result of inner-shell vacancy creation.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 491, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<491::AID-XRS378>3.0.CO;2-7
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Direct observation of in-plane texture in cobalt recording media by means of a laboratory-scale x-ray diffractometer.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 440, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<440::AID-XRS389>3.0.CO;2-B
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Synchrotron radiation x-ray excited optical luminescence for chemical state selective analysis.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 515, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<515::AID-XRS380>3.0.CO;2-N
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Development and application of multi-purpose x-ray fluorescence analyzer using synchrotron and conventional x-ray sources.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 461, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<461::AID-XRS391>3.0.CO;2-T
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Total reflection x-ray photoelectron spectroscopy of a tantalum-titanium multilayer.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 519, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<519::AID-XRS395>3.0.CO;2-W
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Error factors in quantitative total reflection x-ray fluorescence analysis.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 421, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<421::AID-XRS384>3.0.CO;2-P
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Recent advances in the application of total reflection x-ray photoelectron spectroscopy in the semiconductor industry.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 427, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<427::AID-XRS388>3.0.CO;2-W
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X-ray emission and absorption spectra of carbon nitride films prepared by laser ablation.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 509, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<509::AID-XRS383>3.0.CO;2-3
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Transition metal 2p x-ray photoelectron and high-resolution Kα x-ray emission spectra of K.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 464, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<464::AID-XRS390>3.0.CO;2-N
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Chemical shift and lineshape of high-resolution Ni Kα x-ray fluorescence spectra.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 470, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<470::AID-XRS394>3.0.CO;2-M
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Structural analysis of binuclear copper(II) complexes by DV-Xα calculations of Cu K-edge XANES spectra.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 484, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<484::AID-XRS393>3.0.CO;2-C
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Energy-dispersive x-ray analysis of trace metals in micro amounts of aqueous samples by an ultra-thin film droplet method.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 446, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<446::AID-XRS387>3.0.CO;2-#
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K x-ray emission spectra of Ni in nickel(II) Schiff base complexes.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 478, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<478::AID-XRS382>3.0.CO;2-5
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Surface-sensitive x-ray fluorescence and diffraction analysis with grazing-exit geometry.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 433, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<433::AID-XRS386>3.0.CO;2-C
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Calculation of B K-V x-ray emission spectra of boron nitrides.
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- XRS: X-ray Spectrometry, 1999, v. 28, n. 6, p. 497, doi. 10.1002/(SICI)1097-4539(199911/12)28:6<497::AID-XRS379>3.0.CO;2-N
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